JPH043496Y2 - - Google Patents

Info

Publication number
JPH043496Y2
JPH043496Y2 JP16426483U JP16426483U JPH043496Y2 JP H043496 Y2 JPH043496 Y2 JP H043496Y2 JP 16426483 U JP16426483 U JP 16426483U JP 16426483 U JP16426483 U JP 16426483U JP H043496 Y2 JPH043496 Y2 JP H043496Y2
Authority
JP
Japan
Prior art keywords
arm
electrode
wafer
electrodes
semiconductor wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16426483U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6073232U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16426483U priority Critical patent/JPS6073232U/ja
Publication of JPS6073232U publication Critical patent/JPS6073232U/ja
Application granted granted Critical
Publication of JPH043496Y2 publication Critical patent/JPH043496Y2/ja
Granted legal-status Critical Current

Links

JP16426483U 1983-10-24 1983-10-24 ウエハロ−デング装置 Granted JPS6073232U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16426483U JPS6073232U (ja) 1983-10-24 1983-10-24 ウエハロ−デング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16426483U JPS6073232U (ja) 1983-10-24 1983-10-24 ウエハロ−デング装置

Publications (2)

Publication Number Publication Date
JPS6073232U JPS6073232U (ja) 1985-05-23
JPH043496Y2 true JPH043496Y2 (enrdf_load_stackoverflow) 1992-02-04

Family

ID=30360179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16426483U Granted JPS6073232U (ja) 1983-10-24 1983-10-24 ウエハロ−デング装置

Country Status (1)

Country Link
JP (1) JPS6073232U (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6073232U (ja) 1985-05-23

Similar Documents

Publication Publication Date Title
US6737613B2 (en) Heat treatment apparatus and method for processing substrates
US8028652B2 (en) Batch-type remote plasma processing apparatus
JPH0812846B2 (ja) 半導体製造装置
JP2002280378A (ja) バッチ式リモートプラズマ処理装置
JPH05243166A (ja) 半導体基板の気相成長装置
JPH043496Y2 (enrdf_load_stackoverflow)
JPH0639358B2 (ja) 有機金属気相成長装置
JPH06136543A (ja) プラズマcvd装置
JP2004335591A (ja) Cvd装置及び半導体装置の製造方法及び半導体装置
CN218491841U (zh) Cvd反应器的晶圆固定机构
JPH0650983Y2 (ja) 薄膜形成装置の基板カート
EP0595300A1 (en) Apparatus for manufacturing semiconductor device
JP3184550B2 (ja) 気相成長方法及びその装置
JPS61287220A (ja) 気相成長装置
JP2511845B2 (ja) 気相成長などの処理装置
JPH1167873A (ja) 半導体ウエハの処理方法および装置
JPH0110927Y2 (enrdf_load_stackoverflow)
JPS5980927A (ja) エピタキシヤル成長装置
KR100918663B1 (ko) 반도체 제조 장치
JP3040991B2 (ja) 半導体製造装置
JPS62219912A (ja) プラズマcvd装置
JPH09115838A (ja) 成膜装置
JPH09148253A (ja) 半導体熱処理装置
JPH02175879A (ja) 化学的気相成長方法及び化学的気相成長装置
JPS6142920Y2 (enrdf_load_stackoverflow)