JPH0377278B2 - - Google Patents
Info
- Publication number
- JPH0377278B2 JPH0377278B2 JP26943686A JP26943686A JPH0377278B2 JP H0377278 B2 JPH0377278 B2 JP H0377278B2 JP 26943686 A JP26943686 A JP 26943686A JP 26943686 A JP26943686 A JP 26943686A JP H0377278 B2 JPH0377278 B2 JP H0377278B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- etching
- chromium
- film
- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005530 etching Methods 0.000 claims description 61
- 239000000758 substrate Substances 0.000 claims description 57
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 33
- 239000011651 chromium Substances 0.000 claims description 27
- 229910052804 chromium Inorganic materials 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 18
- 239000002184 metal Substances 0.000 claims description 18
- 239000011248 coating agent Substances 0.000 claims description 17
- 238000000576 coating method Methods 0.000 claims description 17
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 15
- 229910052802 copper Inorganic materials 0.000 claims description 15
- 239000010949 copper Substances 0.000 claims description 15
- 238000005096 rolling process Methods 0.000 claims description 15
- 229920002120 photoresistant polymer Polymers 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 4
- 238000011161 development Methods 0.000 claims description 4
- 239000010408 film Substances 0.000 description 16
- 230000003197 catalytic effect Effects 0.000 description 11
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 238000012545 processing Methods 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 229910052742 iron Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/26—Acidic compositions for etching refractory metals
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26943686A JPS63121678A (ja) | 1986-11-11 | 1986-11-11 | クロム被膜のエツチング方法及びエツチング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26943686A JPS63121678A (ja) | 1986-11-11 | 1986-11-11 | クロム被膜のエツチング方法及びエツチング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63121678A JPS63121678A (ja) | 1988-05-25 |
| JPH0377278B2 true JPH0377278B2 (zh) | 1991-12-10 |
Family
ID=17472407
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26943686A Granted JPS63121678A (ja) | 1986-11-11 | 1986-11-11 | クロム被膜のエツチング方法及びエツチング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63121678A (zh) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6022485A (en) | 1997-10-17 | 2000-02-08 | International Business Machines Corporation | Method for controlled removal of material from a solid surface |
| JP4071220B2 (ja) | 2004-03-17 | 2008-04-02 | 西山ステンレスケミカル株式会社 | ガラス基板の製造方法 |
| JP5165354B2 (ja) * | 2007-12-12 | 2013-03-21 | 新光電気工業株式会社 | スプレー処理用搬送装置 |
| JP5324342B2 (ja) * | 2009-06-30 | 2013-10-23 | アルバック成膜株式会社 | ウェットエッチング方法 |
| WO2012111602A1 (ja) * | 2011-02-17 | 2012-08-23 | シャープ株式会社 | ウエットエッチング装置およびウエットエッチング方法 |
| CN103858219A (zh) * | 2011-08-12 | 2014-06-11 | 小林光 | 半导体器件的制造方法、半导体器件的制造装置、半导体器件、半导体器件的制造程序、半导体用处理剂以及转印用部件 |
-
1986
- 1986-11-11 JP JP26943686A patent/JPS63121678A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63121678A (ja) | 1988-05-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8366946B2 (en) | Frame for holding laminate during processing | |
| RU2440444C2 (ru) | Устройство и способ для электрического контактирования плоского изделия в установках непрерывного действия | |
| JP3175908B2 (ja) | 液処理装置の基板搬送装置 | |
| US4922938A (en) | Apparatus for single side spray processing of printed circuit boards | |
| JPH0377278B2 (zh) | ||
| JP4022288B2 (ja) | 基板処理装置 | |
| JP2006013156A (ja) | 基板処理装置及び基板処理方法並びにパターン形成方法 | |
| JP4593461B2 (ja) | 基板搬送システム | |
| JP4079579B2 (ja) | ウェット処理装置 | |
| JP2000200958A (ja) | プリント配線板の反転装置及びプリント配線板の反転方法 | |
| JPH0710309A (ja) | 金属薄板エッチング装置 | |
| CN220641282U (zh) | 一种用于传送基板的滚轮传送装置 | |
| JP4156787B2 (ja) | 金属板洗浄装置、金属板洗浄方法及び金属板処理方法 | |
| JPH1110096A (ja) | 基板処理装置 | |
| JP2000031111A (ja) | ウェットエッチング方法 | |
| JP3934286B2 (ja) | 基板搬送装置および基板処理装置 | |
| JP2014082407A (ja) | ウェットエッチング装置およびウェットエッチング方法 | |
| JPS6333599A (ja) | 短冊状薄板のメツキ装置 | |
| TW201018630A (en) | Method for transporting thin substrates for wet chemistry treatment using roller pairs | |
| JPH01180999A (ja) | 短冊状ワークの電解処理装置 | |
| KR100964126B1 (ko) | 박판처리장치 및 방법 | |
| JPH0516213Y2 (zh) | ||
| JP2000053247A (ja) | 基板搬送装置 | |
| JPH10130868A (ja) | 金属薄板のエッチングにおける面出し方法 | |
| KR100318926B1 (ko) | 리드프레임 건조장비의 자재 이송장치 |