JPH0415465B2 - - Google Patents

Info

Publication number
JPH0415465B2
JPH0415465B2 JP61243328A JP24332886A JPH0415465B2 JP H0415465 B2 JPH0415465 B2 JP H0415465B2 JP 61243328 A JP61243328 A JP 61243328A JP 24332886 A JP24332886 A JP 24332886A JP H0415465 B2 JPH0415465 B2 JP H0415465B2
Authority
JP
Japan
Prior art keywords
trichloroethane
photoresist
alcohol
resist
isopropanol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP61243328A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62127739A (ja
Inventor
Ansheru Moorisu
Deyuan Gutsudoritsuchi Roorensu
Maitorando Hitoritsuku Baaton
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS62127739A publication Critical patent/JPS62127739A/ja
Publication of JPH0415465B2 publication Critical patent/JPH0415465B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP61243328A 1985-11-25 1986-10-15 ネガテイブ・フオトレジストの現像方法 Granted JPS62127739A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US80163585A 1985-11-25 1985-11-25
US801635 1985-11-25

Publications (2)

Publication Number Publication Date
JPS62127739A JPS62127739A (ja) 1987-06-10
JPH0415465B2 true JPH0415465B2 (enExample) 1992-03-18

Family

ID=25181656

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61243328A Granted JPS62127739A (ja) 1985-11-25 1986-10-15 ネガテイブ・フオトレジストの現像方法

Country Status (3)

Country Link
EP (1) EP0224843B1 (enExample)
JP (1) JPS62127739A (enExample)
DE (1) DE3681697D1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01140146A (ja) * 1987-11-27 1989-06-01 Asahi Glass Co Ltd レジスト現像剤
CR6243A (es) * 1999-09-20 2008-04-16 Syngenta Participations Ag Formulaciones plaguicidas que contienen tensoactivo de poliarilfenolfosfatoester alcoxilado y tensoactivo de lignosulfonato alcoxilado
US7067241B2 (en) * 2002-05-08 2006-06-27 Unaxis Balzers Aktiengesellschaft Method for producing a unit having a three-dimensional surface patterning, and use of this method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3458313A (en) * 1966-09-07 1969-07-29 Nasa High resolution developing of photosensitive resists
US3703373A (en) * 1970-06-15 1972-11-21 Eastman Kodak Co Processes and elements for preparation of photomechanical images

Also Published As

Publication number Publication date
EP0224843A2 (en) 1987-06-10
DE3681697D1 (de) 1991-10-31
EP0224843A3 (en) 1987-09-09
JPS62127739A (ja) 1987-06-10
EP0224843B1 (en) 1991-09-25

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