JPH0420984B2 - - Google Patents
Info
- Publication number
- JPH0420984B2 JPH0420984B2 JP26683486A JP26683486A JPH0420984B2 JP H0420984 B2 JPH0420984 B2 JP H0420984B2 JP 26683486 A JP26683486 A JP 26683486A JP 26683486 A JP26683486 A JP 26683486A JP H0420984 B2 JPH0420984 B2 JP H0420984B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic field
- substrate
- film
- thin film
- electric field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010408 film Substances 0.000 claims description 34
- 239000000758 substrate Substances 0.000 claims description 28
- 239000010409 thin film Substances 0.000 claims description 13
- 238000005530 etching Methods 0.000 claims description 5
- 230000005684 electric field Effects 0.000 description 22
- 210000002381 plasma Anatomy 0.000 description 19
- 239000007789 gas Substances 0.000 description 13
- 230000003993 interaction Effects 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 229910003460 diamond Inorganic materials 0.000 description 7
- 239000010432 diamond Substances 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001475 halogen functional group Chemical group 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 150000002500 ions Chemical group 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 229910000951 Aluminide Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000005094 computer simulation Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 235000012489 doughnuts Nutrition 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61266834A JPS63121667A (ja) | 1986-11-10 | 1986-11-10 | 薄膜形成装置 |
| DE3752208T DE3752208T2 (de) | 1986-11-10 | 1987-11-02 | Durch Mikrowellen gesteigertes CVD-Verfahren und -Gerät |
| EP87116091A EP0267513B1 (en) | 1986-11-10 | 1987-11-02 | Microwave enhanced CVD method and apparatus |
| KR1019870012471A KR930005010B1 (ko) | 1986-11-10 | 1987-11-06 | 마이크로파 증강 cvd장치 및 방법 |
| CN87107779A CN1017726B (zh) | 1986-11-10 | 1987-11-09 | 加有磁场的微波等离子体化学汽相淀积法 |
| US07/966,562 US5266363A (en) | 1986-11-10 | 1992-10-26 | Plasma processing method utilizing a microwave and a magnetic field at high pressure |
| US08/470,596 US6677001B1 (en) | 1986-11-10 | 1995-06-06 | Microwave enhanced CVD method and apparatus |
| US11/102,651 US20050196549A1 (en) | 1986-11-10 | 2005-04-11 | Microwave enhanced CVD method and apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61266834A JPS63121667A (ja) | 1986-11-10 | 1986-11-10 | 薄膜形成装置 |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14506890A Division JPH03166379A (ja) | 1990-06-01 | 1990-06-01 | 被膜形成方法 |
| JP14506790A Division JPH0317274A (ja) | 1990-06-01 | 1990-06-01 | 被膜形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63121667A JPS63121667A (ja) | 1988-05-25 |
| JPH0420984B2 true JPH0420984B2 (ru) | 1992-04-07 |
Family
ID=17436303
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61266834A Granted JPS63121667A (ja) | 1986-11-10 | 1986-11-10 | 薄膜形成装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63121667A (ru) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0676665B2 (ja) * | 1987-01-05 | 1994-09-28 | 株式会社半導体エネルギ−研究所 | 薄膜形成方法 |
| JPS63145782A (ja) * | 1986-12-08 | 1988-06-17 | Semiconductor Energy Lab Co Ltd | 薄膜形成方法 |
| JPH0715147B2 (ja) * | 1987-01-05 | 1995-02-22 | 株式会社半導体エネルギ−研究所 | 薄膜形成方法 |
| JPS63169387A (ja) * | 1987-01-05 | 1988-07-13 | Semiconductor Energy Lab Co Ltd | 薄膜形成方法 |
| JPH0765177B2 (ja) * | 1987-01-05 | 1995-07-12 | 株式会社半導体エネルギ−研究所 | プラズマ処理方法 |
| JPS63195266A (ja) * | 1987-02-10 | 1988-08-12 | Semiconductor Energy Lab Co Ltd | 炭素膜がコーティングされた時計 |
| JPH0676666B2 (ja) * | 1987-02-10 | 1994-09-28 | 株式会社半導体エネルギ−研究所 | 炭素膜作製方法 |
| EP0445754B1 (en) * | 1990-03-06 | 1996-02-14 | Sumitomo Electric Industries, Ltd. | Method for growing a diamond or c-BN thin film |
| JP2739286B2 (ja) * | 1994-06-06 | 1998-04-15 | 株式会社半導体エネルギー研究所 | プラズマ処理方法 |
-
1986
- 1986-11-10 JP JP61266834A patent/JPS63121667A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63121667A (ja) | 1988-05-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |