JPS62127739A - ネガテイブ・フオトレジストの現像方法 - Google Patents

ネガテイブ・フオトレジストの現像方法

Info

Publication number
JPS62127739A
JPS62127739A JP61243328A JP24332886A JPS62127739A JP S62127739 A JPS62127739 A JP S62127739A JP 61243328 A JP61243328 A JP 61243328A JP 24332886 A JP24332886 A JP 24332886A JP S62127739 A JPS62127739 A JP S62127739A
Authority
JP
Japan
Prior art keywords
trichloroethane
photoresist
alcohol
resist
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61243328A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0415465B2 (enExample
Inventor
モーリス・アンシエル
ローレンス・デユアン・グツドリツチ
バートン・マイトランド・ヒトリツク
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS62127739A publication Critical patent/JPS62127739A/ja
Publication of JPH0415465B2 publication Critical patent/JPH0415465B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP61243328A 1985-11-25 1986-10-15 ネガテイブ・フオトレジストの現像方法 Granted JPS62127739A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US80163585A 1985-11-25 1985-11-25
US801635 1985-11-25

Publications (2)

Publication Number Publication Date
JPS62127739A true JPS62127739A (ja) 1987-06-10
JPH0415465B2 JPH0415465B2 (enExample) 1992-03-18

Family

ID=25181656

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61243328A Granted JPS62127739A (ja) 1985-11-25 1986-10-15 ネガテイブ・フオトレジストの現像方法

Country Status (3)

Country Link
EP (1) EP0224843B1 (enExample)
JP (1) JPS62127739A (enExample)
DE (1) DE3681697D1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01140146A (ja) * 1987-11-27 1989-06-01 Asahi Glass Co Ltd レジスト現像剤
JP2010272877A (ja) * 2002-05-08 2010-12-02 Oerlikon Trading Ag Trubbach 三次元表面パターンを有するユニットを形成する方法および同方法の使用

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CR6243A (es) * 1999-09-20 2008-04-16 Syngenta Participations Ag Formulaciones plaguicidas que contienen tensoactivo de poliarilfenolfosfatoester alcoxilado y tensoactivo de lignosulfonato alcoxilado

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3458313A (en) * 1966-09-07 1969-07-29 Nasa High resolution developing of photosensitive resists
US3703373A (en) * 1970-06-15 1972-11-21 Eastman Kodak Co Processes and elements for preparation of photomechanical images

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01140146A (ja) * 1987-11-27 1989-06-01 Asahi Glass Co Ltd レジスト現像剤
JP2010272877A (ja) * 2002-05-08 2010-12-02 Oerlikon Trading Ag Trubbach 三次元表面パターンを有するユニットを形成する方法および同方法の使用

Also Published As

Publication number Publication date
EP0224843A2 (en) 1987-06-10
DE3681697D1 (de) 1991-10-31
JPH0415465B2 (enExample) 1992-03-18
EP0224843A3 (en) 1987-09-09
EP0224843B1 (en) 1991-09-25

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