JPH0427299B2 - - Google Patents

Info

Publication number
JPH0427299B2
JPH0427299B2 JP8809882A JP8809882A JPH0427299B2 JP H0427299 B2 JPH0427299 B2 JP H0427299B2 JP 8809882 A JP8809882 A JP 8809882A JP 8809882 A JP8809882 A JP 8809882A JP H0427299 B2 JPH0427299 B2 JP H0427299B2
Authority
JP
Japan
Prior art keywords
etching
electron beam
plate
etching step
photosensitive film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8809882A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58207373A (ja
Inventor
Masaharu Kanto
Yasuhisa Ootake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP8809882A priority Critical patent/JPS58207373A/ja
Publication of JPS58207373A publication Critical patent/JPS58207373A/ja
Publication of JPH0427299B2 publication Critical patent/JPH0427299B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
JP8809882A 1982-05-26 1982-05-26 エツチング方法 Granted JPS58207373A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8809882A JPS58207373A (ja) 1982-05-26 1982-05-26 エツチング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8809882A JPS58207373A (ja) 1982-05-26 1982-05-26 エツチング方法

Publications (2)

Publication Number Publication Date
JPS58207373A JPS58207373A (ja) 1983-12-02
JPH0427299B2 true JPH0427299B2 (enrdf_load_stackoverflow) 1992-05-11

Family

ID=13933386

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8809882A Granted JPS58207373A (ja) 1982-05-26 1982-05-26 エツチング方法

Country Status (1)

Country Link
JP (1) JPS58207373A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0696786B2 (ja) * 1989-08-11 1994-11-30 松下電工株式会社 配線回路形成装置

Also Published As

Publication number Publication date
JPS58207373A (ja) 1983-12-02

Similar Documents

Publication Publication Date Title
JPS5933673B2 (ja) 薄い自立金属構造の製造方法
US4403151A (en) Method of forming patterns
US4546066A (en) Method for forming narrow images on semiconductor substrates
JPH0427299B2 (enrdf_load_stackoverflow)
JPS616830A (ja) パタ−ン形成方法
JPS5833246A (ja) ポジ型レジストのパタ−ン形成方法
US4557986A (en) High resolution lithographic process
US3951659A (en) Method for resist coating of a glass substrate
JPH0430134B2 (enrdf_load_stackoverflow)
JPS6034015A (ja) パタ−ン形成方法
JPH06338452A (ja) レジストパタ−ンの形成方法
JPS604221A (ja) 半導体装置の製造方法
JPS5835538A (ja) パタ−ンマスクの作製方法
KR100203331B1 (ko) 리드프레임의 제조방법
JPH04291733A (ja) GaAsデバイス及びT字型ゲート電極の作成方法
JPS5694741A (en) Positioning mark for electronic beam exposure
KR100239435B1 (ko) 반도체 소자의 제조 방법
JP2000040692A (ja) パタン形成法
JPS60254616A (ja) 電子ビ−ム露光方法
JPS6286726A (ja) レジストパタ−ン形成方法
JPS59232450A (ja) 半導体装置用リ−ドフレ−ムの製造方法
JPS6372889A (ja) リ−ドフレ−ムの製造方法
KR19980025850A (ko) 위상반전마스크 제조방법
JPS63104327A (ja) X線マスク、およびその製造方法
JPH0222974B2 (enrdf_load_stackoverflow)