JPH0348502B2 - - Google Patents

Info

Publication number
JPH0348502B2
JPH0348502B2 JP56182905A JP18290581A JPH0348502B2 JP H0348502 B2 JPH0348502 B2 JP H0348502B2 JP 56182905 A JP56182905 A JP 56182905A JP 18290581 A JP18290581 A JP 18290581A JP H0348502 B2 JPH0348502 B2 JP H0348502B2
Authority
JP
Japan
Prior art keywords
metal
image
layer
group
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56182905A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5883849A (ja
Inventor
Toshikazu Nishiwaki
Kohei Umetani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP56182905A priority Critical patent/JPS5883849A/ja
Publication of JPS5883849A publication Critical patent/JPS5883849A/ja
Publication of JPH0348502B2 publication Critical patent/JPH0348502B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP56182905A 1981-11-13 1981-11-13 金属系画像形成方法 Granted JPS5883849A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56182905A JPS5883849A (ja) 1981-11-13 1981-11-13 金属系画像形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56182905A JPS5883849A (ja) 1981-11-13 1981-11-13 金属系画像形成方法

Publications (2)

Publication Number Publication Date
JPS5883849A JPS5883849A (ja) 1983-05-19
JPH0348502B2 true JPH0348502B2 (enrdf_load_stackoverflow) 1991-07-24

Family

ID=16126422

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56182905A Granted JPS5883849A (ja) 1981-11-13 1981-11-13 金属系画像形成方法

Country Status (1)

Country Link
JP (1) JPS5883849A (enrdf_load_stackoverflow)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5421089B2 (enrdf_load_stackoverflow) * 1973-05-29 1979-07-27
US3954469A (en) * 1973-10-01 1976-05-04 Mca Disco-Vision, Inc. Method of creating a replicating matrix
JPS51135641A (en) * 1975-05-20 1976-11-24 Kimoto & Co Ltd Photosensitive film

Also Published As

Publication number Publication date
JPS5883849A (ja) 1983-05-19

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