JPH04258957A - ポジ型感光性電着樹脂組成物 - Google Patents
ポジ型感光性電着樹脂組成物Info
- Publication number
- JPH04258957A JPH04258957A JP3020922A JP2092291A JPH04258957A JP H04258957 A JPH04258957 A JP H04258957A JP 3020922 A JP3020922 A JP 3020922A JP 2092291 A JP2092291 A JP 2092291A JP H04258957 A JPH04258957 A JP H04258957A
- Authority
- JP
- Japan
- Prior art keywords
- group
- acid
- polymer
- ionic hydrophilic
- side chain
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Paints Or Removers (AREA)
- Materials For Photolithography (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Optical Filters (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3020922A JPH04258957A (ja) | 1991-02-14 | 1991-02-14 | ポジ型感光性電着樹脂組成物 |
| KR1019920002104A KR920016898A (ko) | 1991-02-14 | 1992-02-13 | 포지형 감광성 전착 수지 조성물 |
| EP92102425A EP0501243A1 (en) | 1991-02-14 | 1992-02-13 | Positive type photosensitive electrocoating resin composition |
| TW081101132A TW221500B (enExample) | 1991-02-14 | 1992-02-17 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3020922A JPH04258957A (ja) | 1991-02-14 | 1991-02-14 | ポジ型感光性電着樹脂組成物 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04258957A true JPH04258957A (ja) | 1992-09-14 |
Family
ID=12040716
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3020922A Pending JPH04258957A (ja) | 1991-02-14 | 1991-02-14 | ポジ型感光性電着樹脂組成物 |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0501243A1 (enExample) |
| JP (1) | JPH04258957A (enExample) |
| KR (1) | KR920016898A (enExample) |
| TW (1) | TW221500B (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5384229A (en) | 1992-05-07 | 1995-01-24 | Shipley Company Inc. | Photoimageable compositions for electrodeposition |
| EP0653681B1 (en) * | 1993-11-17 | 2000-09-13 | AT&T Corp. | A process for device fabrication using an energy sensitive composition |
| JP6195445B2 (ja) * | 2012-02-27 | 2017-09-13 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物、ホトレジスト積層体、ホトレジストパターンの製造方法、及び接続端子の製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3751598T2 (de) * | 1986-10-23 | 1996-04-18 | Ciba Geigy Ag | Bilderzeugungsverfahren. |
| JP2593305B2 (ja) * | 1987-02-02 | 1997-03-26 | 日本ペイント株式会社 | ポジ型感光性樹脂組成物 |
| JP2585070B2 (ja) * | 1988-08-02 | 1997-02-26 | 日本ペイント株式会社 | 画像形成方法 |
| US5045431A (en) * | 1990-04-24 | 1991-09-03 | International Business Machines Corporation | Dry film, aqueous processable photoresist compositions |
| JPH0488346A (ja) * | 1990-07-31 | 1992-03-23 | Nippon Paint Co Ltd | レジスト組成物 |
-
1991
- 1991-02-14 JP JP3020922A patent/JPH04258957A/ja active Pending
-
1992
- 1992-02-13 EP EP92102425A patent/EP0501243A1/en not_active Ceased
- 1992-02-13 KR KR1019920002104A patent/KR920016898A/ko not_active Withdrawn
- 1992-02-17 TW TW081101132A patent/TW221500B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| TW221500B (enExample) | 1994-03-01 |
| EP0501243A1 (en) | 1992-09-02 |
| KR920016898A (ko) | 1992-09-25 |
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