JPS6250644A - Waste liquid tank for plasma emission analyzing instrument - Google Patents

Waste liquid tank for plasma emission analyzing instrument

Info

Publication number
JPS6250644A
JPS6250644A JP18961585A JP18961585A JPS6250644A JP S6250644 A JPS6250644 A JP S6250644A JP 18961585 A JP18961585 A JP 18961585A JP 18961585 A JP18961585 A JP 18961585A JP S6250644 A JPS6250644 A JP S6250644A
Authority
JP
Japan
Prior art keywords
waste liquid
liquid tank
plasma
plasma emission
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18961585A
Other languages
Japanese (ja)
Inventor
Noritoshi Seya
瀬谷 徳寿
Kazuo Moriya
森谷 一夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP18961585A priority Critical patent/JPS6250644A/en
Publication of JPS6250644A publication Critical patent/JPS6250644A/en
Pending legal-status Critical Current

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  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)

Abstract

PURPOSE:To make analysis with high reproducibility by providing a penetration pipe bundled with plural capillaries to a discharge port of a waste liquid tank, thereby discharging the waste liquid without stagnation and stabilizing the emission intensity of plasma. CONSTITUTION:The penetration pipe 16 bundled with the plural fine capillaries is inserted near the discharge port 24 of the waste liquid tank 7 of a plasma emission analyzing instrument. Since the top end of the pipe 16 is always in contact with the surface of the waste liquid 7, the waste liquid is penetrated into the pipe 16 by the capillarity so as to flow smoothly in the port 24 without stagnation. As a result, the emission intensity of plasma is stabilized and the analysis is made with the high reproducibility.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明はプラズマ発光分析装置の試料導入系に関する。[Detailed description of the invention] [Field of application of the invention] The present invention relates to a sample introduction system for a plasma emission spectrometer.

第1図はプラズマ発光分析装置の試料導入系の構成図で
ある。
FIG. 1 is a block diagram of a sample introduction system of a plasma emission spectrometer.

〔発明の背景〕[Background of the invention]

第1図中央のチャンバ1上面にトーチ2、側面に保持体
4及び霧化器5を配備し、トーチ2とチャンバ1は接合
面で洩れないよう接触しクランプ3によって締結されさ
らにチャンバ1と保持体4は0リング7によってチャン
バ1の内部気体が外部に洩れないようにシールされてい
る。
A torch 2 is provided on the upper surface of the chamber 1 in the center of FIG. 1, and a holder 4 and an atomizer 5 are provided on the side.The torch 2 and the chamber 1 are in contact with each other at the joint surface to prevent leakage, and are fastened by a clamp 3, which further holds the chamber 1. The body 4 is sealed by an O-ring 7 to prevent the internal gas of the chamber 1 from leaking to the outside.

同様に保持体4と霧化器5は0リング8によって気密が
保持される。
Similarly, the holder 4 and the atomizer 5 are kept airtight by the O-ring 8.

第1図に於いて霧化器5に装備したガス供給口18に0
.3〜0.81/winの流量のアルゴンガスを供給す
ると試料容器10内部の試料11は試料導入管12を通
して霧化器5の内部に吸引され保持体4のほぼ中央で霧
状になる。
In Fig. 1, the gas supply port 18 installed in the atomizer 5 is
.. When argon gas is supplied at a flow rate of 3 to 0.81/win, the sample 11 inside the sample container 10 is sucked into the atomizer 5 through the sample introduction tube 12 and becomes atomized approximately at the center of the holder 4.

霧化した試料は図中矢印に示すようにチャンバ1の内部
を経てトーチ2の上面に達しそれ以外の霧はジャンパ1
の内壁もしくはチャンバ1の内管21の内外壁に付着し
チャンバ1左端の廃液孔13から排出しチューブ6の内
壁を伝わって廃液槽7に達する。
The atomized sample passes through the inside of the chamber 1 and reaches the upper surface of the torch 2 as shown by the arrow in the figure, and the remaining mist is transferred to the jumper 1.
or the inner and outer walls of the inner tube 21 of the chamber 1, and is discharged from the waste liquid hole 13 at the left end of the chamber 1, travels along the inner wall of the tube 6, and reaches the waste liquid tank 7.

一方トーチ2は通常石英管の三重構造になっており、冷
却ガス供給孔19から10〜20Q/win、補助ガス
供給孔20から0.3〜0.8fi/winのアルゴン
ガスを供給し、誘導コイル14に高周波電力(例えば周
波数27.12MHz 、電力2KW)を印加すること
により、プラズマ炎15が形成され、前記の雪化試料を
プラズマの高温度により発光する。
On the other hand, the torch 2 usually has a triple structure of quartz tubes, and supplies argon gas of 10 to 20 Q/win from the cooling gas supply hole 19 and 0.3 to 0.8 fi/win from the auxiliary gas supply hole 20, and By applying high frequency power (for example, frequency 27.12 MHz, power 2 KW) to the coil 14, a plasma flame 15 is formed, and the snow-formed sample emits light due to the high temperature of the plasma.

本装置ではチャンバ1及びトーチ2の内圧が外気の影響
を受けないようにするため、チャンバ1の後方に廃液槽
7をチューブ6で接続し、常時廃液を溜めるようにして
いる。
In this apparatus, in order to prevent the internal pressures of the chamber 1 and the torch 2 from being affected by the outside air, a waste liquid tank 7 is connected to the rear of the chamber 1 through a tube 6, so that waste liquid is always stored therein.

チャンバ1内の廃液13は廃液槽7の排出口24の下面
の高さで常時停滞しておりそれ以上の廃液が溜った時、
排出口24の先端からオーバーフローしてチューブ22
内部へ流れボルト23に溜まる。
The waste liquid 13 in the chamber 1 is always stagnant at the level of the lower surface of the outlet 24 of the waste liquid tank 7, and when more waste liquid accumulates,
It overflows from the tip of the outlet 24 and flows into the tube 22.
It flows inside and accumulates in the bolt 23.

第2図に於いて廃液槽7にたまった廃液がオーバーフロ
ーをし排出口24より流出する際に廃液槽7の表面張力
により液面が排出口24の出口で停滞し廃液が流出しな
いことがしばしば起こる6つまり排出口24からの流れ
が不定時になりその影響でチャンバ1の内圧が変動して
しまいそのためトーチ2の上部に形成されているプラズ
マ炎15の発光強度を変動させ、データの再現性が悪く
なる。
In Fig. 2, when the waste liquid accumulated in the waste liquid tank 7 overflows and flows out from the outlet 24, the surface tension of the waste liquid tank 7 often causes the liquid level to stagnate at the outlet of the outlet 24 and the waste liquid does not flow out. 6, that is, the flow from the exhaust port 24 becomes irregular, which causes the internal pressure of the chamber 1 to fluctuate, which causes the emission intensity of the plasma flame 15 formed at the top of the torch 2 to fluctuate, and the reproducibility of the data to deteriorate. Deteriorate.

これは近年需要の多い半導体素子の分析用にフッ酸試料
を使った場合、チャンバ1及び廃液槽7をフッ化エチレ
ン樹脂で作ることがあるが、この場合に廃液槽7の表面
張力がさらに大きいため排出口24の出口で廃液がなか
なか流れず停滞状態が長く続き、ある程度廃液17が溜
まった時急激にチューブ22に落下しチャンバ1及びト
ーチ42の内圧を変動させてしまう。
This is because when hydrofluoric acid samples are used for analysis of semiconductor devices, which has been in high demand in recent years, chamber 1 and waste liquid tank 7 are sometimes made of fluoroethylene resin, but in this case, the surface tension of waste liquid tank 7 is even higher. Therefore, the waste liquid does not flow easily at the outlet of the discharge port 24 and remains stagnant for a long time, and when the waste liquid 17 accumulates to a certain extent, it suddenly falls into the tube 22, causing fluctuations in the internal pressure of the chamber 1 and the torch 42.

〔発明の目的〕[Purpose of the invention]

本発明の目的は廃液槽よりあふれる余剰液を廃液槽の内
壁の表面張力により停滞することなく滑らかに流出させ
ることにより再現性の高いデータが得られるプラズマ発
光分析装置を提供することにある。
An object of the present invention is to provide a plasma emission spectrometer capable of obtaining data with high reproducibility by allowing excess liquid overflowing from a waste liquid tank to flow out smoothly without being stagnated due to the surface tension of the inner wall of the waste liquid tank.

〔発明の実施例〕[Embodiments of the invention]

第3図が本発明の詳細な説明図である。 FIG. 3 is a detailed explanatory diagram of the present invention.

廃液槽7の排出口26の近くには、複数の細い毛細管を
兼ねた浸透管16を挿入させている。
Near the discharge port 26 of the waste liquid tank 7, a plurality of infiltration tubes 16 which also serve as thin capillary tubes are inserted.

浸透管16の先端は廃液17の表面と常に接触している
ので廃液が毛細管現象で浸透管16の内部に浸透し、排
出口24の内部で停滞することなく滑らかに流れる。
Since the tip of the permeation tube 16 is always in contact with the surface of the waste liquid 17, the waste liquid permeates into the inside of the permeation tube 16 by capillary action and flows smoothly inside the discharge port 24 without stagnation.

第4図が従来の測定データ、第5図が本発明の廃液槽で
測定したデータである。
FIG. 4 shows conventional measurement data, and FIG. 5 shows data measured using the waste liquid tank of the present invention.

元素In(インジウム)の溶液(10ppm) 。A solution of the element In (indium) (10 ppm).

波長230.60 n mで波長固定して発光量の連続
信号を記録したもので、縦軸に発光強度、横軸に時間(
単位秒)をとった場合である。
A continuous signal of luminescence amount is recorded with the wavelength fixed at 230.60 nm. The vertical axis shows the luminescence intensity and the horizontal axis shows time (
This is the case when the unit is seconds).

〔発明の効果〕〔Effect of the invention〕

従来技術では約15〜30秒間隔でノイズ発生している
In the prior art, noise occurs at intervals of about 15 to 30 seconds.

これは廃液槽よりあふれ出た廃液が断続的に流出するた
めチャンバ内の圧力が変動しその結果プラズマ炎がゆら
ぎデータの再現性を低下させているためである。
This is because the waste liquid overflowing from the waste liquid tank intermittently flows out, causing the pressure inside the chamber to fluctuate, resulting in fluctuations in the plasma flame and reducing the reproducibility of the data.

本発明を採用した結果が第5図で従来技術のデータと比
較して発光強度が安定していることがわかる。
The result of employing the present invention is shown in FIG. 5, and it can be seen that the luminescence intensity is stable compared to the data of the prior art.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来技術で構成されたプラズマ発光分析装置の
試料導入部の構成図、第2図が従来技術の廃液槽の断面
図、第3図は本発明の廃液槽の詳細説明図、第4図は従
来技術の測定結果データを示す図、第5図が本発明の廃
液槽を採用した場合の測定データを示す図である。 1・・・チャンバ、2・・・トーチ、3・・・クランプ
、4・・・ホルダー、5・・・ネブライザー、6・・・
チューブ、7・・・廃液槽、8・・・0リング、9・・
・Oリング、10・・・試料、11・・・試験管、12
・・・チューブ、13゜17・・・廃液、14・・・コ
イル、15・・・プラズマ炎。 16・・・浸透管、18・・・アルゴンガス供給口、1
9・・・冷却用アルゴンガス入口、20・・・補助ガス
入口、21・・・内管、22・・・チューブ、23・・
・ボトル、第 1の めz−r!3 、洋 昏J!l
Fig. 1 is a configuration diagram of the sample introduction section of a plasma emission spectrometer configured according to the prior art, Fig. 2 is a sectional view of the waste liquid tank of the prior art, and Fig. 3 is a detailed explanatory diagram of the waste liquid tank of the present invention. FIG. 4 is a diagram showing measurement result data of the prior art, and FIG. 5 is a diagram showing measurement data when the waste liquid tank of the present invention is adopted. 1... Chamber, 2... Torch, 3... Clamp, 4... Holder, 5... Nebulizer, 6...
Tube, 7...waste tank, 8...0 ring, 9...
・O-ring, 10...sample, 11...test tube, 12
...Tube, 13°17...Waste liquid, 14...Coil, 15...Plasma flame. 16... Penetration tube, 18... Argon gas supply port, 1
9... Argon gas inlet for cooling, 20... Auxiliary gas inlet, 21... Inner pipe, 22... Tube, 23...
・Bottle, the first mez-r! 3. Yoko J! l

Claims (1)

【特許請求の範囲】[Claims] 1、高周波誘導プラズマ光を発するトーチ部、試料を霧
化する目的の霧化器及び前記トーチ部と霧化器との間の
試料導入路中に配備されたチャンバ、及びチャンバから
排出する廃液を蓄える目的の廃液槽らを有するプラズマ
発光分析装置に於いて、前記廃液槽の排出口に複数の毛
細管を束ねた浸透管を設けることにより廃液が前記廃液
槽の排出口に停滞することなく円滑に流れることを特徴
としたプラズマ発光分析装置用廃液槽。
1. A torch section that emits high-frequency induced plasma light, an atomizer for the purpose of atomizing the sample, a chamber provided in the sample introduction path between the torch section and the atomizer, and a waste liquid discharged from the chamber. In a plasma emission spectrometer having a waste liquid tank for storage, a permeation tube made of a plurality of capillary tubes is provided at the outlet of the waste liquid tank so that the waste liquid does not stagnate at the outlet of the waste liquid tank. A waste liquid tank for plasma emission spectrometers that is characterized by its flowing properties.
JP18961585A 1985-08-30 1985-08-30 Waste liquid tank for plasma emission analyzing instrument Pending JPS6250644A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18961585A JPS6250644A (en) 1985-08-30 1985-08-30 Waste liquid tank for plasma emission analyzing instrument

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18961585A JPS6250644A (en) 1985-08-30 1985-08-30 Waste liquid tank for plasma emission analyzing instrument

Publications (1)

Publication Number Publication Date
JPS6250644A true JPS6250644A (en) 1987-03-05

Family

ID=16244265

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18961585A Pending JPS6250644A (en) 1985-08-30 1985-08-30 Waste liquid tank for plasma emission analyzing instrument

Country Status (1)

Country Link
JP (1) JPS6250644A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0385559U (en) * 1989-12-20 1991-08-29
JPH0385560U (en) * 1989-12-20 1991-08-29
JP2005017250A (en) * 2003-06-30 2005-01-20 Horiba Ltd Icp analysis method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0385559U (en) * 1989-12-20 1991-08-29
JPH0385560U (en) * 1989-12-20 1991-08-29
JP2005017250A (en) * 2003-06-30 2005-01-20 Horiba Ltd Icp analysis method

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