JPH0432753Y2 - - Google Patents

Info

Publication number
JPH0432753Y2
JPH0432753Y2 JP1990093620U JP9362090U JPH0432753Y2 JP H0432753 Y2 JPH0432753 Y2 JP H0432753Y2 JP 1990093620 U JP1990093620 U JP 1990093620U JP 9362090 U JP9362090 U JP 9362090U JP H0432753 Y2 JPH0432753 Y2 JP H0432753Y2
Authority
JP
Japan
Prior art keywords
substrate
light
laser beam
irradiation
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1990093620U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0351832U (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1990093620U priority Critical patent/JPH0432753Y2/ja
Publication of JPH0351832U publication Critical patent/JPH0351832U/ja
Application granted granted Critical
Publication of JPH0432753Y2 publication Critical patent/JPH0432753Y2/ja
Expired legal-status Critical Current

Links

JP1990093620U 1990-09-06 1990-09-06 Expired JPH0432753Y2 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990093620U JPH0432753Y2 (enrdf_load_stackoverflow) 1990-09-06 1990-09-06

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990093620U JPH0432753Y2 (enrdf_load_stackoverflow) 1990-09-06 1990-09-06

Publications (2)

Publication Number Publication Date
JPH0351832U JPH0351832U (enrdf_load_stackoverflow) 1991-05-20
JPH0432753Y2 true JPH0432753Y2 (enrdf_load_stackoverflow) 1992-08-06

Family

ID=31642988

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1990093620U Expired JPH0432753Y2 (enrdf_load_stackoverflow) 1990-09-06 1990-09-06

Country Status (1)

Country Link
JP (1) JPH0432753Y2 (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001348042A (ja) * 2000-06-05 2001-12-18 Masayuki Yoshioka 包装用袋
JP5007543B2 (ja) * 2006-09-21 2012-08-22 大日本印刷株式会社 ユニバーサルデザインパウチ

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5927011B2 (ja) * 1975-10-21 1984-07-03 松下電器産業株式会社 コウガクテキジヨウホウキロクサイセイソウチ
JPS5326114A (en) * 1977-04-28 1978-03-10 Nippon Gakki Seizo Kk Electronic musical instrument

Also Published As

Publication number Publication date
JPH0351832U (enrdf_load_stackoverflow) 1991-05-20

Similar Documents

Publication Publication Date Title
US4037969A (en) Zone plate alignment marks
EP3330798B1 (en) Maskless photolithographic system in cooperative working mode for cross-scale structure
KR100738262B1 (ko) 포토리소그래피와 전자빔 리소그래피의 하이브리드 장치 및 그 동작 방법
EP0052892A2 (en) Laser beam scanning system
JPH0729810A (ja) 走査型露光装置
Chan et al. Development and applications of a laser writing lithography system for maskless patterning
US4422763A (en) Automatic photomask alignment system for projection printing
GB2040444A (en) Automatic Photomask Alignment System for Projection Printing
JPH0432753Y2 (enrdf_load_stackoverflow)
US7012270B2 (en) Photolithography system having multiple adjustable light sources
JPH04342111A (ja) 投影露光方法及びその装置
JP2019079030A (ja) 露光装置および物品の製造方法
JPS62179725A (ja) 光集積回路用レ−ザ−ビ−ム直接描画装置
Arnone The laser-plotter: a versatile lithographic tool for integrated optics and microelectronics
CN115327867B (zh) 一种高速高精度对准的激光直写光刻方法与装置
JP2019079029A (ja) 露光装置および物品の製造方法
JP2002208558A (ja) レーザ描画装置
JPH0355553A (ja) 露光装置
JPS6216526A (ja) 投影露光装置及びそれを用いたデバイス製造方法
JP3282231B2 (ja) 投影露光装置及び方法
JP4015234B2 (ja) レーザービーム直接描画装置
JPS62241330A (ja) 露光装置における位置合わせ方法
JPS6340316A (ja) 半導体製造装置
KR100221022B1 (ko) 반도체 노광 장치
JPH1154419A (ja) レーザービーム直接描画装置