JPH0410582B2 - - Google Patents
Info
- Publication number
- JPH0410582B2 JPH0410582B2 JP17630283A JP17630283A JPH0410582B2 JP H0410582 B2 JPH0410582 B2 JP H0410582B2 JP 17630283 A JP17630283 A JP 17630283A JP 17630283 A JP17630283 A JP 17630283A JP H0410582 B2 JPH0410582 B2 JP H0410582B2
- Authority
- JP
- Japan
- Prior art keywords
- inspected
- light
- irradiation section
- imaging
- shaped irradiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 claims description 53
- 238000003384 imaging method Methods 0.000 claims description 31
- 238000007689 inspection Methods 0.000 claims description 28
- 230000003287 optical effect Effects 0.000 claims description 24
- 238000012937 correction Methods 0.000 claims description 9
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 238000000206 photolithography Methods 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims 2
- 239000011159 matrix material Substances 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
- 238000001514 detection method Methods 0.000 description 44
- 238000010586 diagram Methods 0.000 description 13
- 238000000034 method Methods 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- 239000000126 substance Substances 0.000 description 6
- 239000000428 dust Substances 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58176302A JPS6067845A (ja) | 1983-09-26 | 1983-09-26 | 異物検査装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58176302A JPS6067845A (ja) | 1983-09-26 | 1983-09-26 | 異物検査装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6067845A JPS6067845A (ja) | 1985-04-18 |
| JPH0410582B2 true JPH0410582B2 (show.php) | 1992-02-25 |
Family
ID=16011207
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58176302A Granted JPS6067845A (ja) | 1983-09-26 | 1983-09-26 | 異物検査装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6067845A (show.php) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2559470B2 (ja) * | 1988-08-12 | 1996-12-04 | 株式会社日立製作所 | 外観検査方法 |
| US5343290A (en) * | 1992-06-11 | 1994-08-30 | International Business Machines Corporation | Surface particle detection using heterodyne interferometer |
| WO2020170389A1 (ja) * | 2019-02-21 | 2020-08-27 | 株式会社エフケー光学研究所 | 異物検査装置及び異物検査方法 |
-
1983
- 1983-09-26 JP JP58176302A patent/JPS6067845A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6067845A (ja) | 1985-04-18 |
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