JPH036494B2 - - Google Patents

Info

Publication number
JPH036494B2
JPH036494B2 JP60121635A JP12163585A JPH036494B2 JP H036494 B2 JPH036494 B2 JP H036494B2 JP 60121635 A JP60121635 A JP 60121635A JP 12163585 A JP12163585 A JP 12163585A JP H036494 B2 JPH036494 B2 JP H036494B2
Authority
JP
Japan
Prior art keywords
solution
ether
propanediol
solvent
solution according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60121635A
Other languages
English (en)
Japanese (ja)
Other versions
JPS616648A (ja
Inventor
Rutsukeruto Hansu
Oorenmatsuhaa Rarufu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of JPS616648A publication Critical patent/JPS616648A/ja
Publication of JPH036494B2 publication Critical patent/JPH036494B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP12163585A 1984-06-07 1985-06-06 ポジ作用を有する放射線感受性塗布溶液 Granted JPS616648A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE3421160.8 1984-06-07
DE19843421160 DE3421160A1 (de) 1984-06-07 1984-06-07 Positiv arbeitende strahlungsempfindliche beschichtungsloesung
DE3510220.9 1985-03-21

Publications (2)

Publication Number Publication Date
JPS616648A JPS616648A (ja) 1986-01-13
JPH036494B2 true JPH036494B2 (enrdf_load_html_response) 1991-01-30

Family

ID=6237797

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12163585A Granted JPS616648A (ja) 1984-06-07 1985-06-06 ポジ作用を有する放射線感受性塗布溶液

Country Status (2)

Country Link
JP (1) JPS616648A (enrdf_load_html_response)
DE (1) DE3421160A1 (enrdf_load_html_response)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3510220A1 (de) * 1985-03-21 1986-09-25 Hoechst Ag, 6230 Frankfurt Positiv arbeitende strahlungsempfindliche beschichtungsloesung
JPH0766183B2 (ja) * 1985-05-15 1995-07-19 三菱化学株式会社 ポジ型フオトレジスト組成物
JPH0650392B2 (ja) * 1985-07-12 1994-06-29 富士写真フイルム株式会社 感光性平版印刷版の製造方法
JPS62123444A (ja) 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPS6238471A (ja) * 1985-08-14 1987-02-19 Fuji Photo Film Co Ltd 感光性平版印刷版の製造方法
DE3674141D1 (de) * 1985-10-28 1990-10-18 Hoechst Celanese Corp Strahlungsempfindliches, positiv-arbeitendes gemisch und hieraus hergestelltes photoresistmaterial.
JPS62194249A (ja) * 1986-02-20 1987-08-26 Fuji Photo Film Co Ltd ポジ型感光性組成物
JPH0196646A (ja) * 1987-10-09 1989-04-14 Hitachi Ltd フオトレジスト組成物
JP4217980B2 (ja) 2004-10-26 2009-02-04 株式会社デンソー バタフライ弁装置及びその製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3023201A1 (de) * 1980-06-21 1982-01-07 Hoechst Ag, 6000 Frankfurt Positiv arbeitendes strahlungsempfindliches gemisch
ATE68272T1 (de) * 1984-06-01 1991-10-15 Rohm & Haas Lichtempfindliche beschichtungszusammensetzung, aus diesem hergestellte thermisch stabile beschichtungen und verfahren zur herstellung von thermisch stabilen polymerbildern.

Also Published As

Publication number Publication date
DE3421160A1 (de) 1985-12-12
JPS616648A (ja) 1986-01-13

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees