JPH039329Y2 - - Google Patents
Info
- Publication number
- JPH039329Y2 JPH039329Y2 JP1158486U JP1158486U JPH039329Y2 JP H039329 Y2 JPH039329 Y2 JP H039329Y2 JP 1158486 U JP1158486 U JP 1158486U JP 1158486 U JP1158486 U JP 1158486U JP H039329 Y2 JPH039329 Y2 JP H039329Y2
- Authority
- JP
- Japan
- Prior art keywords
- nozzle
- gland
- sleeve
- gas
- reaction tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007789 gas Substances 0.000 claims description 26
- 210000004907 gland Anatomy 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 238000006243 chemical reaction Methods 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 7
- 239000012495 reaction gas Substances 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 7
- 239000010409 thin film Substances 0.000 description 5
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1158486U JPH039329Y2 (pm) | 1986-01-31 | 1986-01-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1158486U JPH039329Y2 (pm) | 1986-01-31 | 1986-01-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62126833U JPS62126833U (pm) | 1987-08-12 |
| JPH039329Y2 true JPH039329Y2 (pm) | 1991-03-08 |
Family
ID=30798932
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1158486U Expired JPH039329Y2 (pm) | 1986-01-31 | 1986-01-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH039329Y2 (pm) |
-
1986
- 1986-01-31 JP JP1158486U patent/JPH039329Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62126833U (pm) | 1987-08-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5368648A (en) | Sealing apparatus | |
| KR100330130B1 (ko) | 열처리 방법 및 그 장치 | |
| US5976260A (en) | Semiconductor producing apparatus, and wafer vacuum chucking device, gas cleaning method and nitride film forming method in semiconductor producing apparatus | |
| JP2000068259A (ja) | 熱処理装置 | |
| JPH039329Y2 (pm) | ||
| JPH065531A (ja) | 熱処理装置の配管連結装置 | |
| JP2003068657A (ja) | 熱処理装置および熱処理方法 | |
| JP3406104B2 (ja) | 熱処理装置 | |
| CN218299750U (zh) | 气体供给部及基板处理装置 | |
| JP3325384B2 (ja) | 熱処理炉用温度測定装置 | |
| US20020180208A1 (en) | Joint assembly for connecting two tubes | |
| JPS62262420A (ja) | 半導体加熱用耐熱管のシ−ル方法 | |
| JP3463785B2 (ja) | 封止装置および処理装置 | |
| JP3227280B2 (ja) | 熱処理装置 | |
| JP2602307Y2 (ja) | 表面処理装置 | |
| JP2700939B2 (ja) | 封止装置 | |
| JPH025172Y2 (pm) | ||
| KR20010046221A (ko) | 저압 화학 기상 증착용 수평로의 플랜지 냉각 장치 | |
| JP2849772B2 (ja) | 封止装置及び封止方法 | |
| JPH0253671B2 (pm) | ||
| JPH0532956Y2 (pm) | ||
| JPH05280647A (ja) | 真空シール方法 | |
| JP2001118837A (ja) | 半導体製造装置 | |
| JPH0774104A (ja) | 反応炉 | |
| JPH11111632A (ja) | 縦型熱処理装置 |