JPS60177626A - 塗布装置 - Google Patents
塗布装置Info
- Publication number
- JPS60177626A JPS60177626A JP3244384A JP3244384A JPS60177626A JP S60177626 A JPS60177626 A JP S60177626A JP 3244384 A JP3244384 A JP 3244384A JP 3244384 A JP3244384 A JP 3244384A JP S60177626 A JPS60177626 A JP S60177626A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- wafer
- coating
- cup
- negative pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3244384A JPS60177626A (ja) | 1984-02-24 | 1984-02-24 | 塗布装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3244384A JPS60177626A (ja) | 1984-02-24 | 1984-02-24 | 塗布装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10514994A Division JPH0824893B2 (ja) | 1994-05-19 | 1994-05-19 | 塗膜の形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60177626A true JPS60177626A (ja) | 1985-09-11 |
| JPH0439768B2 JPH0439768B2 (cg-RX-API-DMAC7.html) | 1992-06-30 |
Family
ID=12359103
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3244384A Granted JPS60177626A (ja) | 1984-02-24 | 1984-02-24 | 塗布装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60177626A (cg-RX-API-DMAC7.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6015953A (en) * | 1994-03-11 | 2000-01-18 | Tohoku Electric Power Co., Inc. | Tension clamp for stranded conductor |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58171819A (ja) * | 1982-04-01 | 1983-10-08 | Toshiba Corp | 半導体処理装置 |
| JPS5918636A (ja) * | 1982-07-22 | 1984-01-31 | Nec Corp | ホトレジストの被着方法 |
-
1984
- 1984-02-24 JP JP3244384A patent/JPS60177626A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58171819A (ja) * | 1982-04-01 | 1983-10-08 | Toshiba Corp | 半導体処理装置 |
| JPS5918636A (ja) * | 1982-07-22 | 1984-01-31 | Nec Corp | ホトレジストの被着方法 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6015953A (en) * | 1994-03-11 | 2000-01-18 | Tohoku Electric Power Co., Inc. | Tension clamp for stranded conductor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0439768B2 (cg-RX-API-DMAC7.html) | 1992-06-30 |
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