JPH035654B2 - - Google Patents
Info
- Publication number
- JPH035654B2 JPH035654B2 JP19411282A JP19411282A JPH035654B2 JP H035654 B2 JPH035654 B2 JP H035654B2 JP 19411282 A JP19411282 A JP 19411282A JP 19411282 A JP19411282 A JP 19411282A JP H035654 B2 JPH035654 B2 JP H035654B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- radiation
- pattern
- layer
- sensitive resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/094—Multilayer resist systems, e.g. planarising layers
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19411282A JPS5984428A (ja) | 1982-11-04 | 1982-11-04 | パタ−ン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19411282A JPS5984428A (ja) | 1982-11-04 | 1982-11-04 | パタ−ン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5984428A JPS5984428A (ja) | 1984-05-16 |
| JPH035654B2 true JPH035654B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-01-28 |
Family
ID=16319115
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19411282A Granted JPS5984428A (ja) | 1982-11-04 | 1982-11-04 | パタ−ン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5984428A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102005021459B3 (de) * | 2005-05-10 | 2006-07-13 | Eads Space Transportation Gmbh | Mechanischer Rotationsantrieb |
-
1982
- 1982-11-04 JP JP19411282A patent/JPS5984428A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5984428A (ja) | 1984-05-16 |