JPH0385561U - - Google Patents
Info
- Publication number
- JPH0385561U JPH0385561U JP14739489U JP14739489U JPH0385561U JP H0385561 U JPH0385561 U JP H0385561U JP 14739489 U JP14739489 U JP 14739489U JP 14739489 U JP14739489 U JP 14739489U JP H0385561 U JPH0385561 U JP H0385561U
- Authority
- JP
- Japan
- Prior art keywords
- tube
- plasma
- mist
- frequency
- analyzer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012488 sample solution Substances 0.000 claims description 3
- 239000007921 spray Substances 0.000 claims description 3
- 239000006199 nebulizer Substances 0.000 claims description 2
- 239000003595 mist Substances 0.000 claims 3
- 238000009616 inductively coupled plasma Methods 0.000 claims 2
- 238000005259 measurement Methods 0.000 claims 2
- 239000002245 particle Substances 0.000 claims 2
- 238000004458 analytical method Methods 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 235000013619 trace mineral Nutrition 0.000 claims 1
- 239000011573 trace mineral Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 1
Landscapes
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Electron Tubes For Measurement (AREA)
Description
第１図は本考案を説明する図、第２図は従来技
術を説明する図、第３図および第４図は従来技術
の問題点を説明する図、第５図は本考案の第二の
実施例を示す図である。
１……試料溶液、２……キヤピラリーチユーブ
、３……ネブライザー、４……キヤリアガス、５
……噴霧室、６……トーチ管、７……補助ガス、
８……プラズマガス、９……ワークコイル、１０
……プラズマ、１１……連通管、１２……ドレイ
ンタンク、１３……溶液、１４……液滴、１５…
…液滴、１６……抵抗体、１７……支持体、１８
……直通管。
Figure 1 is a diagram for explaining the present invention, Figure 2 is a diagram for explaining the prior art, Figures 3 and 4 are diagrams for explaining the problems of the prior art, and Figure 5 is a diagram for explaining the second aspect of the present invention. It is a figure showing an example. 1... Sample solution, 2... Capillary reach tube, 3... Nebulizer, 4... Carrier gas, 5
... spray chamber, 6 ... torch pipe, 7 ... auxiliary gas,
8...Plasma gas, 9...Work coil, 10
...Plasma, 11...Communication pipe, 12...Drain tank, 13...Solution, 14...Droplet, 15...
...Droplet, 16...Resistor, 17...Support, 18
...Direct pipe.
Claims (1)
、前記試料溶液を霧にするネブライザーと、前記
霧をプラズマ化させるトーチ管及びワークコイル
と、前記ワークコイルに高周波電流を印加する高
周波電源と、前記プラズマの発する光あるいはイ
オンを測定する測定系と、前記霧のうち一定の粒
径のものを前記トーチ管に送りかつ不必要な粒径
の霧を液化して廃棄する噴霧室と、前記噴霧室の
後にあつて前記プラズマ中に空気が混入すること
を防ぐ働きを持つ管で構成される高周波誘導結合
プラズマ分析装置において、前記管の中に前記管
中での溶液の流れに抵抗をつける抵抗体を入れる
ことによつて前記管を小型化しかつ測定の安定化
を計つたことを特徴とする高周波誘導結合プラズ
マ分析装置。 An analyzer for identifying trace elements in a sample solution, comprising a nebulizer that turns the sample solution into a mist, a torch tube and a work coil that turn the fog into plasma, and a high-frequency power supply that applies a high-frequency current to the work coil. a measurement system that measures light or ions emitted by the plasma; a spray chamber that sends a certain particle size of the mist to the torch tube and liquefies and discards the mist with an unnecessary particle size; and the spray In a high-frequency inductively coupled plasma analyzer comprising a tube located after the chamber and having the function of preventing air from entering the plasma, a resistor is provided in the tube to resist the flow of the solution in the tube. A high-frequency inductively coupled plasma analysis device, characterized in that the tube is made smaller and the measurement is stabilized by inserting a human body into the tube.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989147394U JP2522350Y2 (en) | 1989-12-20 | 1989-12-20 | High frequency inductively coupled plasma analyzer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989147394U JP2522350Y2 (en) | 1989-12-20 | 1989-12-20 | High frequency inductively coupled plasma analyzer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0385561U true JPH0385561U (en) | 1991-08-29 |
| JP2522350Y2 JP2522350Y2 (en) | 1997-01-16 |
Family
ID=31693909
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989147394U Expired - Lifetime JP2522350Y2 (en) | 1989-12-20 | 1989-12-20 | High frequency inductively coupled plasma analyzer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2522350Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006010415A (en) * | 2004-06-23 | 2006-01-12 | Horiba Ltd | Gas-liquid separation container and icp optical emission spectrometer |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5987655U (en) * | 1982-12-03 | 1984-06-13 | 松下電器産業株式会社 | Drain tube for high frequency inductively coupled plasma emission analyzer |
| JPH01170840A (en) * | 1987-12-25 | 1989-07-05 | Shimadzu Corp | Sample introducing device for icp analyzer |
-
1989
- 1989-12-20 JP JP1989147394U patent/JP2522350Y2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5987655U (en) * | 1982-12-03 | 1984-06-13 | 松下電器産業株式会社 | Drain tube for high frequency inductively coupled plasma emission analyzer |
| JPH01170840A (en) * | 1987-12-25 | 1989-07-05 | Shimadzu Corp | Sample introducing device for icp analyzer |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006010415A (en) * | 2004-06-23 | 2006-01-12 | Horiba Ltd | Gas-liquid separation container and icp optical emission spectrometer |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2522350Y2 (en) | 1997-01-16 |
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