JPH0385559U - - Google Patents
Info
- Publication number
- JPH0385559U JPH0385559U JP14739289U JP14739289U JPH0385559U JP H0385559 U JPH0385559 U JP H0385559U JP 14739289 U JP14739289 U JP 14739289U JP 14739289 U JP14739289 U JP 14739289U JP H0385559 U JPH0385559 U JP H0385559U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- mist
- particle size
- sample solution
- tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012488 sample solution Substances 0.000 claims description 3
- 239000007921 spray Substances 0.000 claims description 3
- 239000006199 nebulizer Substances 0.000 claims description 2
- 239000003595 mist Substances 0.000 claims 3
- 238000004458 analytical method Methods 0.000 claims 2
- 239000002245 particle Substances 0.000 claims 2
- 238000009616 inductively coupled plasma Methods 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
- 239000005871 repellent Substances 0.000 claims 1
- 235000013619 trace mineral Nutrition 0.000 claims 1
- 239000011573 trace mineral Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 1
Landscapes
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Electron Tubes For Measurement (AREA)
Description
第１図は本考案を説明する図、第２ａ図および
第２ｂ図は本考案による溶液の流れを説明する図
、第３図は従来技術を説明する図、第４図は従来
技術の問題点を説明する図である。
１……試料溶液、２……キヤピラリーチユーブ
、３……ネブライザー、４……キヤリアガス、５
……噴霧室、６……トーチ管、７……補助ガス、
８……プラズマガス、９……ワークコイル、１０
……プラズマ、１１……ドレインサイホン、１２
……ドレインタンク、１３……溶液、１４……液
滴、１５……液滴。
Figure 1 is a diagram for explaining the present invention, Figures 2a and 2b are diagrams for explaining the flow of the solution according to the present invention, Figure 3 is a diagram for explaining the prior art, and Figure 4 is a diagram for explaining the problems of the prior art. FIG. 1... Sample solution, 2... Capillary reach tube, 3... Nebulizer, 4... Carrier gas, 5
... spray chamber, 6 ... torch pipe, 7 ... auxiliary gas,
8...Plasma gas, 9...Work coil, 10
...Plasma, 11...Drain siphon, 12
...Drain tank, 13...Solution, 14...Droplet, 15...Droplet.
Claims (1)
、前記試料溶液を霧にするネブライザーで、前記
霧をプラズマ化させるトーチ管及びワークコイル
と、前記ワークコイルに高周波電流を印加する高
周波電源と、前記プラズマの発する光あるいはイ
オンを測定する測定系と、前記霧のうち一定の粒
径のものを前記トーチ管に送りかつ不必要な粒径
の霧を液化して廃棄する噴霧室と、前記噴霧室の
後にあつて前記プラズマ中に空気が混入すること
を防ぐ働きを持たせるために管が下降した後一旦
上昇してから再び下降する構造をしているドレイ
ンサイホンで構成される誘導結合プラズマ分析装
置において、前記ドレインサイホンの一旦上昇し
た部分に撥水性の膜を塗布したことを特長とする
誘導係合プラズマ分析装置。 An analyzer for identifying trace elements in a sample solution, including a nebulizer that turns the sample solution into a mist, a torch tube and a work coil that turn the fog into plasma, and a high-frequency power source that applies a high-frequency current to the work coil. a measurement system that measures light or ions emitted by the plasma; a spray chamber that sends a certain particle size of the mist to the torch tube and liquefies and discards mist with an unnecessary particle size; and the spray Inductively coupled plasma analysis consisting of a drain siphon located at the back of the chamber that has a structure in which the tube descends, rises once, and then descends again to prevent air from entering the plasma. An inductively engaged plasma analysis device characterized in that a water-repellent film is applied to a portion of the drain siphon that is once raised.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14739289U JPH0385559U (en) | 1989-12-20 | 1989-12-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14739289U JPH0385559U (en) | 1989-12-20 | 1989-12-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0385559U true JPH0385559U (en) | 1991-08-29 |
Family
ID=31693907
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14739289U Pending JPH0385559U (en) | 1989-12-20 | 1989-12-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0385559U (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6250644A (en) * | 1985-08-30 | 1987-03-05 | Hitachi Ltd | Waste liquid tank for plasma emission analyzing instrument |
| JPH01170840A (en) * | 1987-12-25 | 1989-07-05 | Shimadzu Corp | Sample introducing device for icp analyzer |
-
1989
- 1989-12-20 JP JP14739289U patent/JPH0385559U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6250644A (en) * | 1985-08-30 | 1987-03-05 | Hitachi Ltd | Waste liquid tank for plasma emission analyzing instrument |
| JPH01170840A (en) * | 1987-12-25 | 1989-07-05 | Shimadzu Corp | Sample introducing device for icp analyzer |
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