JPH0448871B2 - - Google Patents

Info

Publication number
JPH0448871B2
JPH0448871B2 JP60289970A JP28997085A JPH0448871B2 JP H0448871 B2 JPH0448871 B2 JP H0448871B2 JP 60289970 A JP60289970 A JP 60289970A JP 28997085 A JP28997085 A JP 28997085A JP H0448871 B2 JPH0448871 B2 JP H0448871B2
Authority
JP
Japan
Prior art keywords
magnetic field
poles
target
magnet
magnet body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60289970A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62149868A (ja
Inventor
Koichiro Okazaki
Masaichi Otaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP28997085A priority Critical patent/JPS62149868A/ja
Publication of JPS62149868A publication Critical patent/JPS62149868A/ja
Publication of JPH0448871B2 publication Critical patent/JPH0448871B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP28997085A 1985-12-23 1985-12-23 強磁性体の高速スパツタリング方法 Granted JPS62149868A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28997085A JPS62149868A (ja) 1985-12-23 1985-12-23 強磁性体の高速スパツタリング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28997085A JPS62149868A (ja) 1985-12-23 1985-12-23 強磁性体の高速スパツタリング方法

Publications (2)

Publication Number Publication Date
JPS62149868A JPS62149868A (ja) 1987-07-03
JPH0448871B2 true JPH0448871B2 (enExample) 1992-08-07

Family

ID=17750081

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28997085A Granted JPS62149868A (ja) 1985-12-23 1985-12-23 強磁性体の高速スパツタリング方法

Country Status (1)

Country Link
JP (1) JPS62149868A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0765168B2 (ja) * 1987-10-14 1995-07-12 日電アネルバ株式会社 平板マグネトロンスパッタ装置
JPH03247761A (ja) * 1990-02-23 1991-11-05 Yoshihisa Nakamura スパッタターゲット装置
JP3403550B2 (ja) * 1995-06-29 2003-05-06 松下電器産業株式会社 スパッタリング装置とスパッタリング方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58130277A (ja) * 1982-01-27 1983-08-03 Clarion Co Ltd マグネトロンスパツタ装置

Also Published As

Publication number Publication date
JPS62149868A (ja) 1987-07-03

Similar Documents

Publication Publication Date Title
US4865708A (en) Magnetron sputtering cathode
US5876576A (en) Apparatus for sputtering magnetic target materials
US5415754A (en) Method and apparatus for sputtering magnetic target materials
US4892633A (en) Magnetron sputtering cathode
JPH11500490A (ja) 磁性ターゲット材料のスパッタ方法及び装置
JPS59133370A (ja) マグネトロンスパツタ−装置
JPH0448871B2 (enExample)
JPS61221363A (ja) スパツタ装置
JPS63277756A (ja) 対向タ−ゲット式スパッタ装置
JPS61183466A (ja) 対向タ−ゲツト式スパツタ装置
JPS6338576A (ja) スパツタリング装置
JP2580149B2 (ja) スパツタ装置
JPS62149869A (ja) 強磁性体のスパツタリング方法
JPS6016515B2 (ja) 低温スパツタリング装置
JPH0243329B2 (enExample)
JPS6089571A (ja) マグネトロン型スパツタ装置
JPH0313575A (ja) 対向ターゲツトスパツタ装置
JPS63468A (ja) 対向タ−ゲツト式スパツタ装置
KR20090087680A (ko) 마그네트론 스퍼터링 장치
JPH0625845A (ja) スパッタリング装置
JP2604442B2 (ja) マグネトロンスパッタ装置
JPS6130666A (ja) 高速スパツタ装置
JPH0470392B2 (enExample)
JPH04358064A (ja) マグネトロンスパッタカソード
JPH0232353B2 (ja) Taikotaagetsutoshikisupatsutasochi

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term