JPH037936Y2 - - Google Patents
Info
- Publication number
- JPH037936Y2 JPH037936Y2 JP1067484U JP1067484U JPH037936Y2 JP H037936 Y2 JPH037936 Y2 JP H037936Y2 JP 1067484 U JP1067484 U JP 1067484U JP 1067484 U JP1067484 U JP 1067484U JP H037936 Y2 JPH037936 Y2 JP H037936Y2
- Authority
- JP
- Japan
- Prior art keywords
- ion
- base material
- iron nitride
- irradiation device
- ions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000002500 ions Chemical class 0.000 claims description 27
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 17
- 229910001337 iron nitride Inorganic materials 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 14
- 238000005468 ion implantation Methods 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 8
- 238000001659 ion-beam spectroscopy Methods 0.000 claims description 6
- 238000004544 sputter deposition Methods 0.000 claims description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims 2
- -1 nitrogen ions Chemical class 0.000 claims 2
- 230000005415 magnetization Effects 0.000 description 8
- 238000002513 implantation Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000006249 magnetic particle Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000002294 plasma sputter deposition Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1067484U JPS60124004U (ja) | 1984-01-27 | 1984-01-27 | 窒化鉄垂直磁化膜形成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1067484U JPS60124004U (ja) | 1984-01-27 | 1984-01-27 | 窒化鉄垂直磁化膜形成装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60124004U JPS60124004U (ja) | 1985-08-21 |
| JPH037936Y2 true JPH037936Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-02-27 |
Family
ID=30492075
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1067484U Granted JPS60124004U (ja) | 1984-01-27 | 1984-01-27 | 窒化鉄垂直磁化膜形成装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60124004U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
-
1984
- 1984-01-27 JP JP1067484U patent/JPS60124004U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60124004U (ja) | 1985-08-21 |