JPH0430450B2 - - Google Patents
Info
- Publication number
- JPH0430450B2 JPH0430450B2 JP61246217A JP24621786A JPH0430450B2 JP H0430450 B2 JPH0430450 B2 JP H0430450B2 JP 61246217 A JP61246217 A JP 61246217A JP 24621786 A JP24621786 A JP 24621786A JP H0430450 B2 JPH0430450 B2 JP H0430450B2
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- less
- present
- cao
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000956 alloy Substances 0.000 claims description 52
- 229910045601 alloy Inorganic materials 0.000 claims description 50
- 238000007740 vapor deposition Methods 0.000 claims description 23
- 239000012535 impurity Substances 0.000 claims description 10
- 229910052804 chromium Inorganic materials 0.000 claims description 8
- 229910052802 copper Inorganic materials 0.000 claims description 8
- 229910052758 niobium Inorganic materials 0.000 claims description 8
- 229910052750 molybdenum Inorganic materials 0.000 claims description 7
- 230000005291 magnetic effect Effects 0.000 description 35
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 24
- 239000010409 thin film Substances 0.000 description 24
- 239000000292 calcium oxide Substances 0.000 description 23
- 235000012255 calcium oxide Nutrition 0.000 description 23
- 229910003271 Ni-Fe Inorganic materials 0.000 description 20
- 239000000463 material Substances 0.000 description 19
- 239000002184 metal Substances 0.000 description 18
- 229910052751 metal Inorganic materials 0.000 description 18
- 230000035699 permeability Effects 0.000 description 18
- 229910052719 titanium Inorganic materials 0.000 description 17
- 229910052782 aluminium Inorganic materials 0.000 description 15
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 14
- 230000000694 effects Effects 0.000 description 14
- 238000004544 sputter deposition Methods 0.000 description 13
- 238000000151 deposition Methods 0.000 description 11
- 230000008021 deposition Effects 0.000 description 11
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 229910000889 permalloy Inorganic materials 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000011819 refractory material Substances 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- 239000010408 film Substances 0.000 description 3
- 229910001004 magnetic alloy Inorganic materials 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000006104 solid solution Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- JHLNERQLKQQLRZ-UHFFFAOYSA-N calcium silicate Chemical compound [Ca+2].[Ca+2].[O-][Si]([O-])([O-])[O-] JHLNERQLKQQLRZ-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910000514 dolomite Inorganic materials 0.000 description 1
- 239000010459 dolomite Substances 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- -1 etc. Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 230000002000 scavenging effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910000815 supermalloy Inorganic materials 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24621786A JPS63100148A (ja) | 1986-10-16 | 1986-10-16 | 蒸着用Ｎｉ−Ｆｅ基合金 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24621786A JPS63100148A (ja) | 1986-10-16 | 1986-10-16 | 蒸着用Ｎｉ−Ｆｅ基合金 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63100148A JPS63100148A (ja) | 1988-05-02 |
| JPH0430450B2 true JPH0430450B2 (US07582779-20090901-C00044.png) | 1992-05-21 |
Family
ID=17145254
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24621786A Granted JPS63100148A (ja) | 1986-10-16 | 1986-10-16 | 蒸着用Ｎｉ−Ｆｅ基合金 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63100148A (US07582779-20090901-C00044.png) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2777319B2 (ja) * | 1993-07-30 | 1998-07-16 | 財団法人電気磁気材料研究所 | 耐摩耗性高透磁率合金およびその製造法ならびに磁気記録再生ヘッド |
| JP4047114B2 (ja) * | 2002-09-13 | 2008-02-13 | アルプス電気株式会社 | 薄膜磁気ヘッド |
| JP4948122B2 (ja) * | 2006-11-06 | 2012-06-06 | 株式会社ジェイテクト | 傾斜溝入り砥石 |
| JP5532767B2 (ja) * | 2009-09-04 | 2014-06-25 | 大同特殊鋼株式会社 | Ｃｕ電極保護膜用ＮｉＣｕ合金ターゲット材 |
| JP6639922B2 (ja) * | 2016-01-20 | 2020-02-05 | 国立大学法人広島大学 | 炭化珪素半導体装置及びその製造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62186511A (ja) * | 1986-02-12 | 1987-08-14 | Hitachi Metals Ltd | タ−ゲツト部材 |
-
1986
- 1986-10-16 JP JP24621786A patent/JPS63100148A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62186511A (ja) * | 1986-02-12 | 1987-08-14 | Hitachi Metals Ltd | タ−ゲツト部材 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63100148A (ja) | 1988-05-02 |
