JPH0378739B2 - - Google Patents

Info

Publication number
JPH0378739B2
JPH0378739B2 JP14788683A JP14788683A JPH0378739B2 JP H0378739 B2 JPH0378739 B2 JP H0378739B2 JP 14788683 A JP14788683 A JP 14788683A JP 14788683 A JP14788683 A JP 14788683A JP H0378739 B2 JPH0378739 B2 JP H0378739B2
Authority
JP
Japan
Prior art keywords
filter
ion beam
ion
focusing
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14788683A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6039748A (ja
Inventor
Etsuo Ban
Masahiko Okunuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP14788683A priority Critical patent/JPS6039748A/ja
Publication of JPS6039748A publication Critical patent/JPS6039748A/ja
Publication of JPH0378739B2 publication Critical patent/JPH0378739B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP14788683A 1983-08-12 1983-08-12 イオンビ−ム集束装置 Granted JPS6039748A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14788683A JPS6039748A (ja) 1983-08-12 1983-08-12 イオンビ−ム集束装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14788683A JPS6039748A (ja) 1983-08-12 1983-08-12 イオンビ−ム集束装置

Publications (2)

Publication Number Publication Date
JPS6039748A JPS6039748A (ja) 1985-03-01
JPH0378739B2 true JPH0378739B2 (nl) 1991-12-16

Family

ID=15440417

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14788683A Granted JPS6039748A (ja) 1983-08-12 1983-08-12 イオンビ−ム集束装置

Country Status (1)

Country Link
JP (1) JPS6039748A (nl)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3621184A1 (de) * 1986-06-25 1988-01-07 Glyco Metall Werke Schichtwerkstoff sowie verfahren zu seiner herstellung durch vakuum-plasma-spritzen
JP2700002B2 (ja) * 1986-09-05 1998-01-19 株式会社日立製作所 荷電粒子光学系
JPS63218139A (ja) * 1987-03-06 1988-09-12 Jeol Ltd イオンビ−ム装置
JPS63218134A (ja) * 1987-03-06 1988-09-12 Jeol Ltd イオンビ−ム装置
JPH0218853A (ja) * 1988-07-06 1990-01-23 Jeol Ltd イオンビーム装置
DE10122957B4 (de) 2001-05-11 2005-06-02 Akt Electron Beam Technology Gmbh Teilchenstrahlapparat mit energiekorrigierter Strahlablenkung sowie Vorrichtungund Verfahren zur energiekorrigierten Ablenkung eines Teilchenstrahls
US6717141B1 (en) * 2001-11-27 2004-04-06 Schlumberger Technologies, Inc. Reduction of aberrations produced by Wien filter in a scanning electron microscope and the like
US7256606B2 (en) 2004-08-03 2007-08-14 Applied Materials, Inc. Method for testing pixels for LCD TFT displays
JP6253375B2 (ja) 2013-12-02 2017-12-27 住友重機械イオンテクノロジー株式会社 イオン注入装置

Also Published As

Publication number Publication date
JPS6039748A (ja) 1985-03-01

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