JPH039581B2 - - Google Patents

Info

Publication number
JPH039581B2
JPH039581B2 JP59112469A JP11246984A JPH039581B2 JP H039581 B2 JPH039581 B2 JP H039581B2 JP 59112469 A JP59112469 A JP 59112469A JP 11246984 A JP11246984 A JP 11246984A JP H039581 B2 JPH039581 B2 JP H039581B2
Authority
JP
Japan
Prior art keywords
lens
charged particle
image
hole
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59112469A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60257053A (ja
Inventor
Toyoki Kitayama
Shigeru Morya
Kazuhiko Komatsu
Toshinori Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP59112469A priority Critical patent/JPS60257053A/ja
Publication of JPS60257053A publication Critical patent/JPS60257053A/ja
Publication of JPH039581B2 publication Critical patent/JPH039581B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP59112469A 1984-06-01 1984-06-01 荷電粒子ビ−ム装置 Granted JPS60257053A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59112469A JPS60257053A (ja) 1984-06-01 1984-06-01 荷電粒子ビ−ム装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59112469A JPS60257053A (ja) 1984-06-01 1984-06-01 荷電粒子ビ−ム装置

Publications (2)

Publication Number Publication Date
JPS60257053A JPS60257053A (ja) 1985-12-18
JPH039581B2 true JPH039581B2 (enrdf_load_html_response) 1991-02-08

Family

ID=14587417

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59112469A Granted JPS60257053A (ja) 1984-06-01 1984-06-01 荷電粒子ビ−ム装置

Country Status (1)

Country Link
JP (1) JPS60257053A (enrdf_load_html_response)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6646150B2 (ja) * 2016-07-14 2020-02-14 株式会社日立ハイテクノロジーズ イオンミリング装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5835852A (ja) * 1981-08-28 1983-03-02 Agency Of Ind Science & Technol 荷電ビ−ム用レンズ

Also Published As

Publication number Publication date
JPS60257053A (ja) 1985-12-18

Similar Documents

Publication Publication Date Title
US5831270A (en) Magnetic deflectors and charged-particle-beam lithography systems incorporating same
US8502176B2 (en) Imaging system
JPH02718U (enrdf_load_html_response)
JPS5871545A (ja) 可変成形ビ−ム電子光学系
JPH04226021A (ja) 物体を荷電粒子ビームで照射する方法
JP2004134389A (ja) ビーム誘導構成体、結像方法、電子顕微鏡システムおよび電子リソグラフィシステム
JP2002299207A (ja) 荷電粒子ビーム描画装置
JPS5823155A (ja) 荷電粒子ビ−ムの整列制御装置
US4823013A (en) Charged particles exposure apparatus having an optically deformable beam bounding diaphragm
EP0041753B1 (en) Deflection system for charged-particle beam
WO2000075954A2 (en) Apparatus and method for forming a charged particle beam of arbitrary shape
EP0213664A1 (en) Beam of charged particles divided up into thin component beams
JPH039581B2 (enrdf_load_html_response)
JP2001229865A (ja) チャージされた粒子照射システム
JP4143204B2 (ja) 荷電粒子線露光装置及び該装置を用いたデバイス製造方法
JP3265764B2 (ja) 電子ビーム露光方法および装置
JPH0234426B2 (enrdf_load_html_response)
JP4558240B2 (ja) 電子ビーム露光装置
JPH0234144B2 (enrdf_load_html_response)
JPH063720B2 (ja) 集束イオンビ−ム装置
JP2900640B2 (ja) 荷電ビーム照射装置
JP3086238B2 (ja) 荷電粒子ビーム露光装置
JP2001093825A (ja) 荷電ビーム描画装置およびパターン描画方法並びに記録媒体
JPS61141131A (ja) イオンビ−ム描画装置
JPH0748470B2 (ja) 荷電粒子ビーム装置