JPS51135641A - Photosensitive film - Google Patents

Photosensitive film

Info

Publication number
JPS51135641A
JPS51135641A JP50060320A JP6032075A JPS51135641A JP S51135641 A JPS51135641 A JP S51135641A JP 50060320 A JP50060320 A JP 50060320A JP 6032075 A JP6032075 A JP 6032075A JP S51135641 A JPS51135641 A JP S51135641A
Authority
JP
Japan
Prior art keywords
photosensitive film
screening
available
various characteristics
picture image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50060320A
Other languages
Japanese (ja)
Inventor
Toshio Yamagata
Ujihito Kimoto
Masayoshi Ota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kimoto Co Ltd
Original Assignee
Kimoto Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kimoto Co Ltd filed Critical Kimoto Co Ltd
Priority to JP50060320A priority Critical patent/JPS51135641A/en
Publication of JPS51135641A publication Critical patent/JPS51135641A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To provide a photosensitive film producible by a short process and available at a cheap price a superior picture image copied, having a various characteristics such as a high light-screening, a high resolution and the like.
JP50060320A 1975-05-20 1975-05-20 Photosensitive film Pending JPS51135641A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50060320A JPS51135641A (en) 1975-05-20 1975-05-20 Photosensitive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50060320A JPS51135641A (en) 1975-05-20 1975-05-20 Photosensitive film

Publications (1)

Publication Number Publication Date
JPS51135641A true JPS51135641A (en) 1976-11-24

Family

ID=13138753

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50060320A Pending JPS51135641A (en) 1975-05-20 1975-05-20 Photosensitive film

Country Status (1)

Country Link
JP (1) JPS51135641A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5532088A (en) * 1978-08-30 1980-03-06 Fuji Photo Film Co Ltd Photo mask forming method
JPS5879246A (en) * 1981-11-05 1983-05-13 Toyobo Co Ltd Formation of metallic image and reducing method for metallic image
JPS5883849A (en) * 1981-11-13 1983-05-19 Toyobo Co Ltd Metallic image product and its formation
JPS59198445A (en) * 1983-04-27 1984-11-10 Kimoto & Co Ltd Image forming material by stripping
JPS6045244A (en) * 1983-08-23 1985-03-11 Oki Electric Ind Co Ltd Formation of resist pattern
JPS60196747A (en) * 1984-03-19 1985-10-05 Kimoto & Co Ltd Photosensitive image-forming material
JPS60238826A (en) * 1984-05-14 1985-11-27 Kimoto & Co Ltd Image forming material

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5532088A (en) * 1978-08-30 1980-03-06 Fuji Photo Film Co Ltd Photo mask forming method
JPS5879246A (en) * 1981-11-05 1983-05-13 Toyobo Co Ltd Formation of metallic image and reducing method for metallic image
JPS5883849A (en) * 1981-11-13 1983-05-19 Toyobo Co Ltd Metallic image product and its formation
JPH0348502B2 (en) * 1981-11-13 1991-07-24 Toyo Boseki
JPS59198445A (en) * 1983-04-27 1984-11-10 Kimoto & Co Ltd Image forming material by stripping
JPH0349099B2 (en) * 1983-04-27 1991-07-26 Kimoto Kk
JPS6045244A (en) * 1983-08-23 1985-03-11 Oki Electric Ind Co Ltd Formation of resist pattern
JPS60196747A (en) * 1984-03-19 1985-10-05 Kimoto & Co Ltd Photosensitive image-forming material
JPH0542660B2 (en) * 1984-03-19 1993-06-29 Kimoto Kk
JPS60238826A (en) * 1984-05-14 1985-11-27 Kimoto & Co Ltd Image forming material

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