JPH0437922B2 - - Google Patents
Info
- Publication number
- JPH0437922B2 JPH0437922B2 JP59151211A JP15121184A JPH0437922B2 JP H0437922 B2 JPH0437922 B2 JP H0437922B2 JP 59151211 A JP59151211 A JP 59151211A JP 15121184 A JP15121184 A JP 15121184A JP H0437922 B2 JPH0437922 B2 JP H0437922B2
- Authority
- JP
- Japan
- Prior art keywords
- transparent thin
- thin film
- film pattern
- pattern
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 claims description 51
- 238000005286 illumination Methods 0.000 claims description 49
- 230000007547 defect Effects 0.000 claims description 37
- 238000001514 detection method Methods 0.000 claims description 16
- 239000010408 film Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 10
- 230000003287 optical effect Effects 0.000 claims description 6
- 238000000926 separation method Methods 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 26
- 235000012431 wafers Nutrition 0.000 description 15
- 238000010586 diagram Methods 0.000 description 10
- 230000002159 abnormal effect Effects 0.000 description 5
- 238000007689 inspection Methods 0.000 description 5
- 230000015654 memory Effects 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 230000005856 abnormality Effects 0.000 description 3
- 230000002950 deficient Effects 0.000 description 3
- 239000003086 colorant Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 101700004678 SLIT3 Proteins 0.000 description 1
- 102100025490 Slit homolog 1 protein Human genes 0.000 description 1
- 101710123186 Slit homolog 1 protein Proteins 0.000 description 1
- 102100027339 Slit homolog 3 protein Human genes 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15121184A JPS6129712A (ja) | 1984-07-23 | 1984-07-23 | 微細パタ−ンの欠陥検出方法及びその装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15121184A JPS6129712A (ja) | 1984-07-23 | 1984-07-23 | 微細パタ−ンの欠陥検出方法及びその装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6129712A JPS6129712A (ja) | 1986-02-10 |
JPH0437922B2 true JPH0437922B2 (zh) | 1992-06-22 |
Family
ID=15513662
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15121184A Granted JPS6129712A (ja) | 1984-07-23 | 1984-07-23 | 微細パタ−ンの欠陥検出方法及びその装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6129712A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009150725A (ja) * | 2007-12-19 | 2009-07-09 | Hitachi High-Technologies Corp | 欠陥検査装置 |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2605115A1 (fr) * | 1986-10-01 | 1988-04-15 | Primat Didier | Dispositif d'acquisition optique multivoies a eclairage integre |
JPS63190261A (ja) * | 1987-01-31 | 1988-08-05 | Pentel Kk | 電池 |
JPH0541551Y2 (zh) * | 1987-02-16 | 1993-10-20 | ||
JPH02170279A (ja) * | 1988-12-23 | 1990-07-02 | Hitachi Ltd | 被検査対象パターンの欠陥検出方法及びその装置 |
US6411377B1 (en) | 1991-04-02 | 2002-06-25 | Hitachi, Ltd. | Optical apparatus for defect and particle size inspection |
JP2827843B2 (ja) * | 1993-10-18 | 1998-11-25 | 村田機械株式会社 | パッケージの汚れ検査方法 |
JP2822937B2 (ja) * | 1995-07-17 | 1998-11-11 | 株式会社日立製作所 | 半導体装置の製造システム及び欠陥検査方法 |
JP4001653B2 (ja) * | 1996-08-29 | 2007-10-31 | ケーエルエー・インストルメンツ・コーポレーション | 試料からの多重チャネル応答を用いた試料の光学的検査 |
JPH11237344A (ja) * | 1998-02-19 | 1999-08-31 | Hitachi Ltd | 欠陥検査方法およびその装置 |
US6847442B1 (en) * | 1998-06-16 | 2005-01-25 | Orbotech, Ltd. | Illuminator for inspecting substantially flat surfaces |
JP3981696B2 (ja) * | 1998-07-28 | 2007-09-26 | 株式会社日立製作所 | 欠陥検査装置およびその方法 |
JP3904581B2 (ja) * | 1998-07-28 | 2007-04-11 | 株式会社日立製作所 | 欠陥検査装置およびその方法 |
JP3904565B2 (ja) * | 1998-07-28 | 2007-04-11 | 株式会社日立製作所 | 欠陥検査装置およびその方法 |
AU1412000A (en) | 1998-11-30 | 2000-06-19 | Olympus Optical Co., Ltd. | Measuring instrument |
JP2005308725A (ja) * | 2004-03-26 | 2005-11-04 | Sumitomo Osaka Cement Co Ltd | 透明板欠陥検査装置 |
JP4826750B2 (ja) * | 2005-04-08 | 2011-11-30 | オムロン株式会社 | 欠陥検査方法およびその方法を用いた欠陥検査装置 |
JP4716827B2 (ja) * | 2005-09-13 | 2011-07-06 | 株式会社東京精密 | 外観検査装置及び外観検査方法 |
JP4723362B2 (ja) * | 2005-11-29 | 2011-07-13 | 株式会社日立ハイテクノロジーズ | 光学式検査装置及びその方法 |
US7782452B2 (en) * | 2007-08-31 | 2010-08-24 | Kla-Tencor Technologies Corp. | Systems and method for simultaneously inspecting a specimen with two distinct channels |
JP2009222689A (ja) * | 2008-03-19 | 2009-10-01 | Nuflare Technology Inc | 検査装置 |
JP6861092B2 (ja) * | 2017-05-24 | 2021-04-21 | 株式会社カネカ | 電子部品の外観検査方法及び外観検査装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5767844A (en) * | 1980-10-15 | 1982-04-24 | Nippon Kogaku Kk <Nikon> | Surface inspecting device |
JPS58120106A (ja) * | 1982-01-12 | 1983-07-16 | Hitachi Ltd | 半導体ウエハの外観検査装置 |
JPS5977345A (ja) * | 1982-10-27 | 1984-05-02 | Toshiba Corp | 表面きず検出方法 |
-
1984
- 1984-07-23 JP JP15121184A patent/JPS6129712A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5767844A (en) * | 1980-10-15 | 1982-04-24 | Nippon Kogaku Kk <Nikon> | Surface inspecting device |
JPS58120106A (ja) * | 1982-01-12 | 1983-07-16 | Hitachi Ltd | 半導体ウエハの外観検査装置 |
JPS5977345A (ja) * | 1982-10-27 | 1984-05-02 | Toshiba Corp | 表面きず検出方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009150725A (ja) * | 2007-12-19 | 2009-07-09 | Hitachi High-Technologies Corp | 欠陥検査装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6129712A (ja) | 1986-02-10 |
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