JPH0443417B2 - - Google Patents
Info
- Publication number
- JPH0443417B2 JPH0443417B2 JP58209072A JP20907283A JPH0443417B2 JP H0443417 B2 JPH0443417 B2 JP H0443417B2 JP 58209072 A JP58209072 A JP 58209072A JP 20907283 A JP20907283 A JP 20907283A JP H0443417 B2 JPH0443417 B2 JP H0443417B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- photoresist
- shape
- electrode
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/01—Manufacture or treatment
- H10W20/031—Manufacture or treatment of conductive parts of the interconnections
- H10W20/069—Manufacture or treatment of conductive parts of the interconnections by forming self-aligned vias or self-aligned contact plugs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
- H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
- H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
- H10P76/2041—Photolithographic processes
Landscapes
- Wire Bonding (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58209072A JPS60102762A (ja) | 1983-11-09 | 1983-11-09 | 集積回路基板の電極製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58209072A JPS60102762A (ja) | 1983-11-09 | 1983-11-09 | 集積回路基板の電極製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60102762A JPS60102762A (ja) | 1985-06-06 |
| JPH0443417B2 true JPH0443417B2 (https=) | 1992-07-16 |
Family
ID=16566785
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58209072A Granted JPS60102762A (ja) | 1983-11-09 | 1983-11-09 | 集積回路基板の電極製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60102762A (https=) |
-
1983
- 1983-11-09 JP JP58209072A patent/JPS60102762A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60102762A (ja) | 1985-06-06 |
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