JPH0361931B2 - - Google Patents

Info

Publication number
JPH0361931B2
JPH0361931B2 JP55177266A JP17726680A JPH0361931B2 JP H0361931 B2 JPH0361931 B2 JP H0361931B2 JP 55177266 A JP55177266 A JP 55177266A JP 17726680 A JP17726680 A JP 17726680A JP H0361931 B2 JPH0361931 B2 JP H0361931B2
Authority
JP
Japan
Prior art keywords
transparent conductive
conductive film
photoresist
substrate
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55177266A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57102015A (en
Inventor
Keiichi Aoki
Masateru Wakui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP55177266A priority Critical patent/JPS57102015A/ja
Publication of JPS57102015A publication Critical patent/JPS57102015A/ja
Publication of JPH0361931B2 publication Critical patent/JPH0361931B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Liquid Crystal (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP55177266A 1980-12-17 1980-12-17 Pattern formation Granted JPS57102015A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55177266A JPS57102015A (en) 1980-12-17 1980-12-17 Pattern formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55177266A JPS57102015A (en) 1980-12-17 1980-12-17 Pattern formation

Publications (2)

Publication Number Publication Date
JPS57102015A JPS57102015A (en) 1982-06-24
JPH0361931B2 true JPH0361931B2 (enExample) 1991-09-24

Family

ID=16028048

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55177266A Granted JPS57102015A (en) 1980-12-17 1980-12-17 Pattern formation

Country Status (1)

Country Link
JP (1) JPS57102015A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59176741A (ja) * 1983-03-28 1984-10-06 Hoya Corp 透光性薄膜のパタ−ン形成法
JPS60233653A (ja) * 1984-05-07 1985-11-20 Stanley Electric Co Ltd 写真蝕刻方法
US7012589B1 (en) 1999-11-16 2006-03-14 Citizen Watch Co., Ltd. Display

Also Published As

Publication number Publication date
JPS57102015A (en) 1982-06-24

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