JPH0411626B2 - - Google Patents
Info
- Publication number
- JPH0411626B2 JPH0411626B2 JP58004269A JP426983A JPH0411626B2 JP H0411626 B2 JPH0411626 B2 JP H0411626B2 JP 58004269 A JP58004269 A JP 58004269A JP 426983 A JP426983 A JP 426983A JP H0411626 B2 JPH0411626 B2 JP H0411626B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- reaction vessel
- film
- radicals
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Chemical Vapour Deposition (AREA)
- Photovoltaic Devices (AREA)
- Photoreceptors In Electrophotography (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58004269A JPS59131511A (ja) | 1983-01-17 | 1983-01-17 | アモルフアスシリコン膜の成膜方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58004269A JPS59131511A (ja) | 1983-01-17 | 1983-01-17 | アモルフアスシリコン膜の成膜方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59131511A JPS59131511A (ja) | 1984-07-28 |
JPH0411626B2 true JPH0411626B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-03-02 |
Family
ID=11579817
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58004269A Granted JPS59131511A (ja) | 1983-01-17 | 1983-01-17 | アモルフアスシリコン膜の成膜方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59131511A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH081895B2 (ja) * | 1985-06-07 | 1996-01-10 | 松下電器産業株式会社 | 非晶質シリコン膜の形成方法 |
JP2790843B2 (ja) * | 1989-04-19 | 1998-08-27 | シャープ株式会社 | 薄膜気相成長装置 |
JP2000212749A (ja) * | 1999-01-22 | 2000-08-02 | Ulvac Japan Ltd | 薄膜形成装置、及び窒化タングステン薄膜製造方法 |
US6402848B1 (en) * | 1999-04-23 | 2002-06-11 | Tokyo Electron Limited | Single-substrate-treating apparatus for semiconductor processing system |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56102577A (en) * | 1980-01-18 | 1981-08-17 | Mitsubishi Electric Corp | Method and device for forming thin film |
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1983
- 1983-01-17 JP JP58004269A patent/JPS59131511A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59131511A (ja) | 1984-07-28 |