JP2859741B2 - Manufacturing method of printed wiring board - Google Patents

Manufacturing method of printed wiring board

Info

Publication number
JP2859741B2
JP2859741B2 JP2404933A JP40493390A JP2859741B2 JP 2859741 B2 JP2859741 B2 JP 2859741B2 JP 2404933 A JP2404933 A JP 2404933A JP 40493390 A JP40493390 A JP 40493390A JP 2859741 B2 JP2859741 B2 JP 2859741B2
Authority
JP
Japan
Prior art keywords
plating
gold
bare chip
chip
circuit board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2404933A
Other languages
Japanese (ja)
Other versions
JPH04221881A (en
Inventor
起親 高木
博徳 長澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ibiden Co Ltd
Original Assignee
Ibiden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibiden Co Ltd filed Critical Ibiden Co Ltd
Priority to JP2404933A priority Critical patent/JP2859741B2/en
Publication of JPH04221881A publication Critical patent/JPH04221881A/en
Application granted granted Critical
Publication of JP2859741B2 publication Critical patent/JP2859741B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01078Platinum [Pt]
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/18Printed circuits structurally associated with non-printed electric components
    • H05K1/181Printed circuits structurally associated with non-printed electric components associated with surface mounted components
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/24Reinforcing the conductive pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/4007Surface contacts, e.g. bumps

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明はハンダ付けにより電気的
な接続を行うチップ部品と、ワイヤーボンディングによ
り電気的な接続を行うベアチップICとを実装したプリ
ント配線板の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a printed wiring board on which a chip component electrically connected by soldering and a bare chip IC electrically connected by wire bonding are mounted.

【0002】[0002]

【従来の技術】従来、フラットパッケージIC、チップ
抵抗、チップコンデンサ等の電子部品をプリント基板上
に搭載する場合、プリント基板にクリームハンダを用い
て所定のパターンを印刷し、そこに電子部品を配置した
後、赤外線ヒータ等で加熱してクリームハンダをリフロ
ーさせて電子部品をプリント基板に実装していた。この
場合、パターンである銅の防錆のために、無電解メッキ
又は電解メッキによるニッケル−金メッキが施される。
2. Description of the Related Art Conventionally, when electronic components such as a flat package IC, a chip resistor, and a chip capacitor are mounted on a printed circuit board, a predetermined pattern is printed on the printed circuit board using cream solder, and the electronic components are arranged there. After that, the electronic component is mounted on a printed circuit board by heating with an infrared heater or the like to reflow the cream solder. In this case, nickel-gold plating by electroless plating or electrolytic plating is applied to prevent rust of copper as a pattern.

【0003】また、ベアチップICをプリント基板に搭
載し、金ワイヤーによってワイヤーボンディングするた
めには、パッド部に電解メッキ又は無電解メッキにより
ニッケル−金メッキを施すことが必要である。この場
合、ニッケルはワイヤーボンディング時の加熱、加圧に
対抗する硬さをもたせるため、5〜10μmの厚さが必
要で、金は99.99 %以上の高純度が要求され、厚さは0.
3 〜0.5 μm以上であることが必要である。
Further, in order to mount a bare chip IC on a printed circuit board and perform wire bonding with a gold wire, it is necessary to apply nickel-gold plating to the pad portion by electrolytic plating or electroless plating. In this case, nickel must have a thickness of 5 to 10 μm in order to have a hardness that resists heating and pressing during wire bonding, and gold must have a high purity of 99.99% or more, and a thickness of 0.
It needs to be 3 to 0.5 μm or more.

【0004】[0004]

【発明が解決しようとする課題】ところが、近年ワイヤ
ーボンディングによるベアチップICとともに、その周
辺に抵抗、コンデンサ等のチップ部品を混載することが
行われている。この場合、ベアチップICとその周辺に
数個の抵抗、コンデンサ等が配置されている程度であれ
ば、ベアチップIC及びチップ部品のパッドに対し、全
てメッキリードを付与し、電解メッキによるニッケル、
金メッキを行うことができる。しかし、例えばハイブリ
ッドICの用途で、抵抗、コンデンサ等が数十個という
多数個で、しかもこれらとベアチップICとを混載しな
ければならない場合には次のような制約条件がある。
配線が複雑で迂回が困難であるため、チップ部品の全パ
ッドに対してメッキリードを付与することが困難であ
る。また、プリント基板を大きくすると配線長が長くな
りノイズを拾いやすく、伝搬遅延が大きくなる等の電気
特性が悪化する。さらに、多層化するとコストが高くな
る。チップ部品を載せるためのパッドに0.3 〜0.5 μ
m の金メッキを施すと、その上にハンダ印刷、ハンダリ
フローのための加熱により、ハンダが金メッキ層へ拡散
し厚みの厚い拡散層を形成し、ハンダ付けの信頼性が低
下する。この信頼性の低下は、チップ部品が多数になる
ほど全体としての影響が大きくなる。従って、ハンダの
上記拡散を防止するために金メッキはチップ部品を載せ
るためのパッドには0.1 μm 以下の厚さとし、厚い拡散
層を作らないことが要求されるとともに、またベアチッ
プICのワイヤーボンディングのためには0.3 〜0.5 μ
m の厚さが要求される。
However, in recent years, together with a bare chip IC by wire bonding, chip components such as a resistor and a capacitor are mixedly mounted around the bare chip IC. In this case, as long as several resistors, capacitors, etc. are arranged around the bare chip IC and its periphery, all plating leads are provided to the bare chip IC and the pads of the chip components, and nickel by electrolytic plating,
Gold plating can be performed. However, for example, in a hybrid IC application, when there are a large number of tens of resistors, capacitors, and the like, and when these and a bare chip IC must be mixed, there are the following restrictions.
Since wiring is complicated and detour is difficult, it is difficult to provide plated leads to all pads of the chip component. In addition, when the size of the printed circuit board is increased, the wiring length becomes longer, noise is more likely to be picked up, and electrical characteristics such as propagation delay are increased. Further, multi-layering increases costs. 0.3 to 0.5 μm on pad for mounting chip parts
When gold plating of m is applied, solder is diffused into the gold plating layer by heating for solder printing and solder reflow to form a thick diffusion layer, thereby lowering the reliability of soldering. This decrease in reliability has a greater overall effect as the number of chip components increases. Therefore, in order to prevent the above-mentioned diffusion of solder, gold plating is required to have a thickness of 0.1 μm or less for pads for mounting chip components, not to form a thick diffusion layer, and to perform wire bonding of bare chip ICs. 0.3 to 0.5 μ
m thickness is required.

【0005】このような条件下において、前記クリーム
ハンダをリフローさせて電子部品をプリント基板に実装
する場合、電解メッキによるニッケル−金メッキは、メ
ッキのためにメッキリードを取付け、メッキ後に回路を
独立させるためにこのメッキリードを分断する必要があ
り、プリント基板全体にわたってこのような操作を行う
ことはコスト高となって好ましくないという問題点があ
った。
Under these conditions, when the electronic components are mounted on a printed circuit board by reflowing the cream solder, nickel-gold plating by electrolytic plating attaches plating leads for plating and makes the circuit independent after plating. For this reason, it is necessary to cut the plating leads, and there is a problem that performing such an operation over the entire printed circuit board is costly and is not preferable.

【0006】そこで本発明の目的は、多数のチップ部品
とベアチップICを混載した場合に、メッキリードを多
く必要とせず、接続の信頼性を低下させることがなく、
しかも高密度配線が可能で、電気特性を維持でき、製造
コストを低減させることができるプリント配線板の製造
方法を提供することにある。
Accordingly, an object of the present invention is to eliminate the need for a large number of plated leads and to reduce the reliability of connection when a large number of chip components and bare chip ICs are mounted together.
Moreover, it is an object of the present invention to provide a method of manufacturing a printed wiring board, which enables high-density wiring, maintains electrical characteristics, and reduces manufacturing costs.

【0007】[0007]

【課題を解決するための手段】本発明は上記目的を達成
するため、絶縁材よりなるプリント基板上に、ハンダ付
けにより電気的な接続を行うチップ部品と、ワイヤーボ
ンディングにより電気的な接続を行うベアチップICと
を実装するプリント配線板の製造方法において、前記プ
リント基板に導体パターンを形成した後、同導体パター
ン上に無電解メッキによりニッケル及び金をメッキする
工程と、前記ベアチップICを実装する領域を除いた領
域をメッキレジストで覆う工程と、前記メッキレジスト
以外の部分の導体パターンに、電解メッキにより金メッ
キを施す工程とからなるプリント配線板の製造方法をそ
の要旨としている。
According to the present invention, in order to achieve the above object, a chip component for making an electrical connection by soldering on a printed circuit board made of an insulating material and an electrical connection by wire bonding are provided. In a method of manufacturing a printed wiring board for mounting a bare chip IC, a step of forming a conductive pattern on the printed circuit board and then plating nickel and gold on the conductive pattern by electroless plating, and an area for mounting the bare chip IC. The gist of the present invention is a method for manufacturing a printed wiring board, comprising: a step of covering a region except for the plating resist with a plating resist; and a step of performing gold plating by electroplating on a conductor pattern other than the plating resist.

【0008】[0008]

【作用】まず、プリント基板に導体パターンが形成され
た後、同導体パターン上全体に無電解メッキによりニッ
ケル及び金がメッキされ、次いでベアチップICを実装
する領域を除いた領域がメッキレジストにより覆われ、
続いてこのメッキレジスト以外の領域に、電解メッキに
より金メッキが施される。その結果、ハンダ付けにより
電気的接続を行うチップ部品と、ワイヤーボンディング
により電気的接続を行うベアチップICとがどちらも良
好な条件下で実装可能なプリント配線板が形成される。
First, after a conductor pattern is formed on a printed circuit board, nickel and gold are plated on the entire conductor pattern by electroless plating, and the area excluding the area for mounting the bare chip IC is covered with a plating resist. ,
Subsequently, gold plating is applied to regions other than the plating resist by electrolytic plating. As a result, a printed wiring board is formed on which both chip components for making electrical connections by soldering and bare chip ICs for making electrical connections by wire bonding can be mounted under favorable conditions.

【0009】[0009]

【実施例】以下、本発明を具体化した一実施例を、各工
程毎に図1〜10に従って説明する。 (1)無電解メッキによりニッケル及び金をメッキする
工程。 図6に示すように、まず、銅張ガラスエポキシ積層板か
らなるプリント基板1にNCドリルによってスルーホー
ル2を透設した後、図7に示すように、無電解銅メッ
キ、電解銅メッキを施すことにより、銅メッキ層3を形
成する。上記ガラスエポキシ積層板に代えて、コンポジ
ット、ガラスポリイミド、ガラストリアジン、紙エポキ
シ、テフロン等の積層板を使用することができる。次
に、図8に示すように、導体パターンの部分をドライフ
ィルムによりエッチングレジスト層4を形成した後、図
9に示すようにエッチングを行う。続いて、図10に示
すように、前記エッチングレジスト層4を剥離すること
により導体パターン5を形成する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to FIGS. (1) A step of plating nickel and gold by electroless plating. As shown in FIG. 6, first, a through hole 2 is provided through a printed board 1 made of a copper-clad glass epoxy laminate by an NC drill, and then, as shown in FIG. 7, electroless copper plating and electrolytic copper plating are performed. Thereby, the copper plating layer 3 is formed. Instead of the glass epoxy laminate, a laminate of composite, glass polyimide, glass triazine, paper epoxy, Teflon, or the like can be used. Next, as shown in FIG. 8, after the etching resist layer 4 is formed on the portion of the conductor pattern using a dry film, etching is performed as shown in FIG. Subsequently, as shown in FIG. 10, the conductive pattern 5 is formed by removing the etching resist layer 4.

【0010】次に、図2に示すように、この導体パター
ン5の部分に市販のニッケル(Ni )−リン(P)のメ
ッキ浴を用い、無電解メッキを行うことにより、ニッケ
ルメッキ層6を5μm の厚みに形成する。そして、市販
の置換金メッキ浴により、ニッケルメッキ層6の上に金
メッキ層7を約0.05μm の厚みに形成する。なお、この
プリント基板1の導体パターン5の形成方法として、上
記エッチングによるサブトラクティブ法の他に、セミア
ディティブ法、フルアディティブ法を採用することもで
きる。また、無電解ニッケルメッキ浴としては、ニッケ
ル−リンのメッキ浴に代えてニッケル−ホウ素浴等を用
いることができ、置換金メッキ浴に代えて還元金メッキ
浴を用いることもできる。但し、この還元金メッキ浴を
用いる場合は、処理時間を短時間とし、金メッキの厚み
を0.1 μm よりあまり厚くならないようにすることが重
要である。
Next, as shown in FIG. 2, a nickel plating layer 6 is formed on the conductor pattern 5 by electroless plating using a commercially available nickel (Ni) -phosphorus (P) plating bath. It is formed to a thickness of 5 μm. Then, a gold plating layer 7 having a thickness of about 0.05 μm is formed on the nickel plating layer 6 by a commercially available replacement gold plating bath. In addition, as a method of forming the conductor pattern 5 on the printed circuit board 1, a semi-additive method or a full-additive method can be adopted in addition to the above-described subtractive method by etching. As the electroless nickel plating bath, a nickel-boron bath or the like can be used instead of the nickel-phosphorus plating bath, and a reduced gold plating bath can be used instead of the replacement gold plating bath. However, when using this reduced gold plating bath, it is important to shorten the processing time so that the thickness of the gold plating does not become much larger than 0.1 μm.

【0011】上記のように、この工程においては、導体
パターン5やチップ部品のパッド部上に金が0.1 μm 以
下に形成されているので、その上にクリームハンダを塗
布し、加熱リフローさせても、ハンダと金との間で厚い
拡散層をつくることがなく、またいわゆるハンダ食われ
がないので、ハンダ付けの信頼性に優れている。また、
金メッキの厚さが従来より薄くできるので、その分コス
トダウンを図ることができる。さらに、導体パターン5
全体が、金で覆われるので、導体パターン5から銅が溶
け出すマイグレーションを防止することができる。 (2)ベアチップICを実装する領域以外の領域をメッ
キレジストで覆う工程。
As described above, in this step, since gold is formed to a thickness of 0.1 μm or less on the conductor pattern 5 and the pad portion of the chip component, even if cream solder is applied thereon and heated and reflowed, Since a thick diffusion layer is not formed between solder and gold, and there is no so-called solder erosion, the reliability of soldering is excellent. Also,
Since the thickness of the gold plating can be made thinner than before, the cost can be reduced accordingly. Further, the conductor pattern 5
Since the whole is covered with gold, it is possible to prevent migration in which copper is melted from the conductor pattern 5. (2) A step of covering a region other than a region where the bare chip IC is mounted with a plating resist.

【0012】図3,5に示すように、上記金メッキを施
したプリント基板1上のパッド部8a,8bを除き、ス
クリーン印刷法によってソルダーレジスト層9を印刷し
た。図1,5に示すように、上記一方のパッド部8a上
には、チップ部品13が搭載され、他方のパッド部8b
には一端がベアチップIC10に接続された金ワイヤー
14の他端がワイヤーボンディングされるようになって
いる。前記ソルダーレジスト層9としては、スクリーン
印刷法により塗布するエポキシ系樹脂、粘着して用いる
フィルム状の光硬化型アクリル樹脂、塗布して用いる液
状の光硬化型アクリル樹脂等を使用することができる。
次いで、ベアチップIC10を実装する領域R以外の領
域に、ドライフィルムメッキレジスト層11を形成し
た。
As shown in FIGS. 3 and 5, the solder resist layer 9 was printed by a screen printing method except for the pad portions 8a and 8b on the gold-plated printed circuit board 1. As shown in FIGS. 1 and 5, the chip component 13 is mounted on the one pad portion 8a, and the other pad portion 8b
The other end of the gold wire 14 whose one end is connected to the bare chip IC 10 is wire-bonded. As the solder resist layer 9, an epoxy resin applied by a screen printing method, a photocurable acrylic resin in the form of a film to be used by adhesion, a liquid photocurable acrylic resin to be applied and used, or the like can be used.
Next, a dry film plating resist layer 11 was formed in a region other than the region R where the bare chip IC 10 was mounted.

【0013】なお、前記ソルダーレジスト層9を施す工
程は、導体パターン5全体に無電解メッキによるニッケ
ル、金を施した後であれば、後述する電解メッキによる
金メッキの前又は後のいずれでもよい。 (3)電解メッキにより金メッキを施す工程。 図4に示すように、プリント基板1上の上記ドライフィ
ルムメッキレジスト層11が施されていないベアチップ
IC10実装部の部分に、図示しないメッキリードを使
用した電解メッキにより0.5 μm の厚さの金メッキ層1
2を施した。次に、図1に示すように、前記ドライフィ
ルムメッキレジスト層11を剥離した後、外形加工を行
った。そして、ベアチップIC10を金ワイヤー14を
用いたワイヤーボンディングによって実装することによ
り、所望のプリント配線板を得た。
The step of applying the solder resist layer 9 may be performed before or after gold plating by electrolytic plating, as described below, as long as the entire conductor pattern 5 is plated with nickel or gold by electroless plating. (3) A step of applying gold plating by electrolytic plating. As shown in FIG. 4, a gold plating layer having a thickness of 0.5 μm is formed by electroplating using a plating lead (not shown) on a portion of the printed circuit board 1 where the dry film plating resist layer 11 is not provided and where the bare chip IC 10 is mounted. 1
2 was given. Next, as shown in FIG. 1, after the dry film plating resist layer 11 was peeled off, outer shape processing was performed. Then, the desired printed wiring board was obtained by mounting the bare chip IC 10 by wire bonding using the gold wire 14.

【0014】この電解メッキによって金メッキ層12を
施す工程により、金メッキ層12の厚みが0.3 μm 以上
確保できるので、ワイヤーボンディングを信頼性良く行
うことができる。上記のように、本実施例のプリント配
線板の製造方法によれば、多数のチップ部品13とベア
チップIC10を混載した場合、メッキリードをベアチ
ップIC10用のパッド部8bについてのみ取付ければ
よく、チップ部品13用のパッド部8aに取付ける必要
がないので、メッキリードの本数を最小限にすることが
でき、メッキリードのためにプリント基板1を大きくし
たり、多層化する必要がない。従って、ノイズ、伝搬速
度等の電気特性の悪化を防ぐことができるとともに、製
造コストの低減を図ることができる。さらに、不要とな
ったメッキリードの分だけ高密度配線を可能とすること
ができる。
In the step of applying the gold plating layer 12 by the electrolytic plating, the thickness of the gold plating layer 12 can be secured to 0.3 μm or more, so that the wire bonding can be performed with high reliability. As described above, according to the method of manufacturing a printed wiring board of the present embodiment, when a large number of chip components 13 and bare chip ICs 10 are mixed and mounted, plating leads need only be attached to the pad portions 8b for bare chip ICs 10. Since there is no need to attach the component 13 to the pad portion 8a, the number of plating leads can be minimized, and the printed board 1 does not need to be enlarged or multilayered for plating leads. Therefore, it is possible to prevent deterioration of electrical characteristics such as noise and propagation speed, and to reduce manufacturing costs. Further, high-density wiring can be made possible by the amount of unnecessary plating leads.

【0015】[0015]

【発明の効果】本発明によれば、多数のチップ部品とベ
アチップICを混載した場合、電解メッキを行うための
メッキリードの数を最小限にでき、しかも接続の信頼性
を低下させることがない上に、高密度配線が可能で、電
気特性を維持でき、製造コストの低減を図ることができ
るという優れた効果を奏する。
According to the present invention, when a large number of chip components and bare chip ICs are mixedly mounted, the number of plating leads for performing electrolytic plating can be minimized, and the reliability of connection is not reduced. In addition, there is an excellent effect that high-density wiring is possible, electrical characteristics can be maintained, and manufacturing cost can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例を示す図であって、ベアチップ
ICを搭載したプリント配線板を示す断面図である。
FIG. 1 is a view showing an embodiment of the present invention, and is a cross-sectional view showing a printed wiring board on which a bare chip IC is mounted.

【図2】導体パターンの部分に無電解メッキにより金メ
ッキ層を形成した状態を示す断面図である。
FIG. 2 is a cross-sectional view showing a state in which a gold plating layer is formed on a conductor pattern portion by electroless plating.

【図3】ベアチップICを実装する領域以外の部分にメ
ッキレジストを施した状態を示す断面図である。
FIG. 3 is a cross-sectional view showing a state where plating resist is applied to a portion other than a region where a bare chip IC is mounted.

【図4】ベアチップICを実装する領域に電解メッキに
より金メッキを施した状態を示す断面図である。
FIG. 4 is a cross-sectional view showing a state where gold plating is applied by electroplating to a region where a bare chip IC is mounted.

【図5】プリント基板上にチップ部品とベアチップIC
とを実装した状態を示す部分平面図である。
FIG. 5 shows a chip component and a bare chip IC on a printed circuit board.
FIG. 6 is a partial plan view showing a state in which is mounted.

【図6】プリント基板にスルーホールを透設した状態を
示す断面図である。
FIG. 6 is a cross-sectional view showing a state in which a through-hole is provided in a printed circuit board.

【図7】図6のプリント基板に無電解銅メッキにより、
銅メッキ層を形成した状態を示す断面図である。
FIG. 7 shows the printed circuit board of FIG. 6 by electroless copper plating.
It is sectional drawing which shows the state in which the copper plating layer was formed.

【図8】導体パターンの部分にエッチングレジスト層を
設けた状態を示す断面図である。
FIG. 8 is a cross-sectional view showing a state where an etching resist layer is provided in a portion of a conductor pattern.

【図9】図8のプリント基板にエッチングを施した状態
を示す断面図である。
FIG. 9 is a cross-sectional view showing a state where the printed board of FIG. 8 is etched.

【図10】図9のプリント基板にエッチングレジスト層
を剥離した状態を示す断面図である。
FIG. 10 is a cross-sectional view showing a state where an etching resist layer is peeled off from the printed circuit board of FIG. 9;

【符号の説明】[Explanation of symbols]

1 プリント基板、5 導体パターン、10 ベアチッ
プIC、11 メッキレジスト層としてのドライフィル
ムメッキレジスト層、13 チップ部品、Rベアチップ
ICを実装する領域
Reference Signs List 1 printed board, 5 conductor pattern, 10 bare chip IC, 11 dry film plating resist layer as plating resist layer, 13 chip parts, area for mounting R bare chip IC

フロントページの続き (56)参考文献 特開 平2−185094(JP,A) 特開 平4−7892(JP,A) 特開 昭60−76187(JP,A) 特開 平1−196195(JP,A) 特開 平1−200694(JP,A) 特開 昭63−128788(JP,A) 特開 昭57−64943(JP,A) 実開 平2−54274(JP,U) (58)調査した分野(Int.Cl.6,DB名) H01L 21/60 301 H05K 3/24 H05K 1/18Continuation of the front page (56) References JP-A-2-185509 (JP, A) JP-A-4-7892 (JP, A) JP-A-60-76187 (JP, A) JP-A-1-196195 (JP) JP-A-1-200694 (JP, A) JP-A-63-128788 (JP, A) JP-A-57-64943 (JP, A) JP-A-2-54274 (JP, U) (58) Field surveyed (Int.Cl. 6 , DB name) H01L 21/60 301 H05K 3/24 H05K 1/18

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 絶縁材よりなるプリント基板(1)上
に、ハンダ付けにより電気的な接続を行うチップ部品
(13)と、ワイヤーボンディングにより電気的な接続
を行うベアチップIC(10)とを実装するプリント配
線板の製造方法において、前記プリント基板(1)に導
体パターン(5)を形成した後、同導体パターン(5)
上に無電解メッキによりニッケル及び金をメッキする工
程と、前記ベアチップIC(10)を実装する領域
(R)を除いた領域をメッキレジスト(11)で覆う工
程と、前記メッキレジスト(11)以外の部分の導体パ
ターン(5)に、電解メッキにより金メッキを施す工程
とからなるプリント配線板の製造方法。
1. A chip component (13) for making an electrical connection by soldering and a bare chip IC (10) for making an electrical connection by wire bonding are mounted on a printed board (1) made of an insulating material. Forming a conductor pattern (5) on the printed circuit board (1), and then forming the conductor pattern (5) on the printed circuit board (1).
A step of plating nickel and gold thereon by electroless plating, a step of covering the area excluding the area (R) where the bare chip IC (10) is mounted with a plating resist (11), and a step other than the plating resist (11) Applying gold plating by electroplating to the conductor pattern (5) in the portion (1).
JP2404933A 1990-12-21 1990-12-21 Manufacturing method of printed wiring board Expired - Fee Related JP2859741B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2404933A JP2859741B2 (en) 1990-12-21 1990-12-21 Manufacturing method of printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2404933A JP2859741B2 (en) 1990-12-21 1990-12-21 Manufacturing method of printed wiring board

Publications (2)

Publication Number Publication Date
JPH04221881A JPH04221881A (en) 1992-08-12
JP2859741B2 true JP2859741B2 (en) 1999-02-24

Family

ID=18514575

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2404933A Expired - Fee Related JP2859741B2 (en) 1990-12-21 1990-12-21 Manufacturing method of printed wiring board

Country Status (1)

Country Link
JP (1) JP2859741B2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001358257A (en) * 2000-06-16 2001-12-26 Toppan Printing Co Ltd Method for manufacturing substrate for semiconductor device
JP4682437B2 (en) * 2001-04-17 2011-05-11 パナソニック株式会社 Board device
JP4219266B2 (en) * 2003-12-24 2009-02-04 日本特殊陶業株式会社 Wiring board manufacturing method
JP2007088190A (en) * 2005-09-22 2007-04-05 Sumitomo Metal Electronics Devices Inc Package for receiving high heat-dissipation electronic component
KR100826360B1 (en) * 2007-04-18 2008-05-02 삼성전기주식회사 Method for manufacturing printed circuit board for semi-conductor package
JP6266387B2 (en) * 2014-03-10 2018-01-24 セイコーインスツル株式会社 Substrate unit, electrochemical cell unit, and electrochemical cell unit manufacturing method

Also Published As

Publication number Publication date
JPH04221881A (en) 1992-08-12

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