JPH0353402Y2 - - Google Patents

Info

Publication number
JPH0353402Y2
JPH0353402Y2 JP1987058775U JP5877587U JPH0353402Y2 JP H0353402 Y2 JPH0353402 Y2 JP H0353402Y2 JP 1987058775 U JP1987058775 U JP 1987058775U JP 5877587 U JP5877587 U JP 5877587U JP H0353402 Y2 JPH0353402 Y2 JP H0353402Y2
Authority
JP
Japan
Prior art keywords
slit
extraction electrode
extraction
electrode
ion beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1987058775U
Other languages
English (en)
Japanese (ja)
Other versions
JPS63165750U (ko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987058775U priority Critical patent/JPH0353402Y2/ja
Publication of JPS63165750U publication Critical patent/JPS63165750U/ja
Application granted granted Critical
Publication of JPH0353402Y2 publication Critical patent/JPH0353402Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)
JP1987058775U 1987-04-20 1987-04-20 Expired JPH0353402Y2 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987058775U JPH0353402Y2 (ko) 1987-04-20 1987-04-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987058775U JPH0353402Y2 (ko) 1987-04-20 1987-04-20

Publications (2)

Publication Number Publication Date
JPS63165750U JPS63165750U (ko) 1988-10-28
JPH0353402Y2 true JPH0353402Y2 (ko) 1991-11-21

Family

ID=30889648

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987058775U Expired JPH0353402Y2 (ko) 1987-04-20 1987-04-20

Country Status (1)

Country Link
JP (1) JPH0353402Y2 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9281160B2 (en) 2013-05-31 2016-03-08 Sumitomo Heavy Industries Ion Technology Co., Ltd. Insulation structure and insulation method

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1683163B1 (en) * 2003-10-17 2012-02-22 Fei Company Charged particle extraction device and method
JP6388520B2 (ja) * 2014-10-17 2018-09-12 住友重機械イオンテクノロジー株式会社 ビーム引出スリット構造、イオン源、及びイオン注入装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PROCEEDINGS OF THE INTERNATIONAL ION ENGINEERING CONGRESS=1983 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9281160B2 (en) 2013-05-31 2016-03-08 Sumitomo Heavy Industries Ion Technology Co., Ltd. Insulation structure and insulation method

Also Published As

Publication number Publication date
JPS63165750U (ko) 1988-10-28

Similar Documents

Publication Publication Date Title
EP0286132B1 (en) Plasma generating apparatus
US4163151A (en) Separated ion source
JPH0654644B2 (ja) イオン源
TW201443965A (zh) 離子源
US4608513A (en) Dual filament ion source with improved beam characteristics
US6184625B1 (en) Ion beam processing apparatus for processing work piece with ion beam being neutralized uniformly
US20020125829A1 (en) Double chamber ion implantation system
JP2859479B2 (ja) ボロンイオンを生成するためのイオン源
US6501081B1 (en) Electron flood apparatus for neutralizing charge build up on a substrate during ion implantation
JPH0353402Y2 (ko)
US4939425A (en) Four-electrode ion source
JPH10275566A (ja) イオン源
JPH069040U (ja) イオン源
JPH02121233A (ja) イオン源
JP2000048734A (ja) 高周波イオン源
JP3341497B2 (ja) 高周波型荷電粒子加速器
KR100610766B1 (ko) 이온생성챔버
KR200371647Y1 (ko) 이온생성챔버
JP2671219B2 (ja) 高速原子線源
TW202338884A (zh) 環狀運動加強型離子源
JPH01161699A (ja) 高速原子線源
JPH02183940A (ja) イオンビーム装置
JP3265988B2 (ja) イオン照射装置
KR0177401B1 (ko) 반도체 제조 장치의 이온 주입장치
JPH02199743A (ja) 金属イオン源