JPH0424440B2 - - Google Patents
Info
- Publication number
- JPH0424440B2 JPH0424440B2 JP63329207A JP32920788A JPH0424440B2 JP H0424440 B2 JPH0424440 B2 JP H0424440B2 JP 63329207 A JP63329207 A JP 63329207A JP 32920788 A JP32920788 A JP 32920788A JP H0424440 B2 JPH0424440 B2 JP H0424440B2
- Authority
- JP
- Japan
- Prior art keywords
- tin
- anode
- electroplating
- chamber
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32920788A JPH02175894A (ja) | 1988-12-28 | 1988-12-28 | スズ、スズ合金電気めっき方法及び同電気めっき装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32920788A JPH02175894A (ja) | 1988-12-28 | 1988-12-28 | スズ、スズ合金電気めっき方法及び同電気めっき装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02175894A JPH02175894A (ja) | 1990-07-09 |
JPH0424440B2 true JPH0424440B2 (enrdf_load_stackoverflow) | 1992-04-27 |
Family
ID=18218854
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP32920788A Granted JPH02175894A (ja) | 1988-12-28 | 1988-12-28 | スズ、スズ合金電気めっき方法及び同電気めっき装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02175894A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004011698A1 (ja) * | 2002-07-25 | 2004-02-05 | Shinryo Electronics Co., Ltd. | 錫−銀−銅含有めっき液及び同めっき被膜並びにそのめっき方法 |
US11859300B2 (en) | 2017-11-01 | 2024-01-02 | Lam Research Corporation | Controlling plating electrolyte concentration on an electrochemical plating apparatus |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04284691A (ja) * | 1991-03-13 | 1992-10-09 | Arumetsukusu:Kk | プリント配線板の電気めっき方法 |
JPH06146087A (ja) * | 1992-11-12 | 1994-05-27 | Nobuyasu Doi | 電気メッキ法 |
DE19834353C2 (de) | 1998-07-30 | 2000-08-17 | Hillebrand Walter Gmbh & Co Kg | Alkalisches Zink-Nickelbad |
US6576110B2 (en) * | 2000-07-07 | 2003-06-10 | Applied Materials, Inc. | Coated anode apparatus and associated method |
JP4441725B2 (ja) * | 2003-11-04 | 2010-03-31 | 石原薬品株式会社 | 電気スズ合金メッキ方法 |
JP4594672B2 (ja) * | 2004-08-10 | 2010-12-08 | ディップソール株式会社 | 錫−亜鉛合金電気めっき方法 |
DE502007002479D1 (de) * | 2007-02-14 | 2010-02-11 | Umicore Galvanotechnik Gmbh | Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten |
DE502008001647D1 (de) * | 2008-05-08 | 2010-12-09 | Umicore Galvanotechnik Gmbh | Modifizierter Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten |
KR101146740B1 (ko) * | 2009-11-03 | 2012-05-17 | 주식회사 익스톨 | 주석 도금 장치 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56112500A (en) * | 1980-02-09 | 1981-09-04 | Ebara Yuujiraito Kk | Method for electroplating |
-
1988
- 1988-12-28 JP JP32920788A patent/JPH02175894A/ja active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004011698A1 (ja) * | 2002-07-25 | 2004-02-05 | Shinryo Electronics Co., Ltd. | 錫−銀−銅含有めっき液及び同めっき被膜並びにそのめっき方法 |
US11859300B2 (en) | 2017-11-01 | 2024-01-02 | Lam Research Corporation | Controlling plating electrolyte concentration on an electrochemical plating apparatus |
US12392049B2 (en) | 2017-11-01 | 2025-08-19 | Lam Research Corporation | Controlling plating electrolyte concentration on an electrochemical plating apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPH02175894A (ja) | 1990-07-09 |
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