JPH0365906B2 - - Google Patents

Info

Publication number
JPH0365906B2
JPH0365906B2 JP60104336A JP10433685A JPH0365906B2 JP H0365906 B2 JPH0365906 B2 JP H0365906B2 JP 60104336 A JP60104336 A JP 60104336A JP 10433685 A JP10433685 A JP 10433685A JP H0365906 B2 JPH0365906 B2 JP H0365906B2
Authority
JP
Japan
Prior art keywords
film
silicon nitride
solar cell
nitride film
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60104336A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61260682A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP60104336A priority Critical patent/JPS61260682A/ja
Publication of JPS61260682A publication Critical patent/JPS61260682A/ja
Publication of JPH0365906B2 publication Critical patent/JPH0365906B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/14Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
    • H10F77/147Shapes of bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/16Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/169Thin semiconductor films on metallic or insulating substrates
    • H10F77/1692Thin semiconductor films on metallic or insulating substrates the films including only Group IV materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Photovoltaic Devices (AREA)
JP60104336A 1985-05-14 1985-05-14 太陽電池とその製造方法 Granted JPS61260682A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60104336A JPS61260682A (ja) 1985-05-14 1985-05-14 太陽電池とその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60104336A JPS61260682A (ja) 1985-05-14 1985-05-14 太陽電池とその製造方法

Publications (2)

Publication Number Publication Date
JPS61260682A JPS61260682A (ja) 1986-11-18
JPH0365906B2 true JPH0365906B2 (enExample) 1991-10-15

Family

ID=14378087

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60104336A Granted JPS61260682A (ja) 1985-05-14 1985-05-14 太陽電池とその製造方法

Country Status (1)

Country Link
JP (1) JPS61260682A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005027229A1 (ja) * 2003-08-29 2005-03-24 Asahi Glass Company, Limited 透明導電膜付き基体およびその製造方法
JP2014165354A (ja) * 2013-02-26 2014-09-08 Panasonic Corp 多孔質シリコンの作製方法

Also Published As

Publication number Publication date
JPS61260682A (ja) 1986-11-18

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