JPH0439768B2 - - Google Patents

Info

Publication number
JPH0439768B2
JPH0439768B2 JP59032443A JP3244384A JPH0439768B2 JP H0439768 B2 JPH0439768 B2 JP H0439768B2 JP 59032443 A JP59032443 A JP 59032443A JP 3244384 A JP3244384 A JP 3244384A JP H0439768 B2 JPH0439768 B2 JP H0439768B2
Authority
JP
Japan
Prior art keywords
coating
wafer
resist
cup
negative pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59032443A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60177626A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3244384A priority Critical patent/JPS60177626A/ja
Publication of JPS60177626A publication Critical patent/JPS60177626A/ja
Publication of JPH0439768B2 publication Critical patent/JPH0439768B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
JP3244384A 1984-02-24 1984-02-24 塗布装置 Granted JPS60177626A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3244384A JPS60177626A (ja) 1984-02-24 1984-02-24 塗布装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3244384A JPS60177626A (ja) 1984-02-24 1984-02-24 塗布装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP10514994A Division JPH0824893B2 (ja) 1994-05-19 1994-05-19 塗膜の形成方法

Publications (2)

Publication Number Publication Date
JPS60177626A JPS60177626A (ja) 1985-09-11
JPH0439768B2 true JPH0439768B2 (cg-RX-API-DMAC7.html) 1992-06-30

Family

ID=12359103

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3244384A Granted JPS60177626A (ja) 1984-02-24 1984-02-24 塗布装置

Country Status (1)

Country Link
JP (1) JPS60177626A (cg-RX-API-DMAC7.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6015953A (en) * 1994-03-11 2000-01-18 Tohoku Electric Power Co., Inc. Tension clamp for stranded conductor

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58171819A (ja) * 1982-04-01 1983-10-08 Toshiba Corp 半導体処理装置
JPS5918636A (ja) * 1982-07-22 1984-01-31 Nec Corp ホトレジストの被着方法

Also Published As

Publication number Publication date
JPS60177626A (ja) 1985-09-11

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