JPH0434143B2 - - Google Patents

Info

Publication number
JPH0434143B2
JPH0434143B2 JP60016205A JP1620585A JPH0434143B2 JP H0434143 B2 JPH0434143 B2 JP H0434143B2 JP 60016205 A JP60016205 A JP 60016205A JP 1620585 A JP1620585 A JP 1620585A JP H0434143 B2 JPH0434143 B2 JP H0434143B2
Authority
JP
Japan
Prior art keywords
metal
silicon
glass substrate
transparent glass
metal silicide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60016205A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61173253A (ja
Inventor
Yaichiro Watakabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP60016205A priority Critical patent/JPS61173253A/ja
Publication of JPS61173253A publication Critical patent/JPS61173253A/ja
Publication of JPH0434143B2 publication Critical patent/JPH0434143B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60016205A 1985-01-28 1985-01-28 フオトマスクブランクの形成方法 Granted JPS61173253A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60016205A JPS61173253A (ja) 1985-01-28 1985-01-28 フオトマスクブランクの形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60016205A JPS61173253A (ja) 1985-01-28 1985-01-28 フオトマスクブランクの形成方法

Publications (2)

Publication Number Publication Date
JPS61173253A JPS61173253A (ja) 1986-08-04
JPH0434143B2 true JPH0434143B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-06-05

Family

ID=11910009

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60016205A Granted JPS61173253A (ja) 1985-01-28 1985-01-28 フオトマスクブランクの形成方法

Country Status (1)

Country Link
JP (1) JPS61173253A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4407815B2 (ja) 2004-09-10 2010-02-03 信越化学工業株式会社 フォトマスクブランク及びフォトマスク
JP5007843B2 (ja) * 2009-09-24 2012-08-22 信越化学工業株式会社 フォトマスクブランク及びフォトマスク

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5323277A (en) * 1976-08-14 1978-03-03 Konishiroku Photo Ind Co Ltd Photomasking material and photomask
JPS60176235A (ja) * 1984-02-22 1985-09-10 Nippon Kogaku Kk <Nikon> Ｘ線露光用マスク原板

Also Published As

Publication number Publication date
JPS61173253A (ja) 1986-08-04

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