JPH036497B2 - - Google Patents

Info

Publication number
JPH036497B2
JPH036497B2 JP60198479A JP19847985A JPH036497B2 JP H036497 B2 JPH036497 B2 JP H036497B2 JP 60198479 A JP60198479 A JP 60198479A JP 19847985 A JP19847985 A JP 19847985A JP H036497 B2 JPH036497 B2 JP H036497B2
Authority
JP
Japan
Prior art keywords
ionizing radiation
substrate
polymer
sensitive polymer
submicron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60198479A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6259951A (ja
Inventor
Kyoshi Oguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP60198479A priority Critical patent/JPS6259951A/ja
Publication of JPS6259951A publication Critical patent/JPS6259951A/ja
Publication of JPH036497B2 publication Critical patent/JPH036497B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60198479A 1985-09-10 1985-09-10 サブミクロンパタ−ン形成方法 Granted JPS6259951A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60198479A JPS6259951A (ja) 1985-09-10 1985-09-10 サブミクロンパタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60198479A JPS6259951A (ja) 1985-09-10 1985-09-10 サブミクロンパタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS6259951A JPS6259951A (ja) 1987-03-16
JPH036497B2 true JPH036497B2 (Sortimente) 1991-01-30

Family

ID=16391793

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60198479A Granted JPS6259951A (ja) 1985-09-10 1985-09-10 サブミクロンパタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS6259951A (Sortimente)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62217615A (ja) * 1986-03-19 1987-09-25 Fujitsu Ltd 半導体素子の製造方法

Also Published As

Publication number Publication date
JPS6259951A (ja) 1987-03-16

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