JPH04252074A - Solid-state image sensing element - Google Patents

Solid-state image sensing element

Info

Publication number
JPH04252074A
JPH04252074A JP3008204A JP820491A JPH04252074A JP H04252074 A JPH04252074 A JP H04252074A JP 3008204 A JP3008204 A JP 3008204A JP 820491 A JP820491 A JP 820491A JP H04252074 A JPH04252074 A JP H04252074A
Authority
JP
Japan
Prior art keywords
lens array
photoelectric conversion
solid
light
state image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3008204A
Other languages
Japanese (ja)
Inventor
Yukiya Kawakami
幸也 川上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP3008204A priority Critical patent/JPH04252074A/en
Publication of JPH04252074A publication Critical patent/JPH04252074A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To make it possible to prevent the quantity of incident light from being reduced even in case an F-value is small by a method wherein a focal length of a focal length or longer, which is obtained by the processing limit curvature of a lens array, can be obtained. CONSTITUTION:A solid-state image sensing element provided with a lens array 10 is provided to a photoelectric conversion part 2 and the upper part of this lens array is covered with a substance 11, which has a refractive index smaller than that of the array and has a radius of curvature larger than that of the array.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は光電変換部に画素と同じ
ピッチのレンズアレイを具備する固体撮像素子に関する
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solid-state image pickup device in which a photoelectric conversion section is provided with a lens array having the same pitch as pixels.

【0002】0002

【従来の技術】固体撮像素子、例えばCCDやMOS型
撮像素子に於いては、小型化・高解像度化を達成するた
めに、画素寸法を小さくし、あるいは画素数を増やすこ
とが進められているが、そのため光電変換部の面積が縮
小し、単位画素あたりの入射光量が減少するという問題
が顕在化してきた。
[Background Art] In solid-state image sensors, such as CCD and MOS image sensors, efforts are being made to reduce pixel dimensions or increase the number of pixels in order to achieve smaller size and higher resolution. However, this has led to the problem that the area of the photoelectric conversion section has been reduced and the amount of incident light per unit pixel has been reduced.

【0003】そこでフォトレジスタ等で作られたレンズ
アレイが設けられ、光電変換部に光電変換部の面積以上
の光を集めることで実質の入射光量を増加している。例
えば、図3はレンズアレイを設けない場合のCCDの光
電変換部付近の断面図で、平行光12が入射した場合を
、図示している。P型Si基板1にN型層2が形成され
、表面にP型層3が形成されている。この1〜3でフォ
トダイオードを構成する。4は電荷転送部のN型層、5
はポリシリコン電極、6はSiO2 層、7は平坦化絶
縁層、8は遮光アルミ、9は平坦化層である。レンズア
レイがない場合、電荷転送部4に光が入射するとスミア
と呼ばれる偽信号を生じるため、遮光アルミ8が設けら
れているが、本来信号としてCCDに入った光は、ここ
で無駄になってしまう。そこで、この光を光電変換部2
に誘導する目的でレンズアレイが考案された。図4は、
レンズアレイを設けた場合について図示している。図4
の実線に示すように光電変換部にレンズアレイ10を設
けることで、図3では電荷転送部4に当たってしまう光
を、光電変換部2に集めて入射光量を増加させることが
できる。入射光量が増加すると光電変換で生じる信号電
荷が増えるため、図3と図4ではCCDの入射した光の
量は同じでも、図4の信号電荷の方が多くなる。開口率
(画素当りの光電変換部の比率)がKであるとすると、
図4のCCDの感度は図3のCCDの感度の最大1/K
倍まで近づけることができる。
[0003] Therefore, a lens array made of a photoresistor or the like is provided to increase the actual amount of incident light by concentrating light on the photoelectric conversion section in an amount larger than the area of the photoelectric conversion section. For example, FIG. 3 is a cross-sectional view of the vicinity of the photoelectric conversion section of a CCD when no lens array is provided, and illustrates the case where parallel light 12 is incident. An N-type layer 2 is formed on a P-type Si substrate 1, and a P-type layer 3 is formed on the surface thereof. These 1 to 3 constitute a photodiode. 4 is the N-type layer of the charge transfer section, 5
6 is a polysilicon electrode, 6 is a SiO2 layer, 7 is a flattening insulating layer, 8 is a light-shielding aluminum, and 9 is a flattening layer. If there is no lens array, light entering the charge transfer section 4 will generate a false signal called smear, so a light shielding aluminum 8 is provided, but the light that originally entered the CCD as a signal is wasted here. Put it away. Therefore, this light is transferred to the photoelectric conversion unit 2.
A lens array was devised for the purpose of guiding. Figure 4 shows
A case in which a lens array is provided is illustrated. Figure 4
By providing the lens array 10 in the photoelectric conversion section as shown by the solid line, it is possible to collect the light that would otherwise hit the charge transfer section 4 in FIG. 3 onto the photoelectric conversion section 2 and increase the amount of incident light. As the amount of incident light increases, the signal charges generated by photoelectric conversion increase, so even though the amount of light incident on the CCD is the same in FIGS. 3 and 4, the signal charges in FIG. 4 are larger. Assuming that the aperture ratio (the ratio of photoelectric conversion parts per pixel) is K,
The maximum sensitivity of the CCD in Figure 4 is 1/K of the sensitivity of the CCD in Figure 3.
You can get twice as close.

【0004】0004

【発明が解決しようとする課題】図4の実線に示すよう
な平行光12が入射する場合は、入射光は光電変換部2
に集まるが、絞りを開きF値を小さくすると、入射光は
平行でなくなり、図4の破線13のように斜めに入射す
る。図4での最大入射角θとF値の関係は、sinθ=
1/2Fで、F値が小さいほど入射角は大きくなり、図
4の破線で見られるように、光は光電変換部2に達する
までに広がってしまい、入射光量が減少する。従って、
絞りが開いて画像が明るくなるはずが、光電変換部の入
射光量減少の為、画像の明るさは絞り開放から予想され
るほど明るくないか、悪くすると暗くなるという問題を
生じる。そこで、レンズの焦点距離を長くすれば、F値
が大きいときは、光電変換部の奥で入射光が焦点を結び
、F値が小さいときは、光電変換部の手前で入射光が焦
点を結んで、光電変換部に、常に絞り効果が得られるよ
うにすることが考えられる。そこで単純に焦点レンズの
曲率を小さくして、焦点距離を長くすることが考えられ
るが、加工によるレンズの曲率縮小化には限度があるた
め、ある限度以上は焦点距離を長くすることができない
[Problem to be Solved by the Invention] When parallel light 12 as shown by the solid line in FIG.
However, when the aperture is opened and the F value is reduced, the incident light is no longer parallel and enters obliquely as shown by the broken line 13 in FIG. The relationship between the maximum incident angle θ and the F value in FIG. 4 is sinθ=
At 1/2 F, the smaller the F value, the larger the incident angle becomes, and as shown by the broken line in FIG. 4, the light spreads out before reaching the photoelectric conversion unit 2, and the amount of incident light decreases. Therefore,
When the aperture opens, the image should become brighter, but because the amount of light incident on the photoelectric conversion unit decreases, the problem arises that the brightness of the image is not as bright as expected when the aperture is opened, or worse, it becomes dark. Therefore, by increasing the focal length of the lens, when the F number is large, the incident light will be focused behind the photoelectric conversion section, and when the F number is small, the incident light will be focused in front of the photoelectric conversion section. Therefore, it is conceivable to make the photoelectric conversion section always have an aperture effect. Therefore, it is conceivable to simply reduce the curvature of the focal lens to increase the focal length, but since there is a limit to the reduction of the curvature of the lens through processing, the focal length cannot be increased beyond a certain limit.

【0005】本発明は、上記のようなF値を小さくする
、つまり絞りを開く場合に、レンズの焦点が短いために
入光率が減少することを防ぎ、絞りの開きと画像の明る
さを比例させることを目的とする。
[0005] The present invention prevents the incidence of light from decreasing due to the short focal point of the lens when reducing the F number as described above, that is, when opening the aperture, and reduces the aperture aperture and the brightness of the image. The purpose is to make it proportional.

【0006】[0006]

【課題を解決するための手段】本発明では、光電変換部
分の上のレンズアレイを少なくともこのレンズ材質より
も屈折率の小さな材質で、少なくともレンズアレイの曲
率半径よりも大きな曲率半径で被覆する。
In the present invention, the lens array above the photoelectric conversion portion is covered with a material having a refractive index smaller than that of the lens material, and with a radius of curvature larger than at least the radius of curvature of the lens array.

【0007】[0007]

【作用】このような手段をとることによって、レンズア
レイ自体の曲率を縮小せずに、レンズアレイの焦点距離
は長くなり、平行に入射する光も、F値が小さいために
斜めから入射する光も、光電変換部に集まり、F値が小
さくなることによる入射光量減少を防止する。
[Effect] By taking such measures, the focal length of the lens array becomes longer without reducing the curvature of the lens array itself, and light that is incident parallel also becomes light that enters obliquely due to the small F value. The light also gathers in the photoelectric conversion section, and prevents a decrease in the amount of incident light due to a decrease in the F value.

【0008】[0008]

【実施例】図1は本発明を適用したCCD固体撮像素子
の断面を示している。図3,4と異なるのはレンズアレ
イ10の上に、レンズアレイよりも屈折率の小さい物質
11を形成してある点である。この実施例の場合、物質
11の曲率半径は無限大、すなわち表面は平坦である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows a cross section of a CCD solid-state imaging device to which the present invention is applied. The difference from FIGS. 3 and 4 is that a substance 11 having a refractive index smaller than that of the lens array is formed on the lens array 10. In this embodiment, the radius of curvature of the material 11 is infinite, that is, the surface is flat.

【0009】図2もまた本発明を適用したCCD固体撮
像素子の断面を示している。この場合、11の曲率半径
はレンズアレイの曲率半径よりも大きく、更にその上に
反射防止膜14が乗っている。
FIG. 2 also shows a cross section of a CCD solid-state imaging device to which the present invention is applied. In this case, the radius of curvature of the lens array 11 is larger than the radius of curvature of the lens array, and the antireflection film 14 is further placed on top of the radius of curvature of the lens array.

【0010】図1,2ではCCDのみを示したが、MO
S型や他の種類の固体撮像素子の光電変換部でも、当然
用いることができ、被覆されるレンズアレイの形状が、
例えばストライプ状や円形であるなしにかかわらず用い
ることができる。また、カラーフィルターを積層した固
体撮像素子にも適用できる。
Although only the CCD is shown in FIGS. 1 and 2, the MO
Of course, it can also be used in the photoelectric conversion section of S-type and other types of solid-state image sensors, and the shape of the covered lens array is
For example, it can be used regardless of whether it is striped or circular. It can also be applied to a solid-state image sensor in which color filters are laminated.

【0011】[0011]

【発明の効果】本発明を適用するならば、レンズアレイ
を搭載し感度を上げたCCDで、F値が小さくなった場
合に、感度が劣化するということが避けられる。また図
4のように大きなF値専用のレンズアレイを乗せた固体
撮像素子でも、図1のようにレンズアレイよりも小さい
適当な屈折率の物質で単純に被覆することで、F値が小
さい条件でも使用出来るという利点がある。従って、パ
ッケージ上の固体撮像素子でも、簡単に修正することが
出来る。また本発明を適用するならば、カラーフィルタ
ー層を持つために、焦点距離を長くとらねばならない場
合でも、レンズの曲率の縮小化の限界以上の焦点距離を
得ることができる。
[Effects of the Invention] By applying the present invention, it is possible to avoid deterioration in sensitivity when the F number becomes small in a CCD equipped with a lens array and with increased sensitivity. In addition, even if a solid-state image sensor is equipped with a lens array dedicated to a large F-number as shown in Figure 4, it is possible to create a condition where the F-number is small by simply covering it with a material with an appropriate refractive index smaller than the lens array as shown in Figure 1. However, it has the advantage of being usable. Therefore, even the solid-state image sensor on the package can be easily modified. Furthermore, if the present invention is applied, even if the focal length must be increased due to the color filter layer, it is possible to obtain a focal length that is longer than the limit for reducing the curvature of the lens.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明をCCDの光電変換部分であるフォトダ
イオードに適用した場合の断面図である。
FIG. 1 is a cross-sectional view when the present invention is applied to a photodiode, which is a photoelectric conversion portion of a CCD.

【図2】本発明の他の実施例を示す断面図である。FIG. 2 is a sectional view showing another embodiment of the present invention.

【図3】レンズアレイを用いない場合のCCDのフォト
ダイオード部に平行光が入射した状態を示す断面図であ
る。
FIG. 3 is a cross-sectional view showing a state in which parallel light is incident on a photodiode section of a CCD when a lens array is not used.

【図4】図3の状態にレンズアレイを設けた場合の断面
図である。
FIG. 4 is a cross-sectional view when a lens array is provided in the state shown in FIG. 3;

【符号の説明】[Explanation of symbols]

1  Si基板のP型層 2  N型層 3  P型層 4  CCDの電荷転送部のN型層 5  電極のポリシリコン 6  絶縁層のSiO2 膜 7  平坦化層 8  遮光アルミ 9  平坦化層 10  レンズアレイ 11  レンズよりも屈折率の低い物質12  平行入
射光 13  斜め入射光 14  反射防止膜
1 P-type layer of Si substrate 2 N-type layer 3 P-type layer 4 N-type layer of CCD charge transfer section 5 Polysilicon electrode 6 Insulating layer SiO2 film 7 Planarization layer 8 Light-shielding aluminum 9 Planarization layer 10 Lens array 11 Substance with a lower refractive index than the lens 12 Parallel incident light 13 Oblique incident light 14 Anti-reflection film

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  光電変換部に画素と同じピッチのレン
ズアレイを備え、このレンズアレイの上をレンズアレイ
よりも屈折率の小さい材質で、レンズアレイの曲率半径
よりも大きな曲率半径で覆うことを特徴とする固体撮像
素子。
Claim 1: The photoelectric conversion unit is provided with a lens array having the same pitch as the pixels, and the lens array is covered with a material having a smaller refractive index than the lens array and with a radius of curvature larger than that of the lens array. Characteristic solid-state image sensor.
JP3008204A 1991-01-28 1991-01-28 Solid-state image sensing element Pending JPH04252074A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3008204A JPH04252074A (en) 1991-01-28 1991-01-28 Solid-state image sensing element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3008204A JPH04252074A (en) 1991-01-28 1991-01-28 Solid-state image sensing element

Publications (1)

Publication Number Publication Date
JPH04252074A true JPH04252074A (en) 1992-09-08

Family

ID=11686726

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3008204A Pending JPH04252074A (en) 1991-01-28 1991-01-28 Solid-state image sensing element

Country Status (1)

Country Link
JP (1) JPH04252074A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100239412B1 (en) * 1996-12-28 2000-01-15 김영환 Solid state image sensing device and method for manufacturing thereof
JP2006190906A (en) * 2005-01-07 2006-07-20 Toppan Printing Co Ltd Solid-stage image pickup element
JP2008147568A (en) * 2006-12-13 2008-06-26 Canon Inc Image sensor and imaging device
JP2009016574A (en) * 2007-07-04 2009-01-22 Panasonic Corp Solid state imaging apparatus and its manufacturing method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61287263A (en) * 1985-06-14 1986-12-17 Mitsubishi Electric Corp Solid-state image pickup device and manufacture thereof
JPS6223161A (en) * 1985-07-23 1987-01-31 Mitsubishi Electric Corp Solid-state image pickup device with microlens

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61287263A (en) * 1985-06-14 1986-12-17 Mitsubishi Electric Corp Solid-state image pickup device and manufacture thereof
JPS6223161A (en) * 1985-07-23 1987-01-31 Mitsubishi Electric Corp Solid-state image pickup device with microlens

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100239412B1 (en) * 1996-12-28 2000-01-15 김영환 Solid state image sensing device and method for manufacturing thereof
JP2006190906A (en) * 2005-01-07 2006-07-20 Toppan Printing Co Ltd Solid-stage image pickup element
JP4725106B2 (en) * 2005-01-07 2011-07-13 凸版印刷株式会社 Manufacturing method of solid-state imaging device
JP2008147568A (en) * 2006-12-13 2008-06-26 Canon Inc Image sensor and imaging device
JP2009016574A (en) * 2007-07-04 2009-01-22 Panasonic Corp Solid state imaging apparatus and its manufacturing method

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