JPH0450683B2 - - Google Patents
Info
- Publication number
- JPH0450683B2 JPH0450683B2 JP60028189A JP2818985A JPH0450683B2 JP H0450683 B2 JPH0450683 B2 JP H0450683B2 JP 60028189 A JP60028189 A JP 60028189A JP 2818985 A JP2818985 A JP 2818985A JP H0450683 B2 JPH0450683 B2 JP H0450683B2
- Authority
- JP
- Japan
- Prior art keywords
- cooh
- film
- compound
- tin
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010408 film Substances 0.000 claims description 24
- 125000000896 monocarboxylic acid group Chemical group 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 17
- 150000002222 fluorine compounds Chemical class 0.000 claims description 15
- 150000003606 tin compounds Chemical class 0.000 claims description 14
- 239000011521 glass Substances 0.000 claims description 13
- 239000002253 acid Substances 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 8
- 239000010409 thin film Substances 0.000 claims description 6
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 4
- 229910001887 tin oxide Inorganic materials 0.000 claims description 4
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims 1
- 150000004820 halides Chemical class 0.000 claims 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 9
- 239000005357 flat glass Substances 0.000 description 8
- 239000012159 carrier gas Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000007921 spray Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- -1 tin halide Chemical class 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- VXKWYPOMXBVZSJ-UHFFFAOYSA-N tetramethyltin Chemical compound C[Sn](C)(C)C VXKWYPOMXBVZSJ-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000075 oxide glass Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
- Non-Insulated Conductors (AREA)
- Manufacturing Of Electric Cables (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2818985A JPS61188821A (ja) | 1985-02-18 | 1985-02-18 | 透明導電薄膜の形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2818985A JPS61188821A (ja) | 1985-02-18 | 1985-02-18 | 透明導電薄膜の形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61188821A JPS61188821A (ja) | 1986-08-22 |
| JPH0450683B2 true JPH0450683B2 (xx) | 1992-08-17 |
Family
ID=12241742
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2818985A Granted JPS61188821A (ja) | 1985-02-18 | 1985-02-18 | 透明導電薄膜の形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61188821A (xx) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01175118A (ja) * | 1987-12-28 | 1989-07-11 | Central Glass Co Ltd | 透明導電膜の形成法 |
| JP2007153701A (ja) * | 2005-12-07 | 2007-06-21 | Fujikura Ltd | 熱線反射ガラス、成膜装置及び成膜方法 |
| JP5048862B1 (ja) * | 2011-10-28 | 2012-10-17 | シャープ株式会社 | ガラス基材への成膜方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5684809A (en) * | 1979-12-14 | 1981-07-10 | Hitachi Ltd | Method of forming transparent conductive film |
| JPS5830007A (ja) * | 1981-08-17 | 1983-02-22 | 三洋電機株式会社 | 透明電導膜の製造方法 |
-
1985
- 1985-02-18 JP JP2818985A patent/JPS61188821A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5684809A (en) * | 1979-12-14 | 1981-07-10 | Hitachi Ltd | Method of forming transparent conductive film |
| JPS5830007A (ja) * | 1981-08-17 | 1983-02-22 | 三洋電機株式会社 | 透明電導膜の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61188821A (ja) | 1986-08-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100577945B1 (ko) | 유리에산화주석코팅을형성하는방법 | |
| US4500567A (en) | Method for forming tin oxide coating | |
| US3677814A (en) | Process for forming electroconductive tin oxide films by pyrolyzation of alkyl and aryl tin fluorides | |
| IE46333B1 (en) | Coating of supports with tin oxide | |
| JPH0196044A (ja) | 低放射率金属酸化物被覆の形成方法 | |
| CA1117829A (en) | Conductive metal oxide film for solar energy control | |
| CN1020582C (zh) | 无眩光涂层玻璃 | |
| US4743506A (en) | Tin oxide coated article | |
| US4600654A (en) | Method of producing transparent, haze-free tin oxide coatings | |
| US5004490A (en) | Method of making glass substrate coated with tin oxide | |
| GB2275692A (en) | Coated glass having a substratum comprising oxides of aluminium titanium and vanadium | |
| JPH0450683B2 (xx) | ||
| JPS6236046A (ja) | 酸化錫膜の形成方法 | |
| AU575648B2 (en) | Iridescence suppressing coating process | |
| CA2193158A1 (en) | Method for the pyrolytic coating of glass and glass ceramics | |
| US5417757A (en) | Liquid precursor for the production of fluorine doped tin oxide coatings and corresponding coating process | |
| EP0158399B1 (en) | Liquid coating composition for producing high quality, high performance fluorine-doped tin oxide coatings | |
| KR920007956B1 (ko) | 헤이즈가 없는 투명한 산화주석코팅막의 제조방법 | |
| JPH0217496B2 (xx) | ||
| CA1333515C (en) | Liquid coating composition comprising an organic di-or tricarboxylate and an organic fluoroacid, and chemical vapor deposition method for forming a fluorine-doped tin oxide coating on glass having low bulk resistivity and low haze values | |
| US5385751A (en) | Atmospheric pressure CVD process for preparing fluorine-doped tungsten oxide films | |
| JPS6147227B2 (xx) | ||
| US3331702A (en) | Iridizing method | |
| JPS59136477A (ja) | 基体に酸化錫膜を形成する方法 | |
| JP2009517312A (ja) | 基板上への酸化ルテニウムコーティングの蒸着 |