JPS58145549U - Torch for plasma emission analysis - Google Patents
Torch for plasma emission analysisInfo
- Publication number
- JPS58145549U JPS58145549U JP4347182U JP4347182U JPS58145549U JP S58145549 U JPS58145549 U JP S58145549U JP 4347182 U JP4347182 U JP 4347182U JP 4347182 U JP4347182 U JP 4347182U JP S58145549 U JPS58145549 U JP S58145549U
- Authority
- JP
- Japan
- Prior art keywords
- torch
- diameter portion
- tip
- plasma emission
- reduced
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は従来型トーチの要部断面図、第2図は本考案の
トーチの要部断面図、第3図は実験に用いた本考案のト
ーチの先端部を示す部分断面図、第4図は先端縮径部分
の長さと応答性との関係を示すグラフ、第5図は先端縮
径部分の内径と応答性との関係を示すグラフ、第6図は
肉厚と応答性との関係を示すグラフ、第7図は元素のイ
オン化電位と本考案のトーチの応答性との関係を示すグ
ラス、第8図は従来型トーチと本考案のトーチにおける
プラズマ炎中の励起位置及び応答性の関係を示すグラフ
である。
1・・・外管、2・・・内管、4・・・試料導入管、4
a・・・先端(絞り部)、4b・・・先端(縮径部)、
7・・・冷却ガス入口、8・・・プラズマガス入口、9
・・・試料供給口。Figure 1 is a sectional view of the main part of a conventional torch, Figure 2 is a sectional view of the main part of the torch of the present invention, Figure 3 is a partial sectional view of the tip of the torch of the present invention used in the experiment, and Figure 4 is a sectional view of the main part of the torch of the present invention used in the experiment. The figure is a graph showing the relationship between the length of the reduced diameter portion at the tip and responsiveness, Figure 5 is a graph showing the relationship between the inner diameter of the reduced diameter portion at the tip and responsiveness, and Figure 6 is the relationship between wall thickness and responsiveness. 7 is a graph showing the relationship between the ionization potential of an element and the responsivity of the torch of the present invention. Figure 8 is a graph showing the excitation position in the plasma flame and the responsivity of the conventional torch and the torch of the present invention. It is a graph showing a relationship. 1...Outer tube, 2...Inner tube, 4...Sample introduction tube, 4
a... Tip (diameter part), 4b... Tip (reduced diameter part),
7... Cooling gas inlet, 8... Plasma gas inlet, 9
...Sample supply port.
Claims (4)
り、内管の先端から出たアルゴンを高周波電磁誘導によ
りプラズマ化し、この中に試料導入管の先端から出た霧
化試料を送入して励起するようにしたプラズマ発光分析
用トーチにおいて、 前記試料導入管の先端から中間に向かって所定長さだけ
内径を縮小すると共に、この縮径部分の肉厚をその他の
部分より厚くしたことを特徴とするプラズマ発光分析用
トーチ。(1) Consisting of an outer tube, an inner tube, and a sample introduction tube passing through the inner tube, the argon emitted from the tip of the inner tube is turned into plasma by high-frequency electromagnetic induction, and the atomization from the tip of the sample introduction tube is made into plasma. In a torch for plasma emission spectrometry that is configured to introduce and excite a sample, the inner diameter is reduced by a predetermined length from the tip of the sample introduction tube toward the middle, and the wall thickness of this reduced diameter portion is reduced to the thickness of the other portions. A torch for plasma emission analysis that is characterized by being thicker.
、好ましくは約1.5〜2朋であることを特徴とする実
用新案登録請求の範囲第(1)項記載のトーチ。(2) The inner diameter of the reduced diameter portion is approximately 1.4 to 2.2 rtan
, preferably about 1.5 to 2.
しく約1.2〜L7mrnであることを特徴とする実用
新案登録請求の範囲第(2)項記載のトーチ。(3) The torch according to claim (2), wherein the reduced diameter portion has a wall thickness of approximately 1.1 to 1.8 mrn, preferably approximately 1.2 to 7 mrn.
新案登録請求の範囲第(2)項又は第(3)項記載のト
ーチ。・(4) The axial length of the reduced diameter portion is about 27 to 45M. The torch according to claim 2 or 3, characterized in that it preferably has a thickness of about 30 to 40.・
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4347182U JPS58145549U (en) | 1982-03-25 | 1982-03-25 | Torch for plasma emission analysis |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4347182U JPS58145549U (en) | 1982-03-25 | 1982-03-25 | Torch for plasma emission analysis |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58145549U true JPS58145549U (en) | 1983-09-30 |
JPS635002Y2 JPS635002Y2 (en) | 1988-02-10 |
Family
ID=30054558
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4347182U Granted JPS58145549U (en) | 1982-03-25 | 1982-03-25 | Torch for plasma emission analysis |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58145549U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04328450A (en) * | 1991-04-26 | 1992-11-17 | Yokogawa Electric Corp | Plasma generating spectrometer |
JP2014186026A (en) * | 2013-02-21 | 2014-10-02 | Ube Ind Ltd | Method for analyzing trace impurity, and plasma torch for use in the analysis |
-
1982
- 1982-03-25 JP JP4347182U patent/JPS58145549U/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04328450A (en) * | 1991-04-26 | 1992-11-17 | Yokogawa Electric Corp | Plasma generating spectrometer |
JP2014186026A (en) * | 2013-02-21 | 2014-10-02 | Ube Ind Ltd | Method for analyzing trace impurity, and plasma torch for use in the analysis |
Also Published As
Publication number | Publication date |
---|---|
JPS635002Y2 (en) | 1988-02-10 |
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