JPH04323572A - Method for inspecting circuit pattern - Google Patents

Method for inspecting circuit pattern

Info

Publication number
JPH04323572A
JPH04323572A JP3090940A JP9094091A JPH04323572A JP H04323572 A JPH04323572 A JP H04323572A JP 3090940 A JP3090940 A JP 3090940A JP 9094091 A JP9094091 A JP 9094091A JP H04323572 A JPH04323572 A JP H04323572A
Authority
JP
Japan
Prior art keywords
probe
capacitance
pattern
circuit pattern
value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3090940A
Other languages
Japanese (ja)
Inventor
Takahiro Suzuki
孝弘 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP3090940A priority Critical patent/JPH04323572A/en
Publication of JPH04323572A publication Critical patent/JPH04323572A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent generation of failures by measuring electrostatic capacities twice when a probe is lowered and raised, and calculating the electrostatic capacity of a pattern to be inspected from the measured values if the difference between the values is not more than a specified value, so as to make a decision as to whether the pattern is good or bad. CONSTITUTION:When inspection is started, a probe 17a is raised and separated from a pattern 19 to be inspected, and under this state an electrostatic capacity CUP is measured in order to correct changes in the value of the electrostatic capacity due to the influence of the probe. Then the probe 17b is lowered and the electrostatic capacity CDOWN is measured: In order to correct the amount of changes in the electrostatic capacity due to the influence of the probe, an electrostatic capacity CP(= CDOWN-CUP) is calculated from these values and is utilized in making a decision as to whether the circuit pattern is good or bad. When the result of the decision shows that the pattern has passed the inspection or is short, operation for making a decision again is not performed but the next measurement is started and when the result of the measurement shows that the pattern has an open failure, operation for making a decision again is performed.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、印刷配線基板の回路パ
ターンの検査方法に関し、特に回路パターンのオープン
またはショート検査における再判定方式に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for inspecting circuit patterns on printed wiring boards, and more particularly to a re-judgment method for inspecting circuit patterns for open or short circuits.

【0002】0002

【従来の技術】図2は従来の回路パターンの検査方法の
一例を示すフローチャート、図3は図1の実施例および
図2の例におけるプローブの動作状態を示す側面図で、
(a)はプローブの上昇状態を示す図、(b)はプロー
ブの下降状態を示す図である。
2 is a flowchart showing an example of a conventional circuit pattern inspection method, and FIG. 3 is a side view showing the operating state of a probe in the embodiment of FIG. 1 and the example of FIG.
(a) is a diagram showing a raised state of the probe, and (b) is a diagram showing a lowered state of the probe.

【0003】印刷配線基板の回路パターンの検査方法に
おいて、回路パターンのオープンまたはショートを検査
するための従来の判定方式は、検査対象の回路パターン
(被検査パターン)の静電容量を測定し、その値をその
回路パターンの設計上の長さから理論的に算出した値と
比較することによってオープン不良またはショート不良
を判定する方式を採用している。
[0003] In a method for inspecting a circuit pattern of a printed wiring board, the conventional judgment method for inspecting an open or short circuit pattern is to measure the capacitance of the circuit pattern to be inspected (pattern to be inspected), and A method is used to determine whether an open defect or a short defect exists by comparing the value with a value theoretically calculated from the designed length of the circuit pattern.

【0004】すなわち、図2に示すように、検査を開始
(参照符号1)すると、プローブの上昇状態(図3(a
)に示す状態で、プローブ17aが被検査パターン19
から離れている状態)において静電容量CUPを測定(
参照符号2)し、次にプローブの下降状態(図3(b)
に示す状態で、プローブ17bが被検査パターン19と
接触している状態)において静電容量CDWN を測定
(参照符号3)し、プローブの影響による静電容量値の
変化を補正するため、それらの値から静電容量CP (
=CDWN −CUP)を算出(参照符号4)し、その
値から回路パターンの良否を判定(参照符号5)し、判
定結果がパスまたはショート判定であるときは、再判定
動作は行わず、次の被検査パターン(次パターン)の測
定に移行(参照符号16)する。判定結果がオープン不
良であるときは、プローブの下降状態(図3(b)に示
す状態)で再度静電容量CN の測定を行い(参照符号
6)、その測定値から静電容量CS (=CN −CU
P)を算出(参照符号14)し、その再算出値から被検
査パターンの良否の判定を行い(参照符号15)、次の
被検査パターン(次パターン)の測定に移行(参照符号
16)する。
That is, as shown in FIG. 2, when the inspection is started (reference numeral 1), the probe is in the raised state (FIG. 3(a)
), the probe 17a touches the pattern 19 to be inspected.
Measure the capacitance CUP (at a distance from
(reference number 2), and then the lowering state of the probe (Fig. 3(b)).
The capacitance CDWN is measured (reference numeral 3) in the state shown in FIG. From the value, the capacitance CP (
= CDWN - CUP) (reference numeral 4), and from that value determine the acceptability of the circuit pattern (reference numeral 5). If the judgment result is a pass or short judgment, the re-judgment operation is not performed and the next The process moves on to measurement of the pattern to be inspected (next pattern) (reference numeral 16). If the judgment result is an open failure, measure the capacitance CN again (reference number 6) with the probe in the lowered state (the state shown in Fig. 3(b)), and from the measured value, calculate the capacitance CS (= CN-CU
P) is calculated (reference numeral 14), the quality of the inspected pattern is determined from the recalculated value (reference numeral 15), and the next inspection pattern (next pattern) is measured (reference numeral 16). .

【0005】[0005]

【発明が解決しようとする課題】上述したような従来の
印刷配線基板の回路パターンののオープンまたはショー
ト検査における再判定方式は、疑似的なオープン不良を
除外するための再判定動作として、プローブの下降状態
(図3(b)に示す状態)のみで静電容量の再測定を行
ってその測定値から回路パターンの良否の判定を行って
いるため、疑似的なオープン不良の原因である誤測定の
うち、プローブの上昇状態(図3(a)に示す状態)に
おける誤測定に対する対策がなく、プローブの上昇状態
における誤測定に起因する疑似的なオープン不良が発生
したときは、再判定を行っても、再度オープン不良にな
ってしまうという欠点を有している。
[Problems to be Solved by the Invention] In the conventional re-judgment method for inspecting open or short circuit patterns of printed wiring boards as described above, as a re-judgment operation to exclude pseudo-open defects, the probe is Because the capacitance is remeasured only in the falling state (the state shown in Figure 3(b)) and the quality of the circuit pattern is determined based on the measured value, erroneous measurements that are the cause of spurious open defects occur. If there is no countermeasure against erroneous measurements when the probe is in the raised state (the state shown in Figure 3(a)), and a pseudo-open failure occurs due to erroneous measurements in the raised state of the probe, a re-judgment is performed. However, it has the disadvantage that the open failure will occur again.

【0006】また、測定が正しく行われているか否かに
ついても、単純に再測定を行っているのみで特別な対策
がないため、再測定値にノイズによる誤測定があっった
とき、再度オープン不良になってしまうという問題点も
有している。
[0006] Furthermore, as to whether or not the measurement is being performed correctly, there is no special countermeasure since the measurement is simply remeasured, so if there is an error in the remeasured value due to noise, it is necessary to open the system again. It also has the problem of becoming defective.

【0007】[0007]

【課題を解決するための手段】本発明の回路パターンの
検査方法は、印刷配線基板の回路パターンの検査方法に
おける回路パターンのオープンまたはショートを検査す
るための判定方式であって、任意の回路パターンの判定
がオープン不良判定であったとき、プローブの下降状態
で静電容量の再測定を行い、その測定値が前回の測定値
とほぼ等しくなるまで測定を繰返えし、続いてプローブ
の上昇状態で静電容量の再測定を行い、その測定値が前
回の測定値とほぼ等しくなるまで測定を繰返えし、これ
らの値からその回路パターンの静電容量を算出して再判
定を行うことを含んでいる。
[Means for Solving the Problems] The circuit pattern inspection method of the present invention is a determination method for inspecting open or short circuit patterns in a circuit pattern inspection method of a printed wiring board, and is a method for inspecting an arbitrary circuit pattern. If the judgment is that the capacitance is open, the capacitance is remeasured with the probe lowered, and the measurement is repeated until the measured value is almost equal to the previous measurement value, and then the capacitance is remeasured with the probe lowered. Measure the capacitance again in the current state, repeat the measurement until the measured value is almost equal to the previous measured value, calculate the capacitance of the circuit pattern from these values, and re-evaluate. It includes that.

【0008】[0008]

【実施例】次に、本発明の実施例について図面を参照し
て説明する。
Embodiments Next, embodiments of the present invention will be described with reference to the drawings.

【0009】図1は本発明の一実施例を示すフローチャ
ート、図3は図1の実施例および図2の例におけるプロ
ーブの動作状態を示す側面図で、(a)はプローブの上
昇状態を示す図、(b)はプローブの下降状態を示す図
である。
FIG. 1 is a flowchart showing one embodiment of the present invention, and FIG. 3 is a side view showing the operating state of the probe in the embodiment of FIG. 1 and the example of FIG. 2, and (a) shows the rising state of the probe. FIG. 5B is a diagram showing a lowered state of the probe.

【0010】本実施例は、図1に示すように、検査を開
始(参照符号1)すると、図3(a)に示すように、プ
ローブ17aを上昇させて被検査パターン19から離し
た状態とし、プローブの影響による静電容量値の変化を
補正するため、その状態で静電容量CUPを測定(参照
符号2)する。次にプローブを下降状態(図3(b)に
示す状態)として静電容量CDWN を測定(参照符号
3)する。ここでプローブの影響による静電容量値の変
化分を補正するため、それらの値から静電容量CP (
=CDWN −CUP)を算出(参照符号4)し、その
値から回路パターンの良否を判定(参照符号5)を行う
。判定結果がパスまたはショート判定であるときは、再
判定動作は行わず、次の被検査パターン(次パターン)
の測定に移行(参照符号16)する。判定結果がオープ
ン不良であるときは、再判定動作を行う。再判定動作は
、まずプローブを下降状態として静電容量CN の測定
を行い(参照符号6)、次に同じ状態で再度静電容量C
N+1 の測定を行う(参照符号7)。この後、静電容
量CN と静電容量CN+1 との比較を行い(参照符
号8)、CN とCN+1 とがほぼ等しくなければ、
上述の動作を繰返す。CN とCN+1 とがほぼ等し
くなったときは、プローブ17aを上昇状態として静電
容量CM の測定を行い(参照符号9)、次に同じ状態
で再度静電容量CM+1 の測定を行う(参照符号10
)。この後、静電容量CM と静電容量CM+1 との
比較を行い(参照符号11)、CM とCM+1 とが
ほぼ等しくなければ、上述の動作を繰返す。CM とC
M+1 とがほぼ等しくなったときは、その被検査パタ
ーンの静電容量CR (=CN −CM )を算出(参
照符号12)し、この値を元に再判定を行い(参照符号
13)、次被検査パターン(次パターン)の測定に移行
(参照符号16)する。
In this embodiment, as shown in FIG. 1, when the inspection is started (reference numeral 1), the probe 17a is raised and separated from the pattern to be inspected 19, as shown in FIG. 3(a). , in order to correct the change in capacitance value due to the influence of the probe, the capacitance CUP is measured in that state (reference numeral 2). Next, the capacitance CDWN is measured (reference numeral 3) with the probe in the lowered state (the state shown in FIG. 3(b)). Here, in order to correct the change in capacitance value due to the influence of the probe, we calculate the capacitance CP (
=CDWN-CUP) (reference numeral 4), and the quality of the circuit pattern is determined from that value (reference numeral 5). If the judgment result is a pass or short judgment, the re-judgment operation is not performed and the next pattern to be inspected (next pattern) is executed.
(reference numeral 16). If the judgment result is an open failure, a re-judgment operation is performed. In the re-judgment operation, first measure the capacitance CN with the probe in the lowered state (reference number 6), then measure the capacitance C again in the same state.
N+1 measurements are taken (reference number 7). After this, a comparison is made between capacitance CN and capacitance CN+1 (reference numeral 8), and if CN and CN+1 are not approximately equal, then
Repeat the above operation. When CN and CN+1 are almost equal, measure the capacitance CM with the probe 17a in the raised state (reference number 9), and then measure the capacitance CM+1 again in the same state (reference number 10).
). Thereafter, capacitance CM and capacitance CM+1 are compared (reference numeral 11), and if CM and CM+1 are not approximately equal, the above-described operation is repeated. CM and C
When M+1 becomes almost equal, the capacitance CR (=CN - CM) of the pattern to be inspected is calculated (reference numeral 12), re-judgment is performed based on this value (reference numeral 13), and the next The process moves on to measurement of the pattern to be inspected (next pattern) (reference numeral 16).

【0011】[0011]

【発明の効果】以上説明したように、本発明の回路パタ
ーンの検査方法は、プローブの下降状態で静電容量の測
定を2回以上行い、その差が規定値以下であればその測
定を完了させてプローブの影響による静電容量値の変化
を補正するためにプローブの上昇状態における静電容量
の測定に移行し、プローブの上昇状態で静電容量の測定
を2回以上行い、その差が規定値以下であればその測定
を完了させ、それらの値から被検査パターンの静電容量
を算出して良否の判定を行うことにより、測定タイミン
グのずれ等に起因する誤測定によって疑似的なオープン
不良が発生するの防止できるという効果がある。
[Effects of the Invention] As explained above, in the circuit pattern inspection method of the present invention, capacitance is measured two or more times with the probe in the lowered state, and if the difference is less than a specified value, the measurement is completed. Then, in order to correct the change in capacitance value due to the influence of the probe, we moved to measuring capacitance with the probe in the raised state, and measured the capacitance two or more times with the probe in the raised state, and confirmed the difference between them. If it is less than the specified value, the measurement is completed, and the capacitance of the pattern to be inspected is calculated from those values to determine pass/fail, thereby preventing false open-circuits caused by erroneous measurements due to deviations in measurement timing, etc. This has the effect of preventing defects from occurring.

【図面の簡単な説明】[Brief explanation of drawings]

【図1】本発明の一実施例を示すフローチャートである
FIG. 1 is a flowchart showing one embodiment of the present invention.

【図2】従来の回路パターンの検査方法の一例を示すフ
ローチャートである。
FIG. 2 is a flowchart illustrating an example of a conventional circuit pattern inspection method.

【図3】図1の実施例および図2の例におけるプローブ
の動作状態を示す側面図で、(a)はプローブの上昇状
態を示す図、(b)はプローブの下降状態を示す図であ
る。
FIG. 3 is a side view showing the operating state of the probe in the embodiment of FIG. 1 and the example of FIG. 2, in which (a) is a diagram showing the probe in the raised state, and (b) is a diagram showing the probe in the lowered state. .

【符号の説明】[Explanation of symbols]

1    開始 2    プローブの上昇状態での測定3    プロ
ーブの下降状態での測定4    パターン静電容量算
出 5    パターン良否判定 6    プローブの下降状態での再測定7    プ
ローブの下降状態での再測定8    判定 9    プローブの上昇状態での再測定10    
プローブの上昇状態での再測定11    判定 12    パターン静電容量再算出 13    パターンの再判定 14    パターン静電容量再算出 15    パターンの再判定 16    次パターンへ
1 Start 2 Measurement with the probe in the raised state 3 Measurement with the probe in the lowered state 4 Pattern capacitance calculation 5 Pattern pass/fail judgment 6 Re-measurement with the probe in the lowered state 7 Re-measurement with the probe in the lowered state 8 Judgment 9 Probe Re-measurement 10 in the rising state of
Re-measurement with the probe in the raised state 11 Judgment 12 Re-calculation of pattern capacitance 13 Re-determination of pattern 14 Re-calculation of pattern capacitance 15 Re-determination of pattern 16 Go to next pattern

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】  印刷配線基板の回路パターンの検査方
法における回路パターンのオープンまたはショートを検
査するための判定方式であって、任意の回路パターンの
判定がオープン不良判定であったとき、プローブの下降
状態で静電容量の再測定を行い、その測定値が前回の測
定値とほぼ等しくなるまで測定を繰返えし、続いてプロ
ーブの上昇状態で静電容量の再測定を行い、その測定値
が前回の測定値とほぼ等しくなるまで測定を繰返えし、
これらの値からその回路パターンの静電容量を算出して
再判定を行うことを含むことを特徴とする回路パターン
の検査方法。
Claim 1: A determination method for inspecting open or short circuit patterns in a method for inspecting circuit patterns of printed wiring boards, wherein when the determination of any circuit pattern is an open defect determination, the probe is lowered. re-measure the capacitance with the probe in the raised state, repeat the measurement until the measured value is approximately equal to the previous measured value, then re-measure the capacitance with the probe in the raised state, and the measured value Repeat the measurement until the value is almost equal to the previous measurement value,
A method for inspecting a circuit pattern, comprising calculating the capacitance of the circuit pattern from these values and re-judging it.
【請求項2】  印刷配線基板の回路パターンの検査方
法における回路パターンのオープンまたはショートを検
査するための判定方式であって、プローブの上昇状態と
プローブの下降状態とにおいて静電容量の測定を行って
それらの値から回路パターンの静電容量を算出し、その
算出値から回路パターンの良否の判定を行ったとき、そ
の判定がオープン不良判定であったとき、プローブの下
降状態で静電容量の再測定を行い、その測定値が前回の
測定値とほぼ等しくなるまで測定を繰返えし、プローブ
の上昇状態で静電容量の再測定を行い、その測定値が前
回の測定値とほぼ等しくなるまで測定を繰返えし、これ
らの値からその回路パターンの静電容量を算出して再判
定を行うことを含むことを特徴とする回路パターンの検
査方法。
2. A determination method for inspecting open or short circuit patterns in a method for inspecting circuit patterns of printed wiring boards, the method comprising measuring capacitance in a raised state of a probe and in a lowered state of the probe. When the capacitance of the circuit pattern is calculated from those values and the circuit pattern is judged to be good or bad from the calculated value, if the judgment is open failure, the capacitance is Take a new measurement and repeat the measurement until the measured value is approximately equal to the previous measured value, then remeasure the capacitance with the probe in the raised state and the measured value is approximately equal to the previous measured value. 1. A method for inspecting a circuit pattern, comprising repeating measurements until a value is obtained, calculating the capacitance of the circuit pattern from these values, and re-judging the capacitance of the circuit pattern.
JP3090940A 1991-04-23 1991-04-23 Method for inspecting circuit pattern Pending JPH04323572A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3090940A JPH04323572A (en) 1991-04-23 1991-04-23 Method for inspecting circuit pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3090940A JPH04323572A (en) 1991-04-23 1991-04-23 Method for inspecting circuit pattern

Publications (1)

Publication Number Publication Date
JPH04323572A true JPH04323572A (en) 1992-11-12

Family

ID=14012453

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3090940A Pending JPH04323572A (en) 1991-04-23 1991-04-23 Method for inspecting circuit pattern

Country Status (1)

Country Link
JP (1) JPH04323572A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003014807A (en) * 2001-06-28 2003-01-15 Hioki Ee Corp Measuring method for capacitance as well as method and apparatus for inspection of circuit board
JP2003014808A (en) * 2001-06-28 2003-01-15 Hioki Ee Corp Creation method for reference data and circuit-board inspection apparatus
JP2003035739A (en) * 2001-07-24 2003-02-07 Hioki Ee Corp Method for preparing reference data
JP2009257801A (en) * 2008-04-14 2009-11-05 Hioki Ee Corp Method and apparatus for measuring insulation resistance

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003014807A (en) * 2001-06-28 2003-01-15 Hioki Ee Corp Measuring method for capacitance as well as method and apparatus for inspection of circuit board
JP2003014808A (en) * 2001-06-28 2003-01-15 Hioki Ee Corp Creation method for reference data and circuit-board inspection apparatus
JP4663918B2 (en) * 2001-06-28 2011-04-06 日置電機株式会社 Capacitance measurement method, circuit board inspection method, and circuit board inspection apparatus
JP2003035739A (en) * 2001-07-24 2003-02-07 Hioki Ee Corp Method for preparing reference data
JP4723128B2 (en) * 2001-07-24 2011-07-13 日置電機株式会社 Standard data creation method
JP2009257801A (en) * 2008-04-14 2009-11-05 Hioki Ee Corp Method and apparatus for measuring insulation resistance

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