JPS61195456U - - Google Patents
Info
- Publication number
- JPS61195456U JPS61195456U JP7921585U JP7921585U JPS61195456U JP S61195456 U JPS61195456 U JP S61195456U JP 7921585 U JP7921585 U JP 7921585U JP 7921585 U JP7921585 U JP 7921585U JP S61195456 U JPS61195456 U JP S61195456U
- Authority
- JP
- Japan
- Prior art keywords
- gas
- plasma
- torch tube
- argon gas
- control device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000006199 nebulizer Substances 0.000 claims description 2
- 239000007789 gas Substances 0.000 claims 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims 6
- 229910052786 argon Inorganic materials 0.000 claims 3
- 239000000112 cooling gas Substances 0.000 claims 1
- 238000002844 melting Methods 0.000 claims 1
- 230000008018 melting Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Description
第１図は本考案によるプラズマ発光分析装置の
概要の構成図である。
１…プラズマ、３…試料、４…ネブライザ、５
…トーチ管、６…チヤンバ、９…ガスボンベ、１
０，１１…調圧器、１２，１４，１７…ニードル
バルブ、１３，１５，１８…流量計、２０，２１
…切換弁、２２…抵抗体。
FIG. 1 is a schematic configuration diagram of a plasma emission spectrometer according to the present invention. 1... Plasma, 3... Sample, 4... Nebulizer, 5
...Torch tube, 6...Chamber, 9...Gas cylinder, 1
0,11...Pressure regulator, 12,14,17...Needle valve, 13,15,18...Flow meter, 20,21
...Switching valve, 22...Resistor.
Claims (1)
チ管表面がプラズマから発する熱によつて溶解し
ないことを目的とする冷却ガス、及び前記プラズ
マを安定に保持する目的の補助ガス、以上の３流
路のアルゴンガスを高周波誘導プラズマ光を発す
るトーチ管部に供給するシステムを有するプラズ
マ発光分析装置のガス制御装置において、アルゴ
ンガス供給源から前記トーチ管に達する流路中に
切換弁及び流量調整用抵抗体を配備することで、
アルゴンガス消費量を削減したことを特徴とした
プラズマ発光分析装置用ガス制御装置。 A nebulizer gas for the purpose of atomizing the sample, a cooling gas for the purpose of preventing the surface of the torch tube from melting due to the heat emitted from the plasma, and an auxiliary gas for the purpose of stably maintaining the plasma; In a gas control device for a plasma emission spectrometer having a system for supplying argon gas to a torch tube section that emits high-frequency induced plasma light, a switching valve and a flow rate adjustment resistor are installed in a flow path from an argon gas supply source to the torch tube. By deploying
A gas control device for plasma emission spectrometers characterized by reduced argon gas consumption.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7921585U JPS61195456U (en) | 1985-05-29 | 1985-05-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7921585U JPS61195456U (en) | 1985-05-29 | 1985-05-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61195456U true JPS61195456U (en) | 1986-12-05 |
Family
ID=30623918
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7921585U Pending JPS61195456U (en) | 1985-05-29 | 1985-05-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61195456U (en) |
-
1985
- 1985-05-29 JP JP7921585U patent/JPS61195456U/ja active Pending
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