JPH04221881A - Manufacture of printed circuit board - Google Patents
Manufacture of printed circuit boardInfo
- Publication number
- JPH04221881A JPH04221881A JP40493390A JP40493390A JPH04221881A JP H04221881 A JPH04221881 A JP H04221881A JP 40493390 A JP40493390 A JP 40493390A JP 40493390 A JP40493390 A JP 40493390A JP H04221881 A JPH04221881 A JP H04221881A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- circuit board
- printed circuit
- gold
- bare chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 238000007747 plating Methods 0.000 claims abstract description 58
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 35
- 229910052737 gold Inorganic materials 0.000 claims abstract description 32
- 239000010931 gold Substances 0.000 claims abstract description 32
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 25
- 238000000034 method Methods 0.000 claims abstract description 17
- 239000004020 conductor Substances 0.000 claims abstract description 16
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 12
- 238000007772 electroless plating Methods 0.000 claims abstract description 11
- 238000005476 soldering Methods 0.000 claims abstract description 6
- 238000009713 electroplating Methods 0.000 claims description 11
- 239000011810 insulating material Substances 0.000 claims description 2
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000006731 degradation reaction Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 229910000679 solder Inorganic materials 0.000 description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 238000005530 etching Methods 0.000 description 6
- 239000003990 capacitor Substances 0.000 description 5
- 239000006071 cream Substances 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- MSNOMDLPLDYDME-UHFFFAOYSA-N gold nickel Chemical compound [Ni].[Au] MSNOMDLPLDYDME-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- QDWJUBJKEHXSMT-UHFFFAOYSA-N boranylidynenickel Chemical compound [Ni]#B QDWJUBJKEHXSMT-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/181—Printed circuits structurally associated with non-printed electric components associated with surface mounted components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4007—Surface contacts, e.g. bumps
Abstract
Description
【0001】0001
【産業上の利用分野】本発明はハンダ付けにより電気的
な接続を行うチップ部品と、ワイヤーボンディングによ
り電気的な接続を行うベアチップICとを実装したプリ
ント配線板の製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a printed wiring board on which chip components are electrically connected by soldering and bare chip ICs are electrically connected by wire bonding.
【0002】0002
【従来の技術】従来、フラットパッケージIC、チップ
抵抗、チップコンデンサ等の電子部品をプリント基板上
に搭載する場合、プリント基板にクリームハンダを用い
て所定のパターンを印刷し、そこに電子部品を配置した
後、赤外線ヒータ等で加熱してクリームハンダをリフロ
ーさせて電子部品をプリント基板に実装していた。この
場合、パターンである銅の防錆のために、無電解メッキ
又は電解メッキによるニッケル−金メッキが施される。[Prior Art] Conventionally, when mounting electronic components such as flat package ICs, chip resistors, and chip capacitors on a printed circuit board, a predetermined pattern is printed on the printed circuit board using cream solder, and the electronic components are placed there. After that, the electronic components were mounted on the printed circuit board by heating with an infrared heater or the like to reflow the cream solder. In this case, nickel-gold plating is performed by electroless plating or electrolytic plating to prevent rust on the copper pattern.
【0003】また、ベアチップICをプリント基板に搭
載し、金ワイヤーによってワイヤーボンディングするた
めには、パッド部に電解メッキ又は無電解メッキにより
ニッケル−金メッキを施すことが必要である。この場合
、ニッケルはワイヤーボンディング時の加熱、加圧に対
抗する硬さをもたせるため、5〜10μmの厚さが必要
で、金は99.99 %以上の高純度が要求され、厚さ
は0.3 〜0.5 μm以上であることが必要である
。Furthermore, in order to mount a bare chip IC on a printed circuit board and perform wire bonding using gold wire, it is necessary to apply nickel-gold plating to the pad portion by electrolytic plating or electroless plating. In this case, nickel needs to have a thickness of 5 to 10 μm in order to have the hardness to withstand the heat and pressure applied during wire bonding, and gold needs to have a high purity of 99.99% or more, and the thickness is 0. It is necessary that the thickness is .3 to 0.5 μm or more.
【0004】0004
【発明が解決しようとする課題】ところが、近年ワイヤ
ーボンディングによるベアチップICとともに、その周
辺に抵抗、コンデンサ等のチップ部品を混載することが
行われている。この場合、ベアチップICとその周辺に
数個の抵抗、コンデンサ等が配置されている程度であれ
ば、ベアチップIC及びチップ部品のパッドに対し、全
てメッキリードを付与し、電解メッキによるニッケル、
金メッキを行うことができる。しかし、例えばハイブリ
ッドICの用途で、抵抗、コンデンサ等が数十個という
多数個で、しかもこれらとベアチップICとを混載しな
ければならない場合には次のような制約条件がある。■
配線が複雑で迂回が困難であるため、チップ部品の全パ
ッドに対してメッキリードを付与することが困難である
。また、プリント基板を大きくすると配線長が長くなり
ノイズを拾いやすく、伝搬遅延が大きくなる等の電気特
性が悪化する。さらに、多層化するとコストが高くなる
。■チップ部品を載せるためのパッドに0.3 〜0.
5 μm の金メッキを施すと、その上にハンダ印刷、
ハンダリフローのための加熱により、ハンダが金メッキ
層へ拡散し厚みの厚い拡散層を形成し、ハンダ付けの信
頼性が低下する。この信頼性の低下は、チップ部品が多
数になるほど全体としての影響が大きくなる。従って、
ハンダの上記拡散を防止するために金メッキはチップ部
品を載せるためのパッドには0.1 μm 以下の厚さ
とし、厚い拡散層を作らないことが要求されるとともに
、またベアチップICのワイヤーボンディングのために
は0.3 〜0.5 μm の厚さが要求される。However, in recent years, chip components such as resistors and capacitors have been mixedly mounted on the periphery of bare chip ICs by wire bonding. In this case, if the bare chip IC and a few resistors, capacitors, etc. are placed around it, plated leads are provided to all the pads of the bare chip IC and chip components, and nickel is electrolytically plated.
Can be gold plated. However, for example, in the case of hybrid IC applications, where a large number of resistors, capacitors, etc. are required, and a bare chip IC must be mounted together with these resistors, capacitors, etc., there are the following constraints. ■
Since wiring is complicated and detouring is difficult, it is difficult to provide plated leads to all pads of a chip component. Furthermore, if the printed circuit board is made larger, the wiring length becomes longer, which makes it easier to pick up noise and deteriorates electrical characteristics such as increased propagation delay. Furthermore, multi-layering increases the cost. ■0.3~0.0.
After applying 5 μm gold plating, solder printing is performed on top of it.
Heating for solder reflow causes the solder to diffuse into the gold plating layer, forming a thick diffusion layer and reducing the reliability of soldering. The overall effect of this decrease in reliability becomes greater as the number of chip components increases. Therefore,
In order to prevent the above diffusion of solder, gold plating is required to have a thickness of 0.1 μm or less on pads on which chip components are placed, and to avoid creating a thick diffusion layer, and also for wire bonding of bare chip ICs. A thickness of 0.3 to 0.5 μm is required.
【0005】このような条件下において、前記クリーム
ハンダをリフローさせて電子部品をプリント基板に実装
する場合、電解メッキによるニッケル−金メッキは、メ
ッキのためにメッキリードを取付け、メッキ後に回路を
独立させるためにこのメッキリードを分断する必要があ
り、プリント基板全体にわたってこのような操作を行う
ことはコスト高となって好ましくないという問題点があ
った。Under such conditions, when electronic components are mounted on a printed circuit board by reflowing the cream solder, nickel-gold plating by electrolytic plating requires attaching a plating lead for plating and making the circuit independent after plating. Therefore, it is necessary to divide the plated leads, and there is a problem in that it is undesirable to perform such an operation over the entire printed circuit board because it increases the cost.
【0006】そこで本発明の目的は、多数のチップ部品
とベアチップICを混載した場合に、メッキリードを多
く必要とせず、接続の信頼性を低下させることがなく、
しかも高密度配線が可能で、電気特性を維持でき、製造
コストを低減させることができるプリント配線板の製造
方法を提供することにある。SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a method that does not require many plated leads and does not reduce connection reliability when a large number of chip components and bare chip ICs are mounted together.
Moreover, it is an object of the present invention to provide a method for manufacturing a printed wiring board that allows high-density wiring, maintains electrical characteristics, and reduces manufacturing costs.
【0007】[0007]
【課題を解決するための手段】本発明は上記目的を達成
するため、絶縁材よりなるプリント基板上に、ハンダ付
けにより電気的な接続を行うチップ部品と、ワイヤーボ
ンディングにより電気的な接続を行うベアチップICと
を実装するプリント配線板の製造方法において、前記プ
リント基板に導体パターンを形成した後、同導体パター
ン上に無電解メッキによりニッケル及び金をメッキする
工程と、前記ベアチップICを実装する領域を除いた領
域をメッキレジストで覆う工程と、前記メッキレジスト
以外の部分の導体パターンに、電解メッキにより金メッ
キを施す工程とからなるプリント配線板の製造方法をそ
の要旨としている。[Means for Solving the Problems] In order to achieve the above object, the present invention provides a printed circuit board made of an insulating material, on which chip components are electrically connected by soldering, and electrical connections are made by wire bonding. A method of manufacturing a printed wiring board on which a bare chip IC is mounted includes forming a conductor pattern on the printed circuit board and then plating nickel and gold on the conductor pattern by electroless plating, and an area where the bare chip IC is mounted. The gist of this method is a method for manufacturing a printed wiring board, which includes the steps of covering the area other than the plating resist with a plating resist, and applying gold plating to the conductor pattern in the area other than the plating resist by electrolytic plating.
【0008】[0008]
【作用】まず、プリント基板に導体パターンが形成され
た後、同導体パターン上全体に無電解メッキによりニッ
ケル及び金がメッキされ、次いでベアチップICを実装
する領域を除いた領域がメッキレジストにより覆われ、
続いてこのメッキレジスト以外の領域に、電解メッキに
より金メッキが施される。その結果、ハンダ付けにより
電気的接続を行うチップ部品と、ワイヤーボンディング
により電気的接続を行うベアチップICとがどちらも良
好な条件下で実装可能なプリント配線板が形成される。[Operation] First, after a conductor pattern is formed on a printed circuit board, nickel and gold are plated on the entire conductor pattern by electroless plating, and then the area except the area where the bare chip IC is mounted is covered with a plating resist. ,
Subsequently, areas other than the plating resist are plated with gold by electrolytic plating. As a result, a printed wiring board is formed on which both chip components, which are electrically connected by soldering, and bare chip ICs, which are electrically connected by wire bonding, can be mounted under favorable conditions.
【0009】[0009]
【実施例】以下、本発明を具体化した一実施例を、各工
程毎に図1〜10に従って説明する。
(1)無電解メッキによりニッケル及び金をメッキする
工程。
図6に示すように、まず、銅張ガラスエポキシ積層板か
らなるプリント基板1にNCドリルによってスルーホー
ル2を透設した後、図7に示すように、無電解銅メッキ
、電解銅メッキを施すことにより、銅メッキ層3を形成
する。上記ガラスエポキシ積層板に代えて、コンポジッ
ト、ガラスポリイミド、ガラストリアジン、紙エポキシ
、テフロン等の積層板を使用することができる。次に、
図8に示すように、導体パターンの部分をドライフィル
ムによりエッチングレジスト層4を形成した後、図9に
示すようにエッチングを行う。続いて、図10に示すよ
うに、前記エッチングレジスト層4を剥離することによ
り導体パターン5を形成する。[Embodiment] An embodiment embodying the present invention will be described below with reference to FIGS. 1 to 10 for each step. (1) A process of plating nickel and gold by electroless plating. As shown in FIG. 6, first, through-holes 2 are formed in a printed circuit board 1 made of a copper-clad glass epoxy laminate using an NC drill, and then, as shown in FIG. 7, electroless copper plating and electrolytic copper plating are applied. By doing so, a copper plating layer 3 is formed. In place of the above-mentioned glass epoxy laminate, a laminate of composite, glass polyimide, glass triazine, paper epoxy, Teflon, etc. can be used. next,
As shown in FIG. 8, an etching resist layer 4 is formed using a dry film on the conductive pattern portion, and then etching is performed as shown in FIG. Subsequently, as shown in FIG. 10, the etching resist layer 4 is peeled off to form a conductor pattern 5.
【0010】次に、図2に示すように、この導体パター
ン5の部分に市販のニッケル(Ni )−リン(P)の
メッキ浴を用い、無電解メッキを行うことにより、ニッ
ケルメッキ層6を5μm の厚みに形成する。そして、
市販の置換金メッキ浴により、ニッケルメッキ層6の上
に金メッキ層7を約0.05μm の厚みに形成する。
なお、このプリント基板1の導体パターン5の形成方法
として、上記エッチングによるサブトラクティブ法の他
に、セミアディティブ法、フルアディティブ法を採用す
ることもできる。また、無電解ニッケルメッキ浴として
は、ニッケル−リンのメッキ浴に代えてニッケル−ホウ
素浴等を用いることができ、置換金メッキ浴に代えて還
元金メッキ浴を用いることもできる。但し、この還元金
メッキ浴を用いる場合は、処理時間を短時間とし、金メ
ッキの厚みを0.1 μm よりあまり厚くならないよ
うにすることが重要である。Next, as shown in FIG. 2, a nickel plating layer 6 is formed on the conductor pattern 5 by electroless plating using a commercially available nickel (Ni)-phosphorus (P) plating bath. Form to a thickness of 5 μm. and,
A gold plating layer 7 with a thickness of about 0.05 μm is formed on the nickel plating layer 6 using a commercially available displacement gold plating bath. Note that as a method for forming the conductor pattern 5 of this printed circuit board 1, in addition to the above-mentioned subtractive method using etching, a semi-additive method or a full-additive method can also be adopted. Further, as the electroless nickel plating bath, a nickel-boron bath or the like can be used instead of the nickel-phosphorus plating bath, and a reduced gold plating bath can also be used instead of the displacement gold plating bath. However, when using this reduced gold plating bath, it is important to keep the treatment time short and to prevent the gold plating from becoming much thicker than 0.1 μm.
【0011】上記のように、この工程においては、導体
パターン5やチップ部品のパッド部上に金が0.1 μ
m 以下に形成されているので、その上にクリームハン
ダを塗布し、加熱リフローさせても、ハンダと金との間
で厚い拡散層をつくることがなく、またいわゆるハンダ
食われがないので、ハンダ付けの信頼性に優れている。
また、金メッキの厚さが従来より薄くできるので、その
分コストダウンを図ることができる。さらに、導体パタ
ーン5全体が、金で覆われるので、導体パターン5から
銅が溶け出すマイグレーションを防止することができる
。
(2)ベアチップICを実装する領域以外の領域をメッ
キレジストで覆う工程。As mentioned above, in this process, 0.1 μm of gold is deposited on the conductor pattern 5 and the pad portion of the chip component.
m or less, so even if cream solder is applied on top of it and heated for reflow, a thick diffusion layer will not be created between the solder and the gold, and there will be no so-called solder erosion. Excellent attachment reliability. Furthermore, since the thickness of the gold plating can be made thinner than before, costs can be reduced accordingly. Furthermore, since the entire conductive pattern 5 is covered with gold, migration of copper melting from the conductive pattern 5 can be prevented. (2) A step of covering the area other than the area where the bare chip IC is mounted with a plating resist.
【0012】図3,5に示すように、上記金メッキを施
したプリント基板1上のパッド部8a,8bを除き、ス
クリーン印刷法によってソルダーレジスト層9を印刷し
た。図1,5に示すように、上記一方のパッド部8a上
には、チップ部品13が搭載され、他方のパッド部8b
には一端がベアチップIC10に接続された金ワイヤー
14の他端がワイヤーボンディングされるようになって
いる。前記ソルダーレジスト層9としては、スクリーン
印刷法により塗布するエポキシ系樹脂、粘着して用いる
フィルム状の光硬化型アクリル樹脂、塗布して用いる液
状の光硬化型アクリル樹脂等を使用することができる。
次いで、ベアチップIC10を実装する領域R以外の領
域に、ドライフィルムメッキレジスト層11を形成した
。As shown in FIGS. 3 and 5, a solder resist layer 9 was printed by screen printing on the gold-plated printed circuit board 1 except for the pad portions 8a and 8b. As shown in FIGS. 1 and 5, a chip component 13 is mounted on one pad portion 8a, and a chip component 13 is mounted on the other pad portion 8b.
One end of the gold wire 14 is connected to the bare chip IC 10, and the other end thereof is wire-bonded. As the solder resist layer 9, an epoxy resin applied by a screen printing method, a film-like photocurable acrylic resin used as an adhesive, a liquid photocurable acrylic resin used as an adhesive, or the like can be used. Next, a dry film plating resist layer 11 was formed in a region other than the region R where the bare chip IC 10 is mounted.
【0013】なお、前記ソルダーレジスト層9を施す工
程は、導体パターン5全体に無電解メッキによるニッケ
ル、金を施した後であれば、後述する電解メッキによる
金メッキの前又は後のいずれでもよい。
(3)電解メッキにより金メッキを施す工程。
図4に示すように、プリント基板1上の上記ドライフィ
ルムメッキレジスト層11が施されていないベアチップ
IC10実装部の部分に、図示しないメッキリードを使
用した電解メッキにより0.5 μm の厚さの金メッ
キ層12を施した。次に、図1に示すように、前記ドラ
イフィルムメッキレジスト層11を剥離した後、外形加
工を行った。そして、ベアチップIC10を金ワイヤー
14を用いたワイヤーボンディングによって実装するこ
とにより、所望のプリント配線板を得た。The step of applying the solder resist layer 9 may be performed either before or after gold plating by electrolytic plating, which will be described later, as long as it is after applying nickel and gold to the entire conductor pattern 5 by electroless plating. (3) Process of applying gold plating by electrolytic plating. As shown in FIG. 4, the part of the bare chip IC 10 mounted on the printed circuit board 1 on which the dry film plating resist layer 11 is not applied is electrolytically plated using a plating lead (not shown) to a thickness of 0.5 μm. A gold plating layer 12 was applied. Next, as shown in FIG. 1, after peeling off the dry film plating resist layer 11, external processing was performed. Then, the bare chip IC 10 was mounted by wire bonding using the gold wire 14, thereby obtaining a desired printed wiring board.
【0014】この電解メッキによって金メッキ層12を
施す工程により、金メッキ層12の厚みが0.3 μm
以上確保できるので、ワイヤーボンディングを信頼性
良く行うことができる。上記のように、本実施例のプリ
ント配線板の製造方法によれば、多数のチップ部品13
とベアチップIC10を混載した場合、メッキリードを
ベアチップIC10用のパッド部8bについてのみ取付
ければよく、チップ部品13用のパッド部8aに取付け
る必要がないので、メッキリードの本数を最小限にする
ことができ、メッキリードのためにプリント基板1を大
きくしたり、多層化する必要がない。従って、ノイズ、
伝搬速度等の電気特性の悪化を防ぐことができるととも
に、製造コストの低減を図ることができる。さらに、不
要となったメッキリードの分だけ高密度配線を可能とす
ることができる。[0014] Through this process of applying the gold plating layer 12 by electrolytic plating, the thickness of the gold plating layer 12 is 0.3 μm.
Since the above can be ensured, wire bonding can be performed with high reliability. As described above, according to the printed wiring board manufacturing method of this embodiment, a large number of chip components 13
When a bare chip IC 10 and a bare chip IC 10 are mounted together, it is only necessary to attach the plated leads to the pad part 8b for the bare chip IC 10, and there is no need to attach them to the pad part 8a for the chip component 13, so the number of plated leads can be minimized. There is no need to enlarge the printed circuit board 1 or make it multi-layered for plated leads. Therefore, noise,
Deterioration of electrical characteristics such as propagation speed can be prevented, and manufacturing costs can be reduced. Furthermore, high-density wiring can be achieved by the amount of unnecessary plated leads.
【0015】[0015]
【発明の効果】本発明によれば、多数のチップ部品とベ
アチップICを混載した場合、電解メッキを行うための
メッキリードの数を最小限にでき、しかも接続の信頼性
を低下させることがない上に、高密度配線が可能で、電
気特性を維持でき、製造コストの低減を図ることができ
るという優れた効果を奏する。[Effects of the Invention] According to the present invention, when a large number of chip components and bare chip ICs are mounted together, the number of plating leads for electrolytic plating can be minimized, and the reliability of the connection does not deteriorate. Moreover, it has excellent effects in that high-density wiring is possible, electrical characteristics can be maintained, and manufacturing costs can be reduced.
【図1】本発明の実施例を示す図であって、ベアチップ
ICを搭載したプリント配線板を示す断面図である。FIG. 1 is a diagram showing an embodiment of the present invention, and is a cross-sectional view showing a printed wiring board on which a bare chip IC is mounted.
【図2】導体パターンの部分に無電解メッキにより金メ
ッキ層を形成した状態を示す断面図である。FIG. 2 is a cross-sectional view showing a state in which a gold plating layer is formed on a conductor pattern portion by electroless plating.
【図3】ベアチップICを実装する領域以外の部分にメ
ッキレジストを施した状態を示す断面図である。FIG. 3 is a cross-sectional view showing a state in which a plating resist is applied to a portion other than the area where a bare chip IC is mounted.
【図4】ベアチップICを実装する領域に電解メッキに
より金メッキを施した状態を示す断面図である。FIG. 4 is a cross-sectional view showing a state in which gold plating is applied by electrolytic plating to an area where a bare chip IC is mounted.
【図5】プリント基板上にチップ部品とベアチップIC
とを実装した状態を示す部分平面図である。[Figure 5] Chip components and bare chip IC on a printed circuit board
FIG.
【図6】プリント基板にスルーホールを透設した状態を
示す断面図である。FIG. 6 is a cross-sectional view showing a state in which through holes are provided in the printed circuit board.
【図7】図6のプリント基板に無電解銅メッキにより、
銅メッキ層を形成した状態を示す断面図である。[Figure 7] Electroless copper plating is applied to the printed circuit board in Figure 6.
FIG. 3 is a cross-sectional view showing a state in which a copper plating layer is formed.
【図8】導体パターンの部分にエッチングレジスト層を
設けた状態を示す断面図である。FIG. 8 is a cross-sectional view showing a state in which an etching resist layer is provided on a portion of a conductor pattern.
【図9】図8のプリント基板にエッチングを施した状態
を示す断面図である。9 is a sectional view showing the printed circuit board of FIG. 8 after being etched; FIG.
【図10】図9のプリント基板にエッチングレジスト層
を剥離した状態を示す断面図である。10 is a cross-sectional view showing the printed circuit board of FIG. 9 after the etching resist layer has been peeled off.
1 プリント基板、5 導体パターン、10 ベ
アチップIC、11 メッキレジスト層としてのドラ
イフィルムメッキレジスト層、13 チップ部品、R
ベアチップICを実装する領域1 Printed circuit board, 5 Conductor pattern, 10 Bare chip IC, 11 Dry film plating resist layer as plating resist layer, 13 Chip component, R
Area for mounting bare chip ICs
Claims (1)
に、ハンダ付けにより電気的な接続を行うチップ部品(
13)と、ワイヤーボンディングにより電気的な接続を
行うベアチップIC(10)とを実装するプリント配線
板の製造方法において、前記プリント基板(1)に導体
パターン(5)を形成した後、同導体パターン(5)上
に無電解メッキによりニッケル及び金をメッキする工程
と、前記ベアチップIC(10)を実装する領域(R)
を除いた領域をメッキレジスト(11)で覆う工程と、
前記メッキレジスト(11)以外の部分の導体パターン
(5)に、電解メッキにより金メッキを施す工程とから
なるプリント配線板の製造方法。1. A chip component (1) that is electrically connected by soldering on a printed circuit board (1) made of an insulating material.
13) and a bare chip IC (10) that is electrically connected by wire bonding, after forming a conductor pattern (5) on the printed circuit board (1), (5) Step of plating nickel and gold by electroless plating on the area (R) where the bare chip IC (10) is mounted;
a step of covering the area except for with a plating resist (11);
A method for manufacturing a printed wiring board, comprising the step of applying gold plating to a portion of the conductor pattern (5) other than the plating resist (11) by electrolytic plating.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2404933A JP2859741B2 (en) | 1990-12-21 | 1990-12-21 | Manufacturing method of printed wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2404933A JP2859741B2 (en) | 1990-12-21 | 1990-12-21 | Manufacturing method of printed wiring board |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04221881A true JPH04221881A (en) | 1992-08-12 |
JP2859741B2 JP2859741B2 (en) | 1999-02-24 |
Family
ID=18514575
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2404933A Expired - Fee Related JP2859741B2 (en) | 1990-12-21 | 1990-12-21 | Manufacturing method of printed wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2859741B2 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001358257A (en) * | 2000-06-16 | 2001-12-26 | Toppan Printing Co Ltd | Method for manufacturing substrate for semiconductor device |
JP2002314230A (en) * | 2001-04-17 | 2002-10-25 | Matsushita Electric Ind Co Ltd | Board device and its manufacturing method |
JP2005191131A (en) * | 2003-12-24 | 2005-07-14 | Ngk Spark Plug Co Ltd | Method of manufacturing wiring board |
JP2007088190A (en) * | 2005-09-22 | 2007-04-05 | Sumitomo Metal Electronics Devices Inc | Package for receiving high heat-dissipation electronic component |
JP2008270718A (en) * | 2007-04-18 | 2008-11-06 | Samsung Electro Mech Co Ltd | Method of manufacturing printed circuit board for semiconductor packages |
JP2015170575A (en) * | 2014-03-10 | 2015-09-28 | セイコーインスツル株式会社 | Substrate unit, electrochemical cell unit and manufacturing method for electrochemical cell unit |
-
1990
- 1990-12-21 JP JP2404933A patent/JP2859741B2/en not_active Expired - Fee Related
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001358257A (en) * | 2000-06-16 | 2001-12-26 | Toppan Printing Co Ltd | Method for manufacturing substrate for semiconductor device |
JP2002314230A (en) * | 2001-04-17 | 2002-10-25 | Matsushita Electric Ind Co Ltd | Board device and its manufacturing method |
JP2005191131A (en) * | 2003-12-24 | 2005-07-14 | Ngk Spark Plug Co Ltd | Method of manufacturing wiring board |
JP2007088190A (en) * | 2005-09-22 | 2007-04-05 | Sumitomo Metal Electronics Devices Inc | Package for receiving high heat-dissipation electronic component |
JP2008270718A (en) * | 2007-04-18 | 2008-11-06 | Samsung Electro Mech Co Ltd | Method of manufacturing printed circuit board for semiconductor packages |
JP2015170575A (en) * | 2014-03-10 | 2015-09-28 | セイコーインスツル株式会社 | Substrate unit, electrochemical cell unit and manufacturing method for electrochemical cell unit |
Also Published As
Publication number | Publication date |
---|---|
JP2859741B2 (en) | 1999-02-24 |
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