JPH0377989B2 - - Google Patents

Info

Publication number
JPH0377989B2
JPH0377989B2 JP58178086A JP17808683A JPH0377989B2 JP H0377989 B2 JPH0377989 B2 JP H0377989B2 JP 58178086 A JP58178086 A JP 58178086A JP 17808683 A JP17808683 A JP 17808683A JP H0377989 B2 JPH0377989 B2 JP H0377989B2
Authority
JP
Japan
Prior art keywords
copolymer
pmma
sensitivity
plasma resistance
methylstyrene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58178086A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6070442A (ja
Inventor
Seiji Akimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58178086A priority Critical patent/JPS6070442A/ja
Publication of JPS6070442A publication Critical patent/JPS6070442A/ja
Publication of JPH0377989B2 publication Critical patent/JPH0377989B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP58178086A 1983-09-28 1983-09-28 パタ−ン形成方法 Granted JPS6070442A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58178086A JPS6070442A (ja) 1983-09-28 1983-09-28 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58178086A JPS6070442A (ja) 1983-09-28 1983-09-28 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS6070442A JPS6070442A (ja) 1985-04-22
JPH0377989B2 true JPH0377989B2 (enrdf_load_html_response) 1991-12-12

Family

ID=16042378

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58178086A Granted JPS6070442A (ja) 1983-09-28 1983-09-28 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS6070442A (enrdf_load_html_response)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4617085A (en) * 1985-09-03 1986-10-14 General Electric Company Process for removing organic material in a patterned manner from an organic film
JP2645561B2 (ja) * 1987-12-19 1997-08-25 富士通株式会社 レジスト材料
JP2023179310A (ja) * 2022-06-07 2023-12-19 栗田工業株式会社 解重合性共重合ポリマー
JP2025090960A (ja) * 2023-12-06 2025-06-18 栗田工業株式会社 解重合性共重合ポリマー

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52128132A (en) * 1976-04-20 1977-10-27 Fujitsu Ltd Positive type electron beam sensitive composition
NL8101200A (nl) * 1981-03-12 1982-10-01 Philips Nv Werkwijze voor het aanbrengen van een resistmateriaal op een drager en resist-materiaal.
JPS5848046A (ja) * 1981-09-17 1983-03-19 Matsushita Electric Ind Co Ltd 遠紫外線露光用レジスト材料
JPS5879062A (ja) * 1981-11-05 1983-05-12 Dainippon Printing Co Ltd 電子線硬化型コ−テイング剤
JPS58116532A (ja) * 1981-12-29 1983-07-11 Fujitsu Ltd パタ−ン形成方法

Also Published As

Publication number Publication date
JPS6070442A (ja) 1985-04-22

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