JPH0364861B2 - - Google Patents

Info

Publication number
JPH0364861B2
JPH0364861B2 JP57098090A JP9809082A JPH0364861B2 JP H0364861 B2 JPH0364861 B2 JP H0364861B2 JP 57098090 A JP57098090 A JP 57098090A JP 9809082 A JP9809082 A JP 9809082A JP H0364861 B2 JPH0364861 B2 JP H0364861B2
Authority
JP
Japan
Prior art keywords
resist
film
alkyl group
lower alkyl
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57098090A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58214148A (ja
Inventor
Shigeyoshi Suzuki
Kazuhide Saigo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP57098090A priority Critical patent/JPS58214148A/ja
Priority to US06/501,201 priority patent/US4551417A/en
Priority to CA000429834A priority patent/CA1207216A/en
Priority to IE1339/83A priority patent/IE54731B1/en
Priority to EP83303324A priority patent/EP0096596B2/en
Priority to DE8383303324T priority patent/DE3363914D1/de
Publication of JPS58214148A publication Critical patent/JPS58214148A/ja
Publication of JPH0364861B2 publication Critical patent/JPH0364861B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • H10P50/73—

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • ing And Chemical Polishing (AREA)
JP57098090A 1982-06-08 1982-06-08 レジスト材料および微細パタ−ン形成方法 Granted JPS58214148A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP57098090A JPS58214148A (ja) 1982-06-08 1982-06-08 レジスト材料および微細パタ−ン形成方法
US06/501,201 US4551417A (en) 1982-06-08 1983-06-06 Method of forming patterns in manufacturing microelectronic devices
CA000429834A CA1207216A (en) 1982-06-08 1983-06-07 Method of forming patterns in manufacturing microelectronic devices
IE1339/83A IE54731B1 (en) 1982-06-08 1983-06-07 Microelectronic device manufacture
EP83303324A EP0096596B2 (en) 1982-06-08 1983-06-08 Microelectronic device manufacture
DE8383303324T DE3363914D1 (en) 1982-06-08 1983-06-08 Microelectronic device manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57098090A JPS58214148A (ja) 1982-06-08 1982-06-08 レジスト材料および微細パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS58214148A JPS58214148A (ja) 1983-12-13
JPH0364861B2 true JPH0364861B2 (enExample) 1991-10-08

Family

ID=14210639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57098090A Granted JPS58214148A (ja) 1982-06-08 1982-06-08 レジスト材料および微細パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS58214148A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020175228A (ja) * 2020-07-30 2020-10-29 株式会社大一商会 遊技機
JP2020179253A (ja) * 2020-07-30 2020-11-05 株式会社大一商会 遊技機
JP2021010747A (ja) * 2020-10-01 2021-02-04 株式会社大一商会 遊技機
JP2021010748A (ja) * 2020-10-01 2021-02-04 株式会社大一商会 遊技機
JP2021010749A (ja) * 2020-10-01 2021-02-04 株式会社大一商会 遊技機
JP2021010750A (ja) * 2020-10-01 2021-02-04 株式会社大一商会 遊技機

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4481049A (en) * 1984-03-02 1984-11-06 At&T Bell Laboratories Bilevel resist

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020175228A (ja) * 2020-07-30 2020-10-29 株式会社大一商会 遊技機
JP2020179253A (ja) * 2020-07-30 2020-11-05 株式会社大一商会 遊技機
JP2021010747A (ja) * 2020-10-01 2021-02-04 株式会社大一商会 遊技機
JP2021010748A (ja) * 2020-10-01 2021-02-04 株式会社大一商会 遊技機
JP2021010749A (ja) * 2020-10-01 2021-02-04 株式会社大一商会 遊技機
JP2021010750A (ja) * 2020-10-01 2021-02-04 株式会社大一商会 遊技機

Also Published As

Publication number Publication date
JPS58214148A (ja) 1983-12-13

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