JPH0458518B2 - - Google Patents

Info

Publication number
JPH0458518B2
JPH0458518B2 JP7800083A JP7800083A JPH0458518B2 JP H0458518 B2 JPH0458518 B2 JP H0458518B2 JP 7800083 A JP7800083 A JP 7800083A JP 7800083 A JP7800083 A JP 7800083A JP H0458518 B2 JPH0458518 B2 JP H0458518B2
Authority
JP
Japan
Prior art keywords
phosphor
killer
weight
activator
firing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7800083A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59202284A (ja
Inventor
Tomoki Mikami
Hideo Suzuki
Takashi Hase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Kasei Optonix Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kasei Optonix Ltd filed Critical Kasei Optonix Ltd
Priority to JP7800083A priority Critical patent/JPS59202284A/ja
Publication of JPS59202284A publication Critical patent/JPS59202284A/ja
Publication of JPH0458518B2 publication Critical patent/JPH0458518B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Luminescent Compositions (AREA)
JP7800083A 1983-05-02 1983-05-02 長残光性螢光体 Granted JPS59202284A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7800083A JPS59202284A (ja) 1983-05-02 1983-05-02 長残光性螢光体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7800083A JPS59202284A (ja) 1983-05-02 1983-05-02 長残光性螢光体

Publications (2)

Publication Number Publication Date
JPS59202284A JPS59202284A (ja) 1984-11-16
JPH0458518B2 true JPH0458518B2 (enrdf_load_stackoverflow) 1992-09-17

Family

ID=13649532

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7800083A Granted JPS59202284A (ja) 1983-05-02 1983-05-02 長残光性螢光体

Country Status (1)

Country Link
JP (1) JPS59202284A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9164372B2 (en) 2009-08-26 2015-10-20 D2S, Inc. Method and system for forming non-manhattan patterns using variable shaped beam lithography
US9268214B2 (en) 2008-09-01 2016-02-23 D2S, Inc. Method for forming circular patterns on a surface
US9274412B2 (en) 2008-09-01 2016-03-01 D2S, Inc. Method and system for design of a reticle to be manufactured using variable shaped beam lithography
US9323140B2 (en) 2008-09-01 2016-04-26 D2S, Inc. Method and system for forming a pattern on a reticle using charged particle beam lithography
US9341936B2 (en) 2008-09-01 2016-05-17 D2S, Inc. Method and system for forming a pattern on a reticle using charged particle beam lithography
US9372391B2 (en) 2008-09-01 2016-06-21 D2S, Inc. Method and system for forming patterns using charged particle beam lithography with variable pattern dosage

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0715096B2 (ja) * 1985-10-09 1995-02-22 日亜化学工業株式会社 残光性螢光体
TW295672B (enrdf_load_stackoverflow) * 1994-09-20 1997-01-11 Hitachi Ltd
CN1330736C (zh) * 2002-09-30 2007-08-08 株式会社东芝 显示装置用荧光体及其制造方法、以及使用该荧光体的彩色显示装置
JP5583403B2 (ja) * 2007-04-25 2014-09-03 株式会社クラレ 青色蛍光体
CN103805201B (zh) * 2014-02-05 2015-08-12 上海科炎光电技术有限公司 一种探测红外激光的红色电致发光材料及制备
CN103740362B (zh) * 2014-02-05 2015-08-12 上海科炎光电技术有限公司 一种用于红外激光探测的橙色发光材料及制备

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9268214B2 (en) 2008-09-01 2016-02-23 D2S, Inc. Method for forming circular patterns on a surface
US9274412B2 (en) 2008-09-01 2016-03-01 D2S, Inc. Method and system for design of a reticle to be manufactured using variable shaped beam lithography
US9323140B2 (en) 2008-09-01 2016-04-26 D2S, Inc. Method and system for forming a pattern on a reticle using charged particle beam lithography
US9341936B2 (en) 2008-09-01 2016-05-17 D2S, Inc. Method and system for forming a pattern on a reticle using charged particle beam lithography
US9372391B2 (en) 2008-09-01 2016-06-21 D2S, Inc. Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
US9164372B2 (en) 2009-08-26 2015-10-20 D2S, Inc. Method and system for forming non-manhattan patterns using variable shaped beam lithography

Also Published As

Publication number Publication date
JPS59202284A (ja) 1984-11-16

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