JPH0449704B2 - - Google Patents
Info
- Publication number
- JPH0449704B2 JPH0449704B2 JP58098291A JP9829183A JPH0449704B2 JP H0449704 B2 JPH0449704 B2 JP H0449704B2 JP 58098291 A JP58098291 A JP 58098291A JP 9829183 A JP9829183 A JP 9829183A JP H0449704 B2 JPH0449704 B2 JP H0449704B2
- Authority
- JP
- Japan
- Prior art keywords
- sensitivity
- resist
- molecular weight
- trioxabicyclo
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229920000642 polymer Polymers 0.000 claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 7
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 230000035945 sensitivity Effects 0.000 description 22
- 238000010894 electron beam technology Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 7
- 230000005865 ionizing radiation Effects 0.000 description 6
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 229920002239 polyacrylonitrile Polymers 0.000 description 3
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- UKJFVOWPUXSBOM-UHFFFAOYSA-N hexane;oxolane Chemical compound C1CCOC1.CCCCCC UKJFVOWPUXSBOM-UHFFFAOYSA-N 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 229920002319 Poly(methyl acrylate) Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58098291A JPS59223420A (ja) | 1983-06-02 | 1983-06-02 | レジスト材料 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58098291A JPS59223420A (ja) | 1983-06-02 | 1983-06-02 | レジスト材料 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59223420A JPS59223420A (ja) | 1984-12-15 |
| JPH0449704B2 true JPH0449704B2 (enrdf_load_stackoverflow) | 1992-08-12 |
Family
ID=14215818
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58098291A Granted JPS59223420A (ja) | 1983-06-02 | 1983-06-02 | レジスト材料 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59223420A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5024969A (en) * | 1990-02-23 | 1991-06-18 | Reche John J | Hybrid circuit structure fabrication methods using high energy electron beam curing |
-
1983
- 1983-06-02 JP JP58098291A patent/JPS59223420A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59223420A (ja) | 1984-12-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4968581A (en) | High resolution photoresist of imide containing polymers | |
| JP2664475B2 (ja) | 感放射線混合物及びレリーフパターンの製造方法 | |
| EP0234327B1 (en) | High resolution photoresist of imide containing polymers | |
| US4996136A (en) | Radiation sensitive materials and devices made therewith | |
| JP2625014B2 (ja) | 感放射線混合物及びレリーフパターン作製方法 | |
| US4061829A (en) | Negative resist for X-ray and electron beam lithography and method of using same | |
| JPH0219847A (ja) | ポジチブ及びネガチブ処理感放射線混合物及びレリーフパターンの作製方法 | |
| US4286049A (en) | Method of forming a negative resist pattern | |
| US4096290A (en) | Resist mask formation process with haloalkyl methacrylate copolymers | |
| EP0585980B1 (en) | Lithographic process for fabricating a device | |
| US4556619A (en) | Negative-type acetalized polyvinyl alcohol resist sensitive to ionizing radiation | |
| JPH0449704B2 (enrdf_load_stackoverflow) | ||
| JP2825543B2 (ja) | ネガ型放射線感応性樹脂組成物 | |
| JPH0613584B2 (ja) | 感電子線及び感ｘ線重合体 | |
| US4649099A (en) | Negative-type resist sensitive to ionizing radiation | |
| JPS5868743A (ja) | 放射線感応性有機高分子材料 | |
| JPS617835A (ja) | レジスト材料 | |
| JPS63271253A (ja) | 高解像度ポジ型放射線感応性レジスト | |
| JPH0449705B2 (enrdf_load_stackoverflow) | ||
| JPH0449706B2 (enrdf_load_stackoverflow) | ||
| JPS63271249A (ja) | ポジ型高感度放射線感応性レジスト | |
| JPH0450581B2 (enrdf_load_stackoverflow) | ||
| JPS59121042A (ja) | ネガ型レジスト組成物 | |
| JPS6349213B2 (enrdf_load_stackoverflow) | ||
| JPH0160812B2 (enrdf_load_stackoverflow) |