JPH0427931A - Contact type exposure device - Google Patents

Abstract

PURPOSE:To prevent the reduction of the yield due to a defect of contact by providing a pressurizing mechanism, which applies a pressure to a mask from the rear face of a body to be exposed, to resolve the slip due to the surface shape like waviness of the body to be exposed. CONSTITUTION:A disk 6 is placed on a disk chuck 5, and a vacuum pump 7 is operated to suck the disk 6 by vacuum. A mask 1 is aligned to the disk 6 and is placed on a spacer 2. Thereafter, a vacuum pump 3 is operated to evacuate the gap between the mask 1 and the disk 6. Then, the mask 1 is curved to the surface of the disk by the air pressure and is closely brought into contact with the disk 6. Next, a pressure pump 8 is operated to apply a pressure to the disk 6 from the rear face of the disk 6 through a pressure hole 5c. Thus, the mask 1 and the disk 6 are completely brought into contact with each other even in outermost peripheral parts because the disk 6 is curved in the surface direction.

Description

DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application This invention relates to a contact exposure apparatus that performs exposure by bringing a mask into close contact with a glass substrate, for example, in order to form grooves on a glass substrate, which is an object to be exposed. .

(b) Conventional technology Conventionally, this type of contact exposure apparatus has the following features, as shown in FIG.
For example, a disk chuck stand 22 includes a vacuum chuck 2I for adsorbing an object 20 to be exposed such as a Noricon wafer or a glass disk, a spacer 25 having a vacuum hole 24 and into which a mask 23 is set, and a spacer 25 for attaching an optical beam to the object 20 to be exposed. It is composed of a light source 26 that emits light.

In the above configuration, after the exposed object 20 is set on the disk chuck stand 22 and the mask 23 is placed on the spacer 25, when the vacuum is drawn through the vacuum hole 24, the mask 23 is moved by the external pressure. It is pushed and curves toward the exposed object 20, and comes into close contact with the exposed object 20.

(c) Problems to be Solved by the Invention However, in the above configuration, if there is a deviation in the surface shape of the exposed object 20 and the mask 23 on the sides that are brought into close contact with each other, the curvature of the mask 23 alone will not be enough to bring them into close contact. There were cases where there was none. In such cases, poor exposure may occur due to incomplete adhesion.

This invention: In view of the above circumstances,
To provide a contact type exposure device capable of increasing the degree of adhesion between a mask and an exposed object even when there is a difference in surface shape between the mask and the exposed object, such as surface roughness, flatness, and parallelism. It is something.

(d) Means for Solving the Problems The present invention includes a holding mechanism that sucks and holds a disk-shaped object to be exposed, the surface of which is coated with resist, on the outer periphery of its back surface, and a contact mechanism that brings the mask into close contact with the surface of the exposed object, a pressure mechanism that presses at least a portion of the exposed object that will become the information recording area from the back surface of the exposed object in the direction of the mask, and an exposed object that is in close contact with the mask. This is a contact exposure device that includes a light source that irradiates the body with a beam of light.

(e) Place the contact mechanism or mask in close contact with the surface of the disc-shaped exposed object held by the action holding mechanism. In this case, the pressure mechanism presses at least a portion of the exposed object that will become the information recording area from the back surface of the exposed object in the direction of the mask. As a result, the exposed object D is slightly curved in the direction of the master, and the degree of close contact between the exposed body and the mask can be increased.

Then, the light source irradiates the object to be exposed with a beam of light, and the resist on the surface of the object to be exposed is exposed.

(F) EXAMPLES Hereinafter, examples of the present invention will be described in detail with reference to the drawings, but the present invention is not limited to the following examples.

In Fig. 1, l is a mask, for example, 150 mm in diameter.
It is made of glass with a thickness of 5 mm and a flatness of 5 μm. The mask [ is placed on the upper surface of the spacer 2 having the vacuum hole 2a. An opening 2b is provided in the center of the spacer 2, and a vacuum pump 3 is connected to a vacuum hole 5 communicating with the opening 2b. The spacer 2 and the vacuum pump 3 constitute a close contact mechanism 4.

Reference numeral 5 denotes a disk chuck stand, which has an annular gap 5a connected to a vacuum pump 7 in order to vacuum-adsorb a disk-shaped object to be exposed (hereinafter referred to as disk) 6 at the outer periphery of its back surface. A pressurizing chamber 5 is provided in the center of the nib screw holder 5 in order to pressurize the disk 6 from the back side thereof.
b is formed, and the pressurizing chamber 5b is connected to the pressurizing pump 8 via the pressurizing hole 5c. In the above, the disc chuck stand 5 and the vacuum pop 6 constitute the holding mechanism 9, and the pressurizing chamber 5b, the pressurizing hole 5c and the pressurizing pump 8 constitute the pressurizing mechanism 10, respectively.

The disk 6 has a diameter of 130 mm and a thickness of 12 mm, for example.
It is made of glass with a flatness of 20 μm and its surface is coated with a resist film approximately 2000 mm thick.

The mask 1 is set with a spacer 2 such that the distance from the surface of the disk 6 is, for example, 10 μ.

Incidentally, the surfaces of the spacer 4 and the disk chuck table 5 at the portions on which the mask I and the disk 6 are placed are processed so as to obtain sufficient adhesion.

A light source 11 is disposed at a predetermined position above the disk chuck table 5 and irradiates the disk 6 with, for example, ultraviolet light.

In the above configuration, the disk 6 is placed on the disk chuck stand 5, and the vacuum pump 7 is operated to hold the disk 6.
is vacuum-adsorbed. Further, it is placed on the spacer 2 in alignment with the mask 1 or the disk 6. After this, the vacuum pump 3 is activated, and the degree of vacuum in the gap between the mask I and the disk 6 is maintained at, for example, about 300 mmF (g. It comes into close contact with the disc 6.

Next, the pressurizing pop 8 is activated, and the disk 6 is pushed from the back side of the disk 6 through the pressurizing hole 5c to a pressure of, for example, about 05 kg/cm.
(This pressure may be 1 atm)
As a result, the disk 6 is curved in the direction of its surface, so that the mask 1 and the disk 6 are brought into complete contact with each other even at the outermost circumferential portion, and there is no possibility of poor adhesion at that portion.

Note that when the disk 6 is not pressurized, poor adhesion occurs in a part of the outermost portion of the disk 6, that is, in a range of about 2 mm in the radial direction and about 30 mm in the circumferential direction.

In the above embodiment, the disk 6 is disk-shaped and has a hole in the center. Even a glass substrate with an inner diameter of 15 mm can be accommodated by the configuration described below. In that case, the above embodiment may be slightly modified, and the disk chuck table may be provided with a mounting table having an annular gap or a vacuum chuck mechanism in the above embodiment, corresponding to the central area of the disk, so that the pressure in the pressurizing chamber can be adjusted to the disk. The structure should be such that it does not leak from the center hole.

(G) Effects of the Invention According to this invention, since the exposed object is pressurized from its back surface, in addition to the curvature of the mask, the exposed object is also curved. The misalignment is eliminated, the degree of adhesion between the mask and the exposed object is increased, and a decrease in yield due to poor adhesion can be prevented.

[Brief explanation of the drawing]

FIG. 1 is a configuration explanatory diagram showing the configuration of an embodiment of the present invention, and FIG. 2 is a configuration explanatory diagram showing the configuration of a conventional example. ■...Mask, 4...Adherence mechanism, 6...
...Exposed object, 9...Holding mechanism, 10...
... Pressure mechanism, 11... Light source.

Claims (1)

[Scope of Claims] 1. A holding mechanism that adsorbs and holds a disc-shaped exposed object whose surface is coated with resist at the outer periphery of its back surface, and a mask on the surface of the exposed object held by the holding mechanism. a pressure mechanism that presses at least a portion of the exposed object that will become an information recording area from the back surface of the exposed object toward the mask; and a light source that irradiates the exposed object with the mask in close contact with a light beam. A contact exposure device equipped with the following.