JPH0361340A - Method for melting alloy by means of electron beam - Google Patents
Method for melting alloy by means of electron beamInfo
- Publication number
- JPH0361340A JPH0361340A JP19488789A JP19488789A JPH0361340A JP H0361340 A JPH0361340 A JP H0361340A JP 19488789 A JP19488789 A JP 19488789A JP 19488789 A JP19488789 A JP 19488789A JP H0361340 A JPH0361340 A JP H0361340A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- amount
- alloy
- evaporation
- crucible
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 title claims abstract description 41
- 239000000956 alloy Substances 0.000 title claims abstract description 28
- 238000002844 melting Methods 0.000 title claims abstract description 17
- 230000008018 melting Effects 0.000 title claims abstract description 17
- 238000000034 method Methods 0.000 title claims abstract description 13
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 10
- 239000000463 material Substances 0.000 claims abstract description 39
- 230000008020 evaporation Effects 0.000 claims abstract description 18
- 238000001704 evaporation Methods 0.000 claims abstract description 18
- 239000000654 additive Substances 0.000 abstract description 7
- 230000000996 additive effect Effects 0.000 abstract description 7
- 239000012535 impurity Substances 0.000 abstract description 3
- 239000000126 substance Substances 0.000 description 13
- 238000001514 detection method Methods 0.000 description 8
- 238000004090 dissolution Methods 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- -1 etc. added Chemical compound 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Landscapes
- Manufacture And Refinement Of Metals (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野コ
本発明は、合金材料を電子ビームで溶解する新規な方法
に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a novel method for melting alloy materials with an electron beam.
［従来の技術］
材料中の不純物を取り除くために電子ビーム溶解法が使
用されている。この溶解法は高真空中で行われることか
ら溶解した材料が蒸発する問題がある。その結果、単一
成分の材料を溶解する場合には何等問題がないが、例え
ば鉄にマンガンやクロム等を添加したような合金材料を
溶解する場合には、混合材料のうちのマンガンやクロム
等の蒸気圧の高い物質が溶解中に蒸発し混合比を一定に
保つことができない。[Prior Art] Electron beam melting is used to remove impurities in materials. Since this melting method is performed in a high vacuum, there is a problem that the melted material evaporates. As a result, there is no problem when melting single-component materials, but when melting alloy materials such as iron with manganese, chromium, etc. added, manganese, chromium, etc. Substances with high vapor pressure evaporate during dissolution, making it impossible to maintain a constant mixing ratio.
［発明が解決しようとする課題］
この混合比を一定に保つために、蒸発量を見込み、蒸発
しやすい物質を所定の混合比よりも多量に加えた合金材
料を用意し、これを電子ビームで溶解する方法が行われ
ている。しかし、この方法においても蒸発量は溶解時間
や溶解雰囲気により溶解条件が変わってしまうため、所
望の混合比を得ることは非常に困難である。[Problems to be Solved by the Invention] In order to keep this mixing ratio constant, an alloy material is prepared in which a substance that easily evaporates is added in a larger amount than the predetermined mixing ratio, and this is heated with an electron beam. A method of dissolving is being used. However, even in this method, the amount of evaporation changes depending on the dissolution time and the dissolution atmosphere, so it is very difficult to obtain a desired mixing ratio.
そこで、本発明はかかる点に鑑みてなされたものであり
、容易に所望の合金比を得ることのできる電子ビームに
よる合金溶解方法を提供することを目的とするものであ
る。SUMMARY OF THE INVENTION The present invention has been made in view of this problem, and it is an object of the present invention to provide an alloy melting method using an electron beam that can easily obtain a desired alloy ratio.
［課題を解決するための手段］
上記目的を達成するため、本発明の電子ビームによる合
金溶解方法は、合金材料と該合金材料中の蒸発しやすい
材料とを電子ビームにより溶解して１つの坩堝内に収容
し、該坩堝内の溶解した合金材料のうち蒸発しやすい材
料の蒸発量を測定し、この蒸発量が一定となるように前
記蒸発しやすい材料の電子ビームによる溶解量を制御す
ることを特徴とするものである。[Means for Solving the Problems] In order to achieve the above object, the method for melting an alloy using an electron beam of the present invention melts an alloy material and a material that is easily evaporated in the alloy material into one crucible using an electron beam. measuring the evaporation amount of easily evaporated materials among the melted alloy materials in the crucible, and controlling the amount of the easily evaporated materials dissolved by the electron beam so that the evaporation amount is constant. It is characterized by:
以下、本発明方法の一例を図面に基づいて詳説する。Hereinafter, an example of the method of the present invention will be explained in detail based on the drawings.
［実施例］
第１図は本発明の合金溶解方法を実施するための溶解装
置の一例を示す図、第２図は本発明で使用される坩堝の
電子線照射範囲を示す平面図である。[Example] FIG. 1 is a diagram showing an example of a melting apparatus for carrying out the alloy melting method of the present invention, and FIG. 2 is a plan view showing an electron beam irradiation range of a crucible used in the present invention.
図において、１は真空チャンバーで、内部は排気管２を
介して図示外の真空ポンプに接続され高真空に保たれる
。３はこのチャンバー内に置かれた銅製の坩堝、４，５
はこの坩堝の直上に置かれた材料で、各材料は図示外の
移動機構に夫々保持されている。In the figure, 1 is a vacuum chamber, and the inside thereof is connected to a vacuum pump (not shown) via an exhaust pipe 2 to maintain a high vacuum. 3 is a copper crucible placed in this chamber, 4,5
are materials placed directly above this crucible, and each material is held by a moving mechanism not shown.
６はこの各材料を溶解するための電子線発生手段で、発
生した電子線ＥＢＩは集束レンズ７により集束された後
、偏向コイル８により材料４．５を照射する。このとき
、電子線ＥＢＩは材料４゜５だけを照射することなく第
２図中二点鎖線Ａで示すように坩堝３内の溶解材料をも
同時に照射するようにしである。Reference numeral 6 denotes an electron beam generating means for melting each material, and the generated electron beam EBI is focused by a focusing lens 7 and then irradiated by a deflection coil 8 onto the material 4.5. At this time, the electron beam EBI is designed not to irradiate only the material 4.5, but also to irradiate the melted material in the crucible 3 at the same time, as shown by the two-dot chain line A in FIG.
９は前記坩堝３内に収容された溶解材料をノズル１０よ
り取り出してインゴット１１を形成するための銅製の鋳
型である。この鋳型及び前記坩堝３は水冷パイプにより
冷却されている。Reference numeral 9 denotes a copper mold for forming an ingot 11 by taking out the melted material contained in the crucible 3 through a nozzle 10. This mold and the crucible 3 are cooled by a water-cooled pipe.
１２は電子線発生手段で、発生した電子線ＥＢ２は集束
レンズ１３で集束された後、偏向コイル１４により偏向
されて前記坩堝４のノズル付近部及び鋳型９部の中心を
照射し、これらの部分における材料が凝固するのを防止
するためのものである。Reference numeral 12 denotes an electron beam generating means, and the generated electron beam EB2 is focused by a focusing lens 13 and then deflected by a deflection coil 14 to irradiate the vicinity of the nozzle of the crucible 4 and the center of the mold 9. This is to prevent the material from solidifying.
１５は前記坩堝４の直上で、しかも各電子線ＥＢｌ、Ｅ
Ｂ２の照射を妨げない位置に置かれた蒸発レートを測定
するレート検出手段で、このレート検出手段としては坩
堝３等からの蒸気に電子線を照射してイオン化し、その
際発生する光をモノクロメータで単色化するものが使用
される。従って、測定すべき蒸発物質の波長を指定する
ことによりレート検出手段からは所望とする物質の蒸発
量が電気信号として取り出される。そして、取り出され
た電気信号は偏向コイル８の走査回路１６に導入され、
材料５への電子線照射時間を制御する。15 is directly above the crucible 4, and each electron beam EBl, E
A rate detection means for measuring the evaporation rate placed in a position that does not interfere with the irradiation of B2.This rate detection means irradiates the vapor from the crucible 3 etc. with an electron beam to ionize it, and converts the light generated at that time into monochrome. A monochromatic meter is used. Therefore, by specifying the wavelength of the evaporated substance to be measured, the rate detection means extracts the desired evaporation amount of the substance as an electrical signal. The extracted electrical signal is then introduced into the scanning circuit 16 of the deflection coil 8,
The electron beam irradiation time to the material 5 is controlled.
かかる構成において、今、材料４側には不純物を除去す
べき合金物質を取り付けると共に、材料５側には前記合
金物質中の蒸発しやすい物質（添加物質）を取り付ける
。そして、各材料を夫々−定量ずつ移動させた状態で、
電子線発生手段６からの電子線ＥＢＩを各材料４．５に
照射させて溶解する。このとき、他方の電子線発生手段
１２からも電子線を発生させる。溶解された各材料は落
下して坩堝３内に収容された後、ノズル１０を介して鋳
型９内に落ちて固まるため、鋳型の底部に設けた降下手
段（図示せず）をゆっくりと引き下げることによりイン
ゴットが形成される。In this configuration, an alloy material from which impurities should be removed is attached to the material 4 side, and a substance (additional substance) that is easily evaporated in the alloy material is attached to the material 5 side. Then, while moving each material by a fixed amount,
Each material 4.5 is irradiated with the electron beam EBI from the electron beam generating means 6 to melt it. At this time, the other electron beam generating means 12 also generates an electron beam. After each melted material falls and is accommodated in the crucible 3, it falls into the mold 9 through the nozzle 10 and solidifies, so a descending means (not shown) provided at the bottom of the mold is slowly pulled down. An ingot is formed.
ところで、蒸発しやすい添加物質は電子線照射による材
料４の溶解時や坩堝３に収容された溶解材料が凝固する
のを防止するための電子線電子線時において蒸発するわ
けであるが、本発明ではその蒸発量をレート検出手段１
５により測定し、その測定信号によって材料５（添加物
質）への電子線照射時間を制御するため、添加物質の蒸
発量を一定に保つことができる。つまり、添加物質の蒸
発量が予め設定した値よりも多くなるとレート検出手段
１５は材料５への電子線照射時間を長くするように走査
回路１６を制御し、また、逆に、蒸発量が少なくなると
レート検出手段は材料５への電子線照射時間を短くする
ように走査回路を制御するため、蒸発量が一定に保たれ
る。その結果、混合比を所望の値に設定することができ
る。By the way, additive substances that are easily evaporated are evaporated when the material 4 is melted by electron beam irradiation or when the electron beam is used to prevent the melted material contained in the crucible 3 from solidifying. Then, the amount of evaporation is measured by rate detection means 1.
Since the electron beam irradiation time to the material 5 (additive substance) is controlled by the measurement signal, the amount of evaporation of the additive substance can be kept constant. In other words, when the amount of evaporation of the additive substance exceeds a preset value, the rate detection means 15 controls the scanning circuit 16 to lengthen the electron beam irradiation time to the material 5, and conversely, when the amount of evaporation decreases Then, the rate detection means controls the scanning circuit so as to shorten the electron beam irradiation time to the material 5, so that the amount of evaporation is kept constant. As a result, the mixing ratio can be set to a desired value.
尚、前述の説明は本発明の一例であり、実施にあたって
は幾多の変形が考えられる。例えば上記実施例では各材
料４，５を共通の電子線発生手段により溶解する場合に
ついて述べたが、夫々専用の電子線発生手段を設けても
良い。It should be noted that the above description is an example of the present invention, and many modifications can be made in implementing the present invention. For example, in the above embodiment, a case has been described in which the materials 4 and 5 are melted by a common electron beam generating means, but dedicated electron beam generating means may be provided for each material.
また、上記実施例では２種類の物質を混ぜた場合の合金
材料を溶解する場合について述べたが、３種類以上の物
質を混ぜた合金材料を溶解する場合にも実施することが
可能である。この場合には、レート検出手段を２個以上
組込む必要がある。Further, in the above embodiment, the case where an alloy material made by mixing two types of substances was melted was described, but it can also be carried out when melting an alloy material made by mixing three or more types of substances. In this case, it is necessary to incorporate two or more rate detection means.
［効果］
以上詳述したよう本発明によれば、合金材料とこの合金
材料中の蒸発しやすい物質を夫々用意し、これらを同時
に電子ビームで溶解しながら同じ坩堝内に収容し、この
坩堝内の溶解した合金材料のうち蒸発しやすい材料の蒸
発量を測定し、この蒸発量が一定となるように前記蒸発
しやすい材料の電子ビームによる溶解量を制御するよう
に構成しているため、容易に所望の合金比を得ることが
できる。[Effect] As detailed above, according to the present invention, an alloy material and a substance that is easily evaporated in the alloy material are respectively prepared, and they are simultaneously melted with an electron beam and housed in the same crucible, and the The method is configured to measure the amount of evaporation of the material that is easily evaporated among the melted alloy materials, and to control the amount of the material that is easily evaporated by the electron beam so that the amount of evaporation is constant. The desired alloy ratio can be obtained.
第１図は本発明の合金溶解方法を実施するための溶解装
置の一例を示す図、第２図は本発明で使用される坩堝の
電子線照射範囲を示す平面図である。
１：真空チャンバー ２：排気管
３：坩堝 ４，５：材料
６．１２：電子線発生手段
７．１３：集束レンズ
８．１．４：偏向コイル
９：鋳型 ］−〇：ノズル
１１：インゴット
１５：レート検出手段FIG. 1 is a diagram showing an example of a melting apparatus for implementing the alloy melting method of the present invention, and FIG. 2 is a plan view showing an electron beam irradiation range of a crucible used in the present invention. 1: Vacuum chamber 2: Exhaust pipe 3: Crucible 4, 5: Material 6.12: Electron beam generating means 7.13: Focusing lens 8.1.4: Deflection coil 9: Mold ]-〇: Nozzle 11: Ingot 15 : Rate detection means
Claims (1)
ームにより溶解して１つの坩堝内に収容し、該坩堝内の
溶解した合金材料のうち蒸発しやすい材料の蒸発量を測
定し、この蒸発量が一定となるように前記蒸発しやすい
材料の電子ビームによる溶解量を制御することを特徴と
する電子ビームによる合金溶解方法。The alloy material and the easily evaporated material in the alloy material are melted by an electron beam and placed in one crucible, and the amount of evaporation of the easily evaporated material among the melted alloy materials in the crucible is measured. A method for melting an alloy using an electron beam, characterized in that the amount of the easily evaporated material dissolved by the electron beam is controlled so that the amount of evaporation is constant.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19488789A JPH0361340A (en) | 1989-07-27 | 1989-07-27 | Method for melting alloy by means of electron beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19488789A JPH0361340A (en) | 1989-07-27 | 1989-07-27 | Method for melting alloy by means of electron beam |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0361340A true JPH0361340A (en) | 1991-03-18 |
Family
ID=16331979
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19488789A Pending JPH0361340A (en) | 1989-07-27 | 1989-07-27 | Method for melting alloy by means of electron beam |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0361340A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103981372A (en) * | 2014-05-29 | 2014-08-13 | 大连理工大学 | Method for removing trace impurity elements in high temperature alloy |
-
1989
- 1989-07-27 JP JP19488789A patent/JPH0361340A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103981372A (en) * | 2014-05-29 | 2014-08-13 | 大连理工大学 | Method for removing trace impurity elements in high temperature alloy |
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