JPH0416012B2 - - Google Patents

Info

Publication number
JPH0416012B2
JPH0416012B2 JP26913885A JP26913885A JPH0416012B2 JP H0416012 B2 JPH0416012 B2 JP H0416012B2 JP 26913885 A JP26913885 A JP 26913885A JP 26913885 A JP26913885 A JP 26913885A JP H0416012 B2 JPH0416012 B2 JP H0416012B2
Authority
JP
Japan
Prior art keywords
etching
solution
nozzle
etching solution
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP26913885A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62128529A (ja
Inventor
Shigeru Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP60269138A priority Critical patent/JPS62128529A/ja
Publication of JPS62128529A publication Critical patent/JPS62128529A/ja
Publication of JPH0416012B2 publication Critical patent/JPH0416012B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60269138A 1985-11-29 1985-11-29 パタ−ン形成方法 Granted JPS62128529A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60269138A JPS62128529A (ja) 1985-11-29 1985-11-29 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60269138A JPS62128529A (ja) 1985-11-29 1985-11-29 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS62128529A JPS62128529A (ja) 1987-06-10
JPH0416012B2 true JPH0416012B2 (Direct) 1992-03-19

Family

ID=17468217

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60269138A Granted JPS62128529A (ja) 1985-11-29 1985-11-29 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS62128529A (Direct)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04310705A (ja) * 1991-04-10 1992-11-02 Masao Moriyama プラスチックペレットの製造装置
JP4488322B2 (ja) * 2000-01-26 2010-06-23 大日本印刷株式会社 フォトマスク製造用スピン処理装置
JP6969904B2 (ja) * 2017-05-30 2021-11-24 株式会社エスケーエレクトロニクス フォトマスクのウェットエッチング方法及びウェットエッチング装置

Also Published As

Publication number Publication date
JPS62128529A (ja) 1987-06-10

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