JPH0462414B2 - - Google Patents
Info
- Publication number
- JPH0462414B2 JPH0462414B2 JP9980086A JP9980086A JPH0462414B2 JP H0462414 B2 JPH0462414 B2 JP H0462414B2 JP 9980086 A JP9980086 A JP 9980086A JP 9980086 A JP9980086 A JP 9980086A JP H0462414 B2 JPH0462414 B2 JP H0462414B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- magnetic
- surface roughness
- recording medium
- magnetic recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010410 layer Substances 0.000 claims description 100
- 230000003746 surface roughness Effects 0.000 claims description 58
- 239000011241 protective layer Substances 0.000 claims description 29
- 239000000919 ceramic Substances 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 15
- 239000010408 film Substances 0.000 description 10
- 229910052759 nickel Inorganic materials 0.000 description 8
- 239000011651 chromium Substances 0.000 description 7
- 230000003068 static effect Effects 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910002441 CoNi Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9980086A JPS62256216A (ja) | 1986-04-28 | 1986-04-28 | 磁気記録媒体 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9980086A JPS62256216A (ja) | 1986-04-28 | 1986-04-28 | 磁気記録媒体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62256216A JPS62256216A (ja) | 1987-11-07 |
| JPH0462414B2 true JPH0462414B2 (enrdf_load_stackoverflow) | 1992-10-06 |
Family
ID=14256967
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9980086A Granted JPS62256216A (ja) | 1986-04-28 | 1986-04-28 | 磁気記録媒体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62256216A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0833984B2 (ja) * | 1987-01-16 | 1996-03-29 | ティーディーケイ株式会社 | 磁気記録媒体およびその製造方法 |
| KR100420384B1 (ko) * | 2001-05-25 | 2004-03-04 | 학교법인연세대학교 | 다중 숫자화 데이터 기록 미디어 및 그 데이터 기록재생방법 |
-
1986
- 1986-04-28 JP JP9980086A patent/JPS62256216A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62256216A (ja) | 1987-11-07 |
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