TW483294B - Laminate for pattern formation - Google Patents

Laminate for pattern formation Download PDF

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Publication number
TW483294B
TW483294B TW089123576A TW89123576A TW483294B TW 483294 B TW483294 B TW 483294B TW 089123576 A TW089123576 A TW 089123576A TW 89123576 A TW89123576 A TW 89123576A TW 483294 B TW483294 B TW 483294B
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TW
Taiwan
Prior art keywords
coating film
visible light
film layer
sensitive
laminated body
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TW089123576A
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Chinese (zh)
Inventor
Daisuke Kojima
Takanobu Komatsu
Genji Imai
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Kansai Paint Co Ltd
Fujitsu Ltd
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Publication of TW483294B publication Critical patent/TW483294B/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0757Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/085Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Abstract

The present invention provides a laminate for pattern formation characterized by being made through successively laminating on the surface of a substrate a negative type or positive type visible light-sensitive resin coating film layer (A), an visible light-transmitting sheet layer (B) and an visible light-shading, energy rays-sensitive coating film layer (C).

Description

五、發明說明( 本發明關係用於形成圖樣之積層體,其製造方法,和使 用該積層體形成圖樣的方法。 迄至目前,利用曝光之微影印刷技術已經應用於例如電 路板、顯示板、蝕刻等等而在塑膠、無機等物質上形成圖 紋之方法。 作爲形成圖樣之方法,已知是在基質表面上塗覆一種絕 緣或導電的光敏感性樹脂組成物,形成一種絕緣的或導電 性塗層,用電子束或可見光經過光罩之中介而照射於表面 ,.然後使該絕緣或導電之光敏性塗膜層顯影而獲得所需之 圖樣。然而,此種方法因爲絕緣或導電性塗膜層的光敏性 不足而有不能形成銳明圖樣的問題。 爲求解決上述問題,經過反覆積極硏究之結果,本發明 人等現已發現上述問題可以利用塗膜與特定光敏性塗膜積 層予以解決並完成本發明。 因此,根據本發明而提供一種用於形成圖樣的積層體, 其特徵在於藉由在基質表面上連續層積一種負型或正型的 可見光-敏感性樹脂塗膜層(A )、一種可見光-透射的片層 (B),和一種遮蔽可見光而對能量光線敏感的塗膜層(C)而 形成。 然後,更爲詳細說明本發明用於形成圖樣的積層體,其 製備方法,和使用該積層體形成圖樣之方法。 在本發明積層體中所用基質無特別限制,其迄今已被用 於形成圖樣者皆可類比予以採用,其可列示者,例如電絕 緣之玻璃-環氧板;諸如聚乙烯對苯二酸酯片、聚醯亞胺 本紙張尺度適用.中國國家標準(CNS)A4規格(210 x 297公釐)5. Description of the invention (The present invention relates to a laminated body for forming a pattern, a manufacturing method thereof, and a method for forming a pattern using the laminated body. So far, the lithographic printing technology using exposure has been applied to, for example, a circuit board, a display board , Etching, etc. to form patterns on plastics, inorganics, etc. As a method for forming patterns, it is known to coat an insulating or conductive light-sensitive resin composition on the surface of a substrate to form an insulating or conductive The coating is irradiated with electron beam or visible light through the intermediate of the photomask, and then the insulating or conductive photosensitive coating film layer is developed to obtain the desired pattern. However, this method is because of insulation or conductivity In order to solve the above problems, the inventors have found out that the above problems can be solved by using the coating film and the specific photosensitive coating film. The present invention solves this problem and completes the present invention. Therefore, according to the present invention, a laminated body for forming a pattern is provided, which is characterized in that By continuously laminating a negative or positive visible light-sensitive resin coating film layer (A), a visible light-transmitting sheet layer (B), and a coating sensitive to energy rays by shielding visible light The film layer (C) is formed. Then, the laminated body for forming a pattern of the present invention, a method for preparing the same, and a method for forming a pattern using the laminated body are described in more detail. The substrate used in the laminated body of the present invention is not particularly limited, It has so far been used to form patterns can be used by analogy, it can be listed, such as electrical insulation glass-epoxy board; such as polyethylene terephthalate sheet, polyimide paper size applicable. China National Standard (CNS) A4 (210 x 297 mm)

請 先 閱 讀 背 面 之 注 意 事 項 再L 填·· 寫裝 本衣 頁 I 訂 經濟部智慧財產局員工消費合作社印製 五、發明說明(2) 片等之塑膠片或塑膠板;形成有導電性塗膜之塑膠板或塑 膠片,其爲利用黏著諸如銅、鋁等之金屬箔,或利用真空 蒸鍍或化學蒸鍍、電鍍等方法鍍上諸如銅、鎳、銀等金屬 ,或諸如以氧化銦錫(ITO)爲代表之導電性氧化物等之化 合物而形成導電性塗膜者;設有貫穿孔部位,且在其上已 有上述導電塗膜形成於表面和貫穿孔各部位之塑膠板或塑 膠片;諸如銅板等之金屬板;已形成圖樣之銅質穿孔印刷 電路基質等。 用於本發明積層體之負型或正型可見光-敏感性樹脂塗 膜層(A)並無特別限制,若爲負型塗膜層(A-1),其在未被 可見光照射之部位是溶解或擴散於顯影溶液而被除去,而 塗膜層受可見光照射之部位留作光阻塗膜而在顯影溶液中 不被溶解或擴散;或若爲正型塗膜層(A-2),其未被可見 光照射之部位留作光阻塗層而在顯影溶液中不因溶解或擴 散而被除去,而塗膜層受可見光照射之部位則受可見光分 解而在顯影溶液中因溶解或擴散而被除去,具有如此之可 見光-敏感性之特徵。 經濟部智慧財產局員工消費合作社印製 可被用於形成負型可見光-敏感性樹脂塗膜層(A-1 )之樹 脂組成物,例如含有可見光可固化之樹脂,光輻射聚合起 始劑和光敏感劑等之已知供形成塗膜之樹脂組成物。 用作上述可見光可固化之樹脂,例如,具有光敏感性 不飽和基之可見光可固化樹脂,其爲可因可見光照射經交 聯而固化之樹脂,有足夠之可離子化基(可陰離子化之基 或可陽離子化之基),在鹼顯影溶液或酸顯影溶液中溶解 -4- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 483294 A7 ------—--- 五、發明說明(3 ) 或擴散樹脂。 作爲可含於可見光可固化樹脂內之光敏感性不飽和基, 其可列示者例如丙烯醯基、甲基丙烯醯基、乙烯基、苯乙 烯基、烯丙基等。作爲可離子化基而可列示者例如以羧基 爲代表之可陰離子化基5而且該羧基之含量通常較佳約在 10-700毫克KOH/克之範圍內,特別是約爲20-600毫克 K.OH/克,作爲樹脂之酸値。作爲可陽離子化之胺基可視爲 有代表性,而該胺基之含量較佳通常約在20- 650,特別 是約爲30- 600毫克之範圍內,可爲樹脂之胺値。 作爲可陰離子化之可見光可固化之樹脂,可以列示者例 如含羧基之樹脂(多元羧酸樹脂),在其中之不飽和基和羧 基是以與不飽和單體如(甲基)丙烯酸縮水甘油酯者反應而 引入。 作爲可陽離子化之可見光可固化之樹脂,其可列示者, 例如,以含羥基和三級胺基之樹脂,與含羥基之不飽和化 合物與二異氰酸酯化合物之反應生成物,行加成反應而製 成i。 作爲上述之可陰離子化和可陽離子化之可見光可固化之 樹脂,載於日本公開專利公告第223759/ 1 991號(=美國專 利第5,045,434號),其被引用之處在此替代詳細之說 明。 作爲光輻射起始劑之可列示者,例如,諸如二苯甲酮、 苯偶姻甲醚、苯偶姻異丙醚、苄基PIJJ酮、噻噸酮、蒽醌等 之芳族羰基化合物;諸如乙醯苯、丙醯苯、α-羥基異丁 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項寫本頁)Please read the precautions on the back first and then fill in the page of this book. I Order the printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention (2) Plastic sheet or plastic sheet such as sheet; A plastic plate or sheet of film, which is a metal foil such as copper, aluminum, etc., or a metal such as copper, nickel, silver, etc., or a method such as indium oxide A tin (ITO) is a representative conductive oxide and other compounds to form a conductive coating film; a plastic plate provided with a through-hole portion and the above-mentioned conductive coating film is formed on the surface and various portions of the through-hole; Plastic sheets; metal plates such as copper plates; copper perforated printed circuit substrates that have been patterned. The negative or positive visible light-sensitive resin coating film layer (A) used in the laminate of the present invention is not particularly limited. If it is a negative coating film layer (A-1), it is It is dissolved or diffused in the developing solution and removed, and the part of the coating film layer exposed to visible light is left as a photoresist coating film and is not dissolved or diffused in the developing solution; or if it is a positive type coating film layer (A-2), The parts that are not irradiated with visible light are left as photoresist coatings and are not removed by dissolution or diffusion in the developing solution, while the parts exposed to visible light by the coating film layer are decomposed by visible light and dissolved or diffused in the developing solution. It is removed and has such a characteristic of visible light sensitivity. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, a resin composition that can be used to form a negative visible light-sensitive resin coating film layer (A-1), such as a resin containing visible light curable resin, a light radiation polymerization initiator and light A resin composition for forming a coating film, such as a sensitizer. Used as the above-mentioned visible light curable resin, for example, a visible light curable resin having a light-sensitive unsaturated group, which is a resin that can be cured by crosslinking by visible light irradiation, and has sufficient ionizable groups (anionizable resins) Base or cationizable base), dissolve in alkali developing solution or acid developing solution -4- The paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) 483294 A7 -------- --- V. Description of the invention (3) or diffusion resin. As the light-sensitive unsaturated group which can be contained in the visible light curable resin, there can be listed, for example, acrylfluorenyl, methacrylfluorenyl, vinyl, styrene, allyl, and the like. As an ionizable group, there can be listed, for example, an anionizable group 5 represented by a carboxyl group, and the content of the carboxyl group is usually preferably in the range of about 10-700 mgKOH / g, especially about 20-600 mgK .OH / g, as the acid base of the resin. As a cationizable amine group, it can be regarded as a representative, and the content of the amine group is usually about 20-650, especially about 30-600 mg, and can be the amine hydrazone of the resin. As the anionizable visible light curable resin, there can be listed, for example, a carboxyl group-containing resin (polycarboxylic acid resin) in which unsaturated groups and carboxyl groups are reacted with unsaturated monomers such as glycidyl (meth) acrylate. Ester is introduced in response. As a cationizable visible light curable resin, it can be listed. For example, a hydroxyl group-containing and tertiary amine group-containing resin and a reaction product of a hydroxyl group-containing unsaturated compound and a diisocyanate compound are subjected to an addition reaction. And made i. As the above-mentioned anionizable and cationizable visible light curable resin, it is described in Japanese Laid-Open Patent Publication No. 223751/1991 (= US Patent No. 5,045,434), and its reference is hereby substituted in detail. Instructions. As a listable initiator of light radiation, for example, aromatic carbonyl compounds such as benzophenone, benzoin methyl ether, benzoin isopropyl ether, benzyl PIJJ ketone, thioxanthone, anthraquinone, etc. ; Paper sizes such as acetophenone, acetophenone, and α-hydroxyisobutyl paper are in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the notes on the back to write this page)

裝--------訂---------線L 經濟部智慧財產局員工消費合作社印製 483294 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(4) 琴苯、α,α 二氯-4-苯氧基乙酿苯、1-經-1-環己基乙 醯苯、二乙醯基乙醯苯等之乙醯苯類;諸如過氧化苯醯、 過氧-2-乙基己酸三級丁酯、三級丁基過氧化氫、二過氧 異苯二酸二-三級-丁酯、3,3'4,4'四(三級丁基過氧羰基) 二苯甲酮等之有機過氧化物;諸如二苯碘化溴、二苯碘化 氯等之二苯鹵鹽;諸如四溴化碳、三氯甲烷、三碘甲烷等 之有機鹵化物;諸如3_苯基-5-異噁唑酮、2,4,6-三(三 氯甲基)-1,3,5-三嗪、苯並蒽酮等之雜環或多環化合物; 諸如2,2·-偶氮(2,4-二甲基戊腈、2,2'-偶氮-雙異丁腈、 1,厂-偶氮雙(環己烷-1-腈)、2,2’-偶氮雙(2-甲基丁腈) 等之偶氮化合物;鐵-丙二烯錯合物(參見ΕΡ-Α- 1 5 23 77 ); 二茂鈦化合物(參見日本公開專利公告第221 1 1 0 / 1 988號); 雙咪唑型化合物;Ν-芳基-縮水甘油基型化合物;吖啶型 化合物;芳族酮/芳族胺之結合物;過氧縮酮類(參見曰 本公開專利公告第321 895 / 1 994號)等。上列各種光輻射 聚合起始劑中,較佳採用二過氧異苯二酸二-三級-丁酯, 3,3’,4,4'-四(三級丁基過氧碳基)二苯甲酮、鐵-丙二烯 錯合物或二茂鈦化合物,其在交聯或聚合作用中,通常有 高度活性。 可以列示之市售產品,例如,Irgacure651(Ciba Geigy 製造,商品名,乙醯苯型光輻射聚合起始劑),Irgacure 184(Ciba Geigy製造,商品名,乙醯苯型光輻射聚合起 始劑),Irgacure907(Ciba Geigy製造,商品名,胺垸基 苯型光輻射聚合起始劑),Irgacure369(Ciba Geigy製造, -6- 本、,氏張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐 ▼裝---- (請先閱讀背面之注意事項再填寫本頁) 訂---------嫁 _ 483294 經濟部智慧財產局員工消費合作社印製 A7 , __B7____五、發明說明(5 ) 商品名,胺烷基苯型光輻射聚合起始劑),LucirinTPO (BASF製造,商品名,2,4,6_三甲基苯醯二苯基膦化氧), Kayacure DETX-S(Nippon Kayaku CO. Ltd.製造,商品名 ,噻咕噸型化合物),CGI- 784(Ciba Geigy製造,商品名 鈦錯合物)等。其爲可以單獨或以二或多種合倂使用。 每100重量份可見光可固化之樹脂中,光輻射聚合起始 劑之配用比例通常爲0.卜25重量份之範圍內,較佳爲 0.2 -1 0重量份。 作爲光敏感劑者已知可用光敏性染料,且其可特別列示者 ,例如,噻咕噸型、咕噸型、酮型、T h i 〇 p y r i 1 i u m鹽 型、鹼苯乙基型、部花青型、3-取代之香豆素型、3,4-取 代之香豆素型、花青型、吖啶型、噻嗪型、吩噻嗪型、蒽 型、六苯並苯型、苯並蒽型、二萘嵌苯型、酮基香豆素 型、富馬鹼型、硼酸鹽型等。其間可以單獨或以二或多種 合倂使用。作爲硼酸鹽型之光敏感染料;可提示者,例如 日本公開專利公告第241 338/ 1 993號,日本公開專利公告 第5685 / 1 995號(=美國專利第5,498,641號),日本公開 專利公告第225474/ 1 995號(=美國專利第5,498,641號) 等,如此之光敏感劑之配劑比率,在上述形成塗膜之樹脂 組成物中(固含量)可在約爲0.1-20重量%,較佳爲約 0.2-10重量%之範圍內。 對於形成可見光-敏感性樹脂塗膜層(A- 1 )之樹脂組成物 ;如有需要可以配入一種飽和樹脂。該飽和樹脂是用於控 制該樹脂組成物之溶解度(對光阻塗膜之鹼性顯影溶液之 請 先 閱 讀 背 之 注 意 項Packing -------- Order --------- line L Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economy 483294 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economy A7 B7 V. Description of the invention (4 ) Benzene, α, α Dichloro-4-phenoxyethylbenzene, 1-Ethyl-1-cyclohexylacetophenone, diethylacetophenone, and other ethylbenzene; such as benzene peroxide , Tert-butyl peroxy-2-ethylhexanoate, tert-butyl hydroperoxide, di-tert-isophthalic acid di-tertiary-butyl ester, 3,3'4,4 'tetra (tertiary Butylperoxycarbonyl) Organic peroxides such as benzophenone; Diphenyl halide salts such as bromide diphenyl iodide and diphenyl chloride iodide; carbon tetrabromide, chloroform, triiodomethane, etc. Organic halides such as 3-phenyl-5-isoxazolone, 2,4,6-tris (trichloromethyl) -1,3,5-triazine, benzoanthrone, etc. Polycyclic compounds; such as 2,2 · -azo (2,4-dimethylvaleronitrile, 2,2'-azo-bisisobutyronitrile, 1,2-azobis (cyclohexane-1- Nitrile), 2,2'-azobis (2-methylbutyronitrile), and other azo compounds; iron-propadiene complexes (see EP-Α- 1 5 23 77); (See Japanese Laid-Open Patent Publication No. 2211 10/1988); bisimidazole-type compounds; N-aryl-glycidyl-type compounds; acridine-type compounds; aromatic ketone / aromatic amine combinations; Peroxyketals (see Japanese Patent Publication No. 321 895/1 994), etc. Among the various light radiation polymerization initiators listed above, di-peroxy isophthalic acid di-tertiary-butyl ester is preferably used , 3,3 ', 4,4'-tetrakis (tertiary butyl peroxycarbon) benzophenone, iron-propadiene complex or titanocene compound, which is used in cross-linking or polymerization, Usually highly active. Commercially available products that can be listed, for example, Irgacure651 (manufactured by Ciba Geigy, trade name, acetonitrile-type photo-radiation polymerization initiator), Irgacure 184 (manufactured by Ciba Geigy, trade name, acetophenone) Light Radiation Polymerization Initiator), Irgacure907 (manufactured by Ciba Geigy, trade name, amine-type benzene type light radiation polymerization initiator), Irgacure369 (manufactured by Ciba Geigy, -6- this, this, and Zhang scales apply Chinese national standards ( CNS) A4 size (210 X 297 mm ▼ installed ---- (Please read the precautions on the back before filling Page) Order --------- Marriage_ 483294 Printed by A7, __B7____, Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (5) Trade name, amine alkylbenzene type light radiation polymerization initiator ), LucirinTPO (manufactured by BASF, trade name, 2,4,6_trimethylphenylphosphonium diphenylphosphine oxide), Kayacure DETX-S (manufactured by Nippon Kayaku CO. Ltd., trade name, thiogol-type compound ), CGI-784 (manufactured by Ciba Geigy, trade name titanium complex) and the like. It can be used alone or in a combination of two or more. The proportion of the light radiation polymerization initiator per 100 parts by weight of the visible light curable resin is usually within a range of 0.2 to 25 parts by weight, preferably 0.2 to 10 parts by weight. As the photosensitizer, a photosensitizing dye is known, and it may be specifically listed, for example, thiaquinol type, glutathione type, ketone type, T hi operpy 1 ium salt type, alkali phenethyl type, Cyanine type, 3-substituted coumarin type, 3,4-substituted coumarin type, cyanine type, acridine type, thiazine type, phenothiazine type, anthracene type, hexabenzobenzene type, Benzoanthracene type, perylene type, ketocoumarin type, fumarine type, borate type, etc. It may be used alone or in a combination of two or more. As a light-sensitive dye of borate type; those who can be reminded are, for example, Japanese Laid-Open Patent Publication No. 241 338/1 993, Japanese Laid-Open Patent Publication No. 5685/1995 (= US Patent No. 5,498,641), and Japanese Laid-Open Patent Publication No. No. 225474/1995 (= US Patent No. 5,498,641), etc., such a formulation ratio of the photosensitizer may be about 0.1-20% by weight (solid content) in the resin composition forming the coating film. It is preferably in the range of about 0.2-10% by weight. For the resin composition forming the visible light-sensitive resin coating film layer (A-1); a saturated resin may be blended if necessary. The saturated resin is used to control the solubility of the resin composition (for alkaline developing solution of photoresist coating film, please read the note on the back first)

會 訂 線 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 叫3294 A7 _______Β7_________ 五、發明說明(6 ) 溶解度;或例如對於用於除去光固化塗膜之強鹼溶液之溶 解度),並且含有例如聚酯樹脂、醇酸樹脂、(甲基)丙烯 酸樹脂、乙烯基樹脂、環氧樹脂、酚樹脂、天然樹脂、合 成橡膠、矽樹脂、氟樹脂、聚氨基甲酸酯樹脂等。此等樹 脂可以單獨或以二或多種合倂使用。 該樹脂組成物可以溶解或擴散於例如有機溶劑、水或其 混合物之溶劑中而塗於基質表面。作爲有機溶劑之可列示 者,例如,酮類、酯類、醚類、溶纖劑類、芳香烴類、醇 * 類、鹵化烴類等。’ 該被溶解於或擴散於溶劑中之樹脂組成物可用諸如滾輪 :滾塗器、旋塗器、幕滾塗器、噴塗、靜電塗覆、浸塗、 絲印、旋塗等方法塗覆。然後將已形成之塗膜視需要靜置 後,乾燥於例如約爲50至約130°C之溫度使獲得負型可 見光-敏感性樹脂塗膜層(A-1)。 •一種水性負型可見光敏感性樹脂組成物,可以獲自於 溶解或擴散上述負型可見光敏感性樹脂組成物。 負型可見光敏感性樹脂組成物之水溶解或水擴散可以進 行於用鹼(中和劑)中和在可見光可固化之樹脂中之可陰離 子化基(例如羧基);或用酸(中和劑)中和在可見光可固化 之樹脂組成物中之可陽離子化基(例如胺基)。 .除上述外,已知可用水顯影之可見光可固化樹脂組成物 作爲負型可見光敏感性樹脂組成物。作爲如此之物質,其 可列示者例如一種以引入可見光可固之不飽和基與離子形 成基至一種線性酚型環氧樹脂而製成水性樹脂。該水性樹 本紙張尺度適用申國國家標準(CNS)A4規格(210 X 297公釐) ' (請先閱讀背面之注意事項再填寫本頁) 禱The thread size of this paper is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) called 3294 A7 _______ Β7 _________ V. Description of the invention (6) Solubility; or for example, for the removal of the strong alkali solution of the light-cured coating film Solubility) and contains, for example, polyester resin, alkyd resin, (meth) acrylic resin, vinyl resin, epoxy resin, phenol resin, natural resin, synthetic rubber, silicone resin, fluororesin, polyurethane resin Wait. These resins may be used alone or in a combination of two or more. The resin composition can be dissolved or diffused in a solvent such as an organic solvent, water, or a mixture thereof, and applied to the surface of a substrate. As the organic solvent, for example, ketones, esters, ethers, cellosolves, aromatic hydrocarbons, alcohols *, halogenated hydrocarbons, and the like can be listed. ’The resin composition dissolved or diffused in the solvent can be applied by methods such as rollers: roll coater, spin coater, curtain roll coater, spray coating, electrostatic coating, dip coating, screen printing, spin coating and the like. The formed coating film is then allowed to stand as necessary, and then dried at a temperature of, for example, about 50 to about 130 ° C to obtain a negative visible light-sensitive resin coating film layer (A-1). • An aqueous negative visible light-sensitive resin composition obtained by dissolving or diffusing the above-mentioned negative visible light-sensitive resin composition. Water dissolution or water diffusion of the negative visible light sensitive resin composition can be performed by neutralizing an anionizable group (such as a carboxyl group) in a visible light curable resin with an alkali (neutralizing agent); or using an acid (neutralizing agent) ) Neutralize cationizable groups (such as amine groups) in visible light curable resin compositions. In addition to the above, a visible-light curable resin composition which can be developed with water is known as a negative visible-light-sensitive resin composition. As such a substance, it is possible to list, for example, an aqueous resin made by introducing an unsaturated group and an ion-forming group that are settable under visible light to a linear phenol type epoxy resin. The paper size of this water-based tree applies to the national standard of China (CNS) A4 (210 X 297 mm) '(Please read the precautions on the back before filling this page) Prayer

訂---------線I 經濟部智慧財產局員工消費合作社印製 483294 A7 B7___ 五、發明說明(7) 經濟部智慧財產局員工消費合作社印製 脂可以獲自於例如經由加入(甲基)丙烯酸線性酚型環氧樹 脂所具有之一部份環氧基上而使具有光可聚合性質,並且 經由使至少其他部份之環氧基與例如三級胺化合物反應, 形成水溶性之鐵鹽基。如此所得水性樹脂曝於可見光之部 份被固化而成非水溶性5而未曝於可見光之部份則被水顯 影而除去。再者,在水顯影之後,塗膜可以經由加熱(例 如在約140-200°C經過10-30分鐘)將留存於已固化之塗膜 內之可離子化基揮發而成爲疏水性。因此可以形成一種塗 膜,有優異抗阻性而不具親水基(羧基、胺基等)或其鹽類 (與顯影溶液所成之鹽),在塗膜中具有由上述鹼可顯影且 爲酸可顯影之光敏感性組成物所形成之抗阻性塗膜。此外 ,除了線性酚型環氧樹脂之外,也可以用一種水性聚合物 ,.其爲獲自於與上述相同之情形,使(甲基)丙烯酸和例如 三級胺反應於由含環氧基而可用自由基聚合之不飽和單體 ,其爲例如(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸 3,4-環氧基環己基烷酯、乙烯基縮水甘油基醚等所成之均 聚物;或於此等單體中之一種以上與另一種可用自由基聚 合之不飽和單體(例如,具有1-24個碳原子之(甲基)丙烯 酸烷酯或環烷酯,可用自由基聚合之不飽和芳族化合物等) 所成之共聚物上。 負型可見光-敏感性樹脂塗膜層(A-1)之顯影,如果形成 塗膜層之負型可見光-敏感性樹脂組成物爲可陰離子化者, 則用鹼性顯影溶液;如果是可陽離子化者,則利用酸性顯影 溶液。如果樹脂本身爲水溶性(例如上述含鐵鹽基之樹脂 冬 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 483294 A7 B7 五、發明說明(8) 基)則可進行水顯影。 負型可見光-敏感性樹脂塗膜層(A-1)本身可爲導電性或 絕緣性。所以,可以依需要於可見光-敏感性樹脂組成物 中配入一種導電性材料(已知之導電性顏料,例如,各種 金屬,其一種以上之合金以及其氧化物,其如銀、銅、鐵 、錳、鎳、鋁、鈷、鉻、鉛、鋅、鉍,ITO(氧化銦錫)等; 表面塗覆或蒸鍍以此等導電性材料之絕緣材料等)或絕緣 材料(塑膠細粉、絕緣無機粉料等),以求產生該塗膜之導 電性或絕緣性。絕緣塗膜較佳爲最後所形成之塗膜通常有 超過109Ω · cm(歐姆•厘米)之體積固有電阻(Volume intrinsic resistance)者,特別是在 101()Ω · cm-1018 Ω · cm之範圍內。另一方面,導電性塗膜較佳爲最後所 形成之塗膜通常具有小於1〇9Ω · cm之體積內在電阻者, 特別是在1Ω · cm-108Q · cm之範圍內。 經濟部智慧財產局員工消費合作社印製 .另一方面,作爲形成正型可見光-敏感性樹脂塗膜層 (A-1)之樹脂組成物,可以採用一種含有例如光酸產生劑 成分、樹脂成分和光敏感劑等形成塗膜之組成物。作爲該 樹脂成分者可以採用一種形成塗膜之樹脂,其物性諸如極 性、分子量等因樹脂成分之分解而改變,其爲因可見光之 照射而由光酸產生劑成分所產生之酸所造成,結果呈現對 於諸如鹼或酸之水性顯影溶液、水顯影溶液、有機溶劑顯 影溶液等顯影液之溶解度。再者,在該樹脂組成以外之樹 脂,其爲用於調整顯影溶液溶解度者,可以依需要另爲配 用。 -10- &張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) A7Order --------- Line I Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 483294 A7 B7___ V. Description of the Invention (7) The grease printed by the Consumers’ Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs may be obtained, for example, by joining (Meth) acrylic novolac epoxy resin has a part of epoxy groups to have photopolymerizable properties, and at least other parts of the epoxy group react with, for example, a tertiary amine compound to form a water-soluble Iron base of sex. The portion of the aqueous resin thus obtained exposed to visible light is cured to become water-insoluble5, while the portion not exposed to visible light is developed by water and removed. Furthermore, after water development, the coating film can be made hydrophobic by heating (for example, 10-30 minutes at about 140-200 ° C) to volatilize the ionizable groups remaining in the cured coating film. Therefore, a coating film can be formed, which has excellent resistance without hydrophilic groups (carboxyl group, amine group, etc.) or its salts (salts formed with a developing solution). The coating film can be developed by the above-mentioned alkali and is acidic. A resistive coating film formed from a developable light-sensitive composition. In addition, in addition to the novolac epoxy resin, an aqueous polymer may also be used. It is obtained from the same situation as described above, and reacts (meth) acrylic acid and, for example, a tertiary amine with an epoxy-containing group. The unsaturated monomers that can be polymerized by radicals are, for example, glycidyl (meth) acrylate, 3,4-epoxycyclohexyl alkyl (meth) acrylate, vinyl glycidyl ether, and the like. Homopolymer; or one or more of these monomers and another unsaturated monomer which can be radically polymerizable (eg, alkyl (meth) acrylate or naphthenate having 1 to 24 carbon atoms, available Free-radically polymerized unsaturated aromatic compounds, etc.) on copolymers. For the development of the negative visible light-sensitive resin coating film layer (A-1), if the negative visible light-sensitive resin composition forming the coating film layer is anionizable, use an alkaline developing solution; if it is cationic Transformers use an acidic developing solution. If the resin itself is water-soluble (for example, the above-mentioned iron salt-based resin winter paper size applies Chinese National Standard (CNS) A4 specification (210 X 297 mm) 483294 A7 B7 5. Invention description (8))) Water develops. The negative visible light-sensitive resin coating layer (A-1) itself may be conductive or insulating. Therefore, a conductive material (known conductive pigments such as various metals, one or more alloys and oxides thereof such as silver, copper, iron, Manganese, nickel, aluminum, cobalt, chromium, lead, zinc, bismuth, ITO (indium tin oxide), etc .; insulation materials such as surface coating or vapor deposition of such conductive materials) or insulation materials (plastic fine powder, insulation Inorganic powder, etc.) in order to produce the electrical conductivity or insulation of the coating film. The insulating coating film is preferably one whose last coating film usually has a volume intrinsic resistance exceeding 109Ω · cm (ohm · cm), especially in the range of 101 () Ω · cm-1018 Ω · cm Inside. On the other hand, the conductive coating film is preferably a coating film formed at the end which generally has a volume internal resistance of less than 109 Ω · cm, especially in the range of 1 Ω · cm-108Q · cm. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. On the other hand, as a resin composition forming a positive visible light-sensitive resin coating layer (A-1), a resin composition containing, for example, a photoacid generator component and a resin component can be used A composition that forms a coating film with a photosensitizer. As the resin component, a coating film-forming resin can be used, and its physical properties such as polarity and molecular weight are changed due to the decomposition of the resin component, which is caused by the acid generated by the photoacid generator component due to the irradiation of visible light. As a result, It exhibits solubility to a developing solution such as an aqueous or alkaline developing solution, an aqueous developing solution, an organic solvent developing solution, and the like. In addition, resins other than the resin composition are used for adjusting the solubility of the developing solution, and can be used as needed. -10- & Zhang scale applies Chinese National Standard (CNS) A4 specification (210 X 297 mm) A7

1、發明說明(9) 作爲用於正型可見光-敏感性樹脂組成物之樹脂成分, 可以列示作爲代表者,例如含有以磺酸酯鍵爲中介而鍵結 醌二疊氮磺酸至如具有離子形成基之丙烯酸樹脂等基本樹 聘上之一種組成物(參見日本公開專利公告第206293/1986 號,日本公開專利公告第1 33449 / 1 995 (=美國專利第 5,624,78 1號)等),亦即,以萘醌二疊氮對光化能射線-敏感之組合物,應用以可見光照射醌二疊氮基之光分解, 藉由烯酮形成茚羧酸之反應;一種正型光化能射線敏感性 之組成物,應用一種機構,其爲加熱於不溶於鹼顯影溶液 或酸顯影溶液之已交聯塗膜,且經可見光照射部份,因可 見光照射而由光酸產生劑所產生之酸剪斷已交聯之結構, 經濟部智慧財產局員工消費合作社印製 變成可溶於鹼顯影溶液或酸顯影溶液(參見日本公開專利 公告第295064/ 1 994,日本公開專利公告第308733 / 1 994 號,日本公開專利公告第313134/ 1 994號(=美國專利第 5,527,656號和第5,702,872號),日本公開專利公告第 3 1 3 1 36/ 1 994 號(=美國專利第 5,527,656 號和 5,702,872 號),日本公開專利公告第146552/ 1 995號等。作爲上述 正型可見光敏感樹脂,載於上述各項公告,其內容視同在 此之詳細說明。 光酸產生劑是一種化合物,在曝於光線時產生酸,所產 生之酸催化樹脂之分解。已知可用而可以特別列示之化合 物,例如,諸如毓鹽、銨鹽、鱗鹽、碘鐵鹽、硒鹽、鐵-巧二烯錯合物、釕-丙二烯錯合物、矽烷醇-金屬螯合物錯 合物、三嗪化合物、二疊氮萘醌化合物、磺酸酯、磺酸醯 -11 - 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ^294i、發明說明( A7 B7 經濟部智慧財產局員工消費合作社印製 亞胺酯、鹵素型化合物等。除上述者外,-於日本公開專利 公告第1 46552 / 1 995號和日本公開專利公告第 23773 1 / 1 999號者也可以使用。此等光酸產生劑成分,可 以與上述之樹脂成爲混合物之形式,或鍵結至樹脂本身。 光酸產生劑成分之配用比例較佳爲每100重量份樹脂成分 大約在0 · 1 -約40重量份,特別是約在〇 . 2 -約20重量份 之範圍內。 作爲光敏感劑之已知光敏感染料,其可採用並可特別予 以列示者,例如,噻咕噸型、咕噸型、酮型、硫派林思 (Thiopyrilium)鹽型、酸性苯乙烯基型、部花青型、;^取 代香豆素型、3,4-取代之香豆素型、花青型、吖啶型、噻 嗪型、吩噻嗪型、蒽型、六苯並苯型、苯並蒽型、二萘嵌 苯型、酮香豆素型、富馬鹼型、硼酸鹽型等。其間可以單 獨或以二或多種合倂使用。作爲硼酸鹽型光敏感染料而可 列示者,其如載於日本公開專利公告第24 1 338 / 1 993號, 曰本公開專利公告第5685 / 1 995號(=美國專利第 5,498,641號),日本公開專利公告第225474/ 1 995號(= 美國專利第5,498,641號)等。如此之光敏感劑之配用比 例爲上述形成塗膜之樹脂組成物之約H 20重量%,較佳 約爲0 . 2 -1 0重量%之範圍內(固含量)。 該樹脂組成物可以在例如有機溶劑、水或於其混合物溶 劑中予以溶解或擴散而塗覆於基質之表面上。作爲有機溶 劑而可列示者,例如,酮類、酯類、醚類、溶纖劑類、芳 香烴類、醇類、鹵化烴類等。 -12- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 請 先 閱 讀 背 面 之 注 意 事 項 再j1. Description of the invention (9) As the resin component used in the positive visible light-sensitive resin composition, it can be listed as a representative, for example, containing a sulfonate bond as an intermediate and a quinonediazidesulfonic acid bonded to such as A composition employed by basic trees such as acrylic resins having ion-forming groups (see Japanese Laid-Open Patent Publication No. 206293/1986, Japanese Laid-Open Patent Publication No. 1 33449/1 995 (= US Patent No. 5,624,78 No. 1), etc. ), That is, a composition that is sensitive to actinic energy rays with naphthoquinonediazide, and the photodecomposition of quinonediazide group with visible light, and the reaction of indenecarboxylic acid by enone; A chemical energy ray-sensitive composition uses a mechanism that is a cross-linked coating film that is heated insoluble in an alkali developing solution or an acid developing solution, and is exposed to visible light and is exposed to a photoacid generator due to visible light. The generated acid cuts off the cross-linked structure, which is printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs to become soluble in an alkali developing solution or an acid developing solution (see Japanese Laid-Open Patent Publication No. 295064/1994), published in Japan Patent Publication No. 308733/1 994, Japanese Laid-Open Patent Publication No. 313134/1 994 (= US Patent Nos. 5,527,656 and 5,702,872), Japanese Laid-Open Patent Publication No. 3 1 3 1 36/1 994 (= US Patent Nos. 5,527,656 and 5,702,872), Japanese Laid-Open Patent Publication No. 146552/1995, etc. As the above-mentioned positive visible light-sensitive resin, it is contained in the above-mentioned bulletins, and its contents are deemed to be described in detail herein. The photoacid generator is A compound that produces an acid when exposed to light, and the acid produced catalyzes the decomposition of the resin. Compounds that are known to be useful and can be specifically listed, such as, for example, salt, ammonium, scale, iodine, selenium, Iron-compound diene complex, ruthenium-propadiene complex, silanol-metal chelate complex, triazine compound, diazonaphthoquinone compound, sulfonate, sulfonium sulfonate-11- This paper size applies to China National Standard (CNS) A4 specification (210 X 297 mm) ^ 294i, description of invention (A7 B7 imide esters, halogen compounds, etc. printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, etc.) , -Yu Japanese Patent Publication No. 1 46552/1 995 and Japanese Patent Publication No. 23737 1/1 999 can also be used. These photoacid generator components can be in the form of a mixture with the above resin or bonded to the resin. In itself, the compounding ratio of the photoacid generator component is preferably about 0.1 to about 40 parts by weight per 100 parts by weight of the resin component, particularly in the range of about 0.2 to about 20 parts by weight. As light sensitive Known light-sensitive dyes for agents, which can be used and specifically listed, for example, thioxanthan type, glutton type, ketone type, Thiopirilium salt type, acidic styryl type, Cyanine type, ^ substituted coumarin type, 3,4-substituted coumarin type, cyanine type, acridine type, thiazine type, phenothiazine type, anthracene type, hexabenzobenzene type, benzene Benzoanthracene type, perylene type, ketocoumarin type, fumarine type, borate type, etc. It can be used alone or in a combination of two or more. As a borate-type light-sensitive dye that can be listed, it is listed in Japanese Laid-open Patent Publication No. 24 1 338/1 993, and Japanese Laid-Open Patent Publication No. 5685/1995 (= US Patent No. 5,498,641). ), Japanese Published Patent Publication No. 225474-1 / 995 (= US Patent No. 5,498,641), etc. The proportion of such a photosensitizer is about 20% by weight, preferably about 0.2 to 10% by weight (solid content) of the above-mentioned coating film-forming resin composition. The resin composition can be applied to the surface of a substrate by dissolving or diffusing in an organic solvent, water, or a mixture thereof, for example. Examples of the organic solvent include ketones, esters, ethers, cellulolytic agents, aromatic hydrocarbons, alcohols, and halogenated hydrocarbons. -12- The size of this paper applies to the Chinese National Standard (CNS) A4 (210 X 297 mm). Please read the notes on the back first before j

f裝 頁I 一 I I I訂 、‘良 m 483294 A7 B7 五、發明說明(19 該被溶解或擴散於溶劑中之樹脂組成物可以用例如滾輪 、滾塗器、旋塗器、幕滾塗器、噴塗、靜電塗覆、浸塗、 絲茚、旋塗等方法予以塗覆。然後將所成塗膜,依需要靜 置後,在例如約爲50-約13(TC之溫度乾燥而獲得正型可 厚光=敏感性樹脂塗膜層(A - 2 )。 .一種水性正型可見光-敏感性樹脂組成物可以獲自於以 上述正型可見光-敏感性樹脂組成物溶解或擴散於水中。 正型可見光-敏感性樹脂組成物之水溶或水擴散作用可 以進行於用鹼(中和劑)中和在樹脂中可陰離子化之基(例 如羧基),或用酸(中和劑)中和在樹脂中可陽離子化之基 (例如胺基)。 正型可見光-敏感性樹脂塗膜層之顯影,倘若形成塗膜 層之正型可見光-敏感性樹脂組成物是可陰離子化者,則 用鹼顯影溶液;倘若可陽離子化者,則用酸顯影溶液。假 設樹脂本身爲水溶性(例如含鐵鹽基之樹脂),則可以進行 水顯影。 經濟部智慧財產局員工消費合作社印制取 正型可見光-敏感性樹脂塗膜層(A-2)本身可爲導電性或 絕緣性。因此,若有需要,在可見光-敏感性樹脂組成物中 可以配入導電材料(已知之導電顏料,例如,各種金屬, 其一種以上之合金,與其氧化物,諸如銀、銅、鐵、錳、 鎳、鋁、鈷、鉻、鉛、鋅、鉍、ITO等,在絕緣材料表面 塗覆或蒸鍍以導電材料等等),或絕緣材料(塑膠細粉、絕 緣性無機粉末等),以求使該塗膜產生導電性或絕緣。絕 緣塗膜較佳爲使最後形成塗膜之體積固有電阻通常超過 -13- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) A7 ^_____B7______ S、發明說明(12) 109Ω · cm,特別是在 1(ν°Ω · cm-1018Q · cm 之範圍內。 另一方面,導電塗膜較佳爲使最後所成塗膜之體積固有電 阻通常爲小於109Ω · cm,特別是在1Ω · cm-108Q · cm 之範圍內。 上述負型或正型可見光-敏感性樹脂塗膜層(A)之厚度, 無嚴格限制,但可依最後之積層體之用途等作適當之選擇 ,而較佳一般在約1微米-約5微米之範圍內,特別是約 2微米-約500微米。 在本發明積層體中所用之可見光透射片層(B),可用已 知之產品而對其材料等無特別限制,只要樹脂片至少透射 約90%所照射之可見光,較佳約爲99%以上。可用片材之 構成聚合物,例如,聚乙二醇對苯二酸酯、聚氯乙烯、聚 乙酸乙烯酯、聚乙烯醇縮丁醛,纖維素型、聚氨基甲酸 酯、聚丙烯酸酯、芳醯胺、Capt on、聚甲基戊烯、聚乙 烯、聚丙烯等。特別是採用聚乙二醇對苯二酸酯片爲佳。 片層(B)之厚度較佳通常約爲10微米-約5微米,特別是 約15微米-約500微米之範圍內。 用於本發明積層體中遮蔽可見光而對能量射線敏感之塗 膜層(C),是形成於片層(B)之表面上而成爲最上面的一層 ,其設置使光化能量射線從該塗膜層(C)之上層表面照射 於本發明積層體,然後顯影形成圖樣於塗膜層(C)中,然 後可見光從有圖紋之塗膜層(C)之表面照射,而對應於塗 膜層(C)中所成之圖紋之正型或負型圖紋,因塗膜層(C)遮 蔽(吸收及/或反射)可見光,而至於可見光-敏感性之樹 -14- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項寫本頁)f Binding page I-III order, 'Good m 483294 A7 B7 V. Description of the invention (19 The resin composition which is dissolved or diffused in the solvent can be used, for example, roller, roll coater, spin coater, curtain roll coater, Apply by spraying, electrostatic coating, dip coating, silk indigo, spin coating, etc. Then, after forming the coating film as required, leave it at a temperature of about 50 to about 13 ° C to obtain a positive type. Thick light = sensitive resin coating film layer (A-2). An aqueous positive visible light-sensitive resin composition can be obtained by dissolving or diffusing in the positive visible light-sensitive resin composition described above. The water-soluble or water-diffusing effect of the visible light-sensitive resin composition of the type can be performed by neutralizing an anionizable group (such as a carboxyl group) in the resin with a base (neutralizing agent), or neutralizing the acid (neutralizing agent) with A cationizable group (such as an amine group) in the resin. Development of the positive visible light-sensitive resin coating film layer. If the positive visible light-sensitive resin composition forming the coating film layer is an anionizable, use an alkali Developing solution; if it can be cationized, Use an acid to develop the solution. Assuming that the resin itself is water-soluble (such as iron-based resins), water development can be performed. The consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs printed a positive visible-sensitive resin coating layer (A -2) itself may be conductive or insulating. Therefore, if necessary, a conductive material (known conductive pigments, for example, various metals, more than one alloy thereof, and the like) may be blended in the visible-sensitive resin composition. Oxides, such as silver, copper, iron, manganese, nickel, aluminum, cobalt, chromium, lead, zinc, bismuth, ITO, etc., coated or vapor-deposited with conductive materials on the surface of insulating materials, or insulating materials (plastics Fine powder, insulating inorganic powder, etc.), in order to make the coating film conductive or insulating. The insulating coating film is preferably such that the volume inherent resistance of the final coating film usually exceeds -13- This paper applies Chinese national standards ( CNS) A4 specification (210 X 297 mm) A7 ^ _____ B7______ S. Invention description (12) 109Ω · cm, especially in the range of 1 (ν ° Ω · cm-1018Q · cm. On the other hand, the conductive coating film Compare In order to make the volume inherent resistance of the final coating film generally smaller than 109Ω · cm, especially in the range of 1Ω · cm-108Q · cm. Among the above-mentioned negative or positive visible light-sensitive resin coating film layers (A), The thickness is not strictly limited, but may be appropriately selected according to the purpose of the final laminated body, etc., and is preferably generally in the range of about 1 micrometer to about 5 micrometers, especially about 2 micrometers to about 500 micrometers. In the present invention The visible light transmitting sheet (B) used in the laminated body can be a known product without any particular limitation on its material, as long as the resin sheet transmits at least about 90% of the visible light irradiated, preferably about 99% or more. Available sheets Constituent polymers such as polyethylene glycol terephthalate, polyvinyl chloride, polyvinyl acetate, polyvinyl butyral, cellulose type, polyurethane, polyacrylate, aramide , Capt on, polymethylpentene, polyethylene, polypropylene, etc. Especially polyethylene glycol terephthalate tablets are preferred. The thickness of the sheet layer (B) is preferably usually in the range of about 10 m to about 5 m, especially in the range of about 15 m to about 500 m. The coating film layer (C) used in the laminated body of the present invention to shield visible light and is sensitive to energy rays is formed on the surface of the sheet layer (B) and becomes the uppermost layer. The surface of the upper layer of the film layer (C) is irradiated to the laminated body of the present invention, and then developed to form a pattern in the coating film layer (C), and then visible light is irradiated from the surface of the patterned coating film layer (C), corresponding to the coating film. The positive or negative pattern of the pattern formed in layer (C) is because the coating layer (C) blocks (absorbs and / or reflects) visible light, and the visible light-sensitive tree-14- This paper scale Applicable to China National Standard (CNS) A4 specification (210 X 297 mm) (Please read the precautions on the back first and write this page)

經濟部智慧財產局員工消費合作社印製 483294 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明(13) 脂塗膜層(A )於底層。 •能量射線-敏感性塗膜層(C),是以遮蔽(吸收及/或反 射)該上述塗膜層(C)上層表面所照射之可見光射線之一層 ,扮演一種角色,防止因可見光照射塗膜層(A)之較低層 免生實質變化(固化或分解)之角色;同時,因爲塗膜層 (C)本身在諸如水、有機溶劑、鹼、酸等處理溶液之中因 受光化能射線照射而變成可落性或可擴散性,可以形成塗 膜層所需之圖紋於其上·,或是因爲塗膜層(C)本身在諸如 水、有機溶劑、鹼、酸等處理溶液中,受光化能射線照射 而變成非可溶性或非可擴散性,可以形成塗膜層(A)所需 之相同圖紋。 作爲能量射線-敏感性塗膜層(C),可以用含有吸收可見 光物質之產品,例如,可見光吸收劑、色料(著色顏料、 著色染料等)、塡料等於塗膜層中。 上述可見光吸收劑之可特別列示者,例如,諸如2,4-二羥苯二甲酮、2-羥-4-甲氧基二苯甲酮等二苯甲酮型; 諸如2-(2·-羥-5-甲基苯基)苯並三唑等之苯並三唑型; 草醯代苯胺型;氰基丙烯酸酯型等可見光吸收劑,以及載 於 Bedneret 等人,Far be+ Lacke, 89,840(1983); H.J. Hbller 等人,Pure and Applied Chem·,30,1 45 ( 1972 ); Ibid, 36, 141(1973); A. Valet, Farbet+Lacke, 96, 1 89( 1 990 )等之各種產品。 作爲上述著色劑而可列示者,例如,諸如氧化鈦、鋅白 、鉛白、鹼性硫酸鉛、硫酸鉛、鋅鋇白、硫化鋅、銻白等 -15- (請先閱讀背面之注意事項寫本頁) 雜 裝 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 483294 A7 B7 五、發明說明(Μ) 白色顏料;如碳黑、乙炔黑、燈黑、骨碳、石墨、鐵黑、 本fl女黑等黑色顏料;如萘酌黃S、漢撒黃1 〇 G、永久黃、 永久橙等橙色顏料;如氧化鐵紅、鉛紅、永久紅、喹吖啶 型紅色顏料等之紅顏料;如鈷紫之紫色顏料、錳紫、堅牢 紫B、甲基湖泊紫等紫色顏料;如群青、普魯士藍、鈷 藍、天青藍、酞花青藍、堅牢天藍等藍色顏料;如鉻綠、 酞花青綠等綠色顏料。 作爲上述之塡料而可列示者,例如,氧化鋇粉、硫酸鋇 粉、碳酸鋇、石膏、黏土、矽土、白碳、矽藻土、滑石、 碳酸鎂、礬土白、雲母粉等。 所用可見光吸收劑、著色劑和塡料之配用比例,可依所 照射可見光之強度、能量射線-敏感性塗膜層(C )厚度等作 適當選擇,但通常可見光吸收劑可爲塗膜層(C)之0.01重 量%-50重量%,較佳在0.02重量%-30重量%之範圍內; 對於著色劑和塡料,則爲塗膜層(C)之0.5重量90重量 %,較佳爲1重量% - 5 0重量%。 作爲遮蔽可見光之能量射線-敏感性塗膜層(C ),也可用 含有反射可見光之反射劑(片狀金屬顏料等)。 經濟部智慧財產局員工消費合作社印製 作爲上述反射劑而可列示者,例如,諸如(片狀)鋁粉、 青銅粉、銅粉、錫粉、鉛粉、鋅粉、磷化鐵、珍珠狀金屬 塗覆雲母粉、雲母狀氧化鐵等金屬粉顏料和金屬光澤顏 料。· 所用反射劑之配合比例可依所照射可見光之強度,能量 射線-敏感性塗膜層(C)之厚度等作適當選擇,但通常可依 • -16- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱) 483294 實 A7 — _ B7______ 五、發明說明(15) 需要爲塗膜層(C)之0.5重量%-90重量%,較佳在1重量 %-50重量%之範圍內。 •上述可見光吸收劑和反射劑可以合倂使用。 形成能量射線-敏感性塗膜層(C )之樹脂可以是負型或正 型,而且所照射之可見光可以是任何可見光,各種可見光 、電子束或熱射線。 作爲負型或正型之可見光敏感型產品者,可以用與樹脂 組成物類似之產物形成上述之塗膜層(A )。 此外,作爲負型和正型之可見光-敏感型產品者,可以 用前述樹脂組成物使形成上述塗膜層(A)。 經濟部智慧財產局員工消費合作社印製 一種熱射線-敏感性塗樹脂組成物,是一種含有以諸如 紅外線等熱射線而交聯或分解之樹脂之組成物。作爲該樹 脂組成物,可用之已知產品,其可列示者,例如,含羥基 之樹脂/胺基樹脂之結合物,含羥基之樹脂/嵌段異氰酸 酯之結合物,三聚腈醯胺樹脂、矽樹脂或丙烯酸樹脂)其 含可水解基(例如烷氧基甲矽烷基、羥甲矽烷基)者;環氧 樹脂/酚樹脂之結合物,環氧樹脂/羧酸(酐)之結合物, 環氧樹脂/聚胺之化合物,不飽和樹脂/自由基聚合觸媒 (例如過氧化物)之結合物,含羧基及/或羥基與醚鍵等之 烯烴不飽和化合物。再者,可以配入一種熱酸產生劑(例 如,與上述光酸產生劑相同者)而用作正型。 該形成能量射線-敏感性塗膜層(C)之樹脂組成物可以溶 解或擴散於例如有機溶劑、水或其混合物而塗於片層(B) 之表面上。 -17- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ^ " 483294 A7 ____ B7 ""' — —一· ________ 五、發明說明(16) 作爲上述之有機溶劑者,其可列示者,例如,酮類、酯 類、醚類、纖維素、芳族烴、醇類、鹵化烴等,且該樹脂 組成物之塗覆可以進行於例如用諸如滾輪、滾塗器、旋塗 器、幕滾塗器、噴塗、靜電塗覆、浸塗、絲印、旋塗等方 法。視需要靜置之後,在例如約50-約130°C之溫度乾燥 後,可得能量射線敏感性之塗膜層(C)。 能量射線-敏感性塗膜層(C)之厚度較佳通常在約1微 米-約500微米,特別在約2微米-約100微米,之範圍 內。 在如此所形成之積層體之能量射線-敏感性塗膜層(C)之 表面上,可以視需要設一面塗層。面塗層是藉由攔截空氣 中之氧以防氧對因曝於射線而產生自由基之鈍化,並順利 進行因曝於射線以使光敏性材料之固化。 經濟部智慧財產局員工消費合作社印製 如此之面塗層可以形成於例如用如聚乙二醇對苯二酸酯 等之聚酯,丙烯酸樹脂,聚乙烯,和聚氯乙烯樹脂等之樹 脂族(厚度約1-約70微米)覆蓋積層體之表面;或用諸如 聚乙烯醇,局部皂化之聚乙酸乙烯酯,聚乙烯醇/乙酸乙 烯酯之共聚物,部份皂化之聚乙酸乙烯酯/乙酸乙烯酯共 聚物,聚乙稀.基吡咯烷酮,諸如普魯能(Pullulan)等之水 聲性多醣聚合物,丙烯酸樹脂,聚酯樹脂,乙烯基樹脂, 環氧樹脂等之含鹼基、酸基或鹽基者等水性樹脂之水溶液 或水擴散液,予以塗覆(乾膜厚度:約0.5-約5微米)。 本發明用於形成圖樣之積層體,可以製自例如如下方法 1 - 4中之任一種。 -18- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 483294 A7 B7_ 五、發明說明(17) 1 . 一種在基質表面上形成負型或正型可見光-敏感性樹 脂塗膜層(A),然後形成一可見光-透射之片層(B),並另 層積一遮蔽可見光之能量射線-敏感性塗膜層(C)之方法: 塗膜層(A)可以形成於塗覆或層積上述樹脂組成物於基 質表面上;或用一製自該樹脂組成物之塗膜,經過光敏性 或熱敏性黏著劑(接著劑)層之中介而黏著於基質上,使形 成塗膜層(A)。片層(B)可以用熱層積上述片材於塗膜層(A) 之表面上;或經由'壓敏感性或熱敏感性黏著劑(接著劑)層 之中介而黏貼該層至塗膜層(A)上而形成。另外,能量射 線-敏感性塗膜層(C)可以用塗覆或層積樹脂組成物而在片 層(B)表面之上層積,形成能能量射線-敏感性塗膜層(C); 或經由光敏感性或熱敏感性黏著劑(接著劑)層作中介而黏 貼製自該樹脂組成物之薄膜至片層(B)上而形成。 2 · —種在基質表面上形成負型或正型可見光-敏感性樹 脂塗膜層(A),然後層積一預先形成之2層積層體,包括 一可見光-透射片層(B)和一遮蔽可見光之能量射線-敏感 性塗膜層(C)於該塗膜(A)之表面上,使該片層(B)側之表 面與上述塗膜層接觸之方法: 經濟部智慧財產局員工消費合作社印製 塗膜層(A)可以用與上述方法1相同之情形形成於基質 表面上。設於塗膜層(A)上之2層積層體可以獲自於在片 層(B)塗覆或層積一種樹脂組成物以形成能量射線-敏感性 之塗膜層(C);或經由光敏感性或熱敏感性黏著(接著)層 作中介而黏著製自該樹脂組成物之膜。另外,該積層體之 片層(B)側表面與塗膜層(A)之層合可進行於例如熱積層法 -19- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) B7 五、發明說明(18) 或用壓感或熱感黏著劑(接著劑)層之方法。 3. —種在基質表面上層積、預先形成之3層積層物,其 爲負型或正型可見光-敏感性之樹脂塗膜層(A),可見光-透射之片層(B)和遮蔽可見光而爲能量射線-敏感性之塗膜 層(C),使塗膜層(A)側表面與基質表面接觸之方法: 該負型或正型可見光-敏感性樹脂塗膜層(A),可見光-透射片層(B )和遮蔽可見光之能量射線-敏感性塗膜層(C) 等之3層積層體可以製自例如用塗覆樹脂組成物使形成塗 膜層(A)至片層(B)之表面,然後依需要乾燥之後,塗覆樹 月旨組成物使形成塗膜層(C)至片層(B)之其他表面上(塗覆 塗膜層(A)與塗膜層(C)之次序可被互換)。另外,該3層 積層體之塗膜層(A )側在基質表面上之積層可以進行於例 如熱層積之方法。 4. 一種在基質表面上積層一預先形成之2層積層體,包 括一負型或正型之可見光-敏感性樹脂塗膜層(A)和可見光 -透射片層(B),使該塗膜層(A)側之表面與基質表面接觸; 然後形成遮蔽可見光之能量射線-敏感性塗膜層(C)如上述 於所得3層積層體之片層(B)側表面上之方法: 經濟部智慧財產局員工消費合作社印製 負型或正型之可見光-敏感性樹脂塗膜層(A)和可見光-透射之片層(B)兩者之2層積層體,可以獲自於例如塗覆 樹脂組成物使形成塗膜層(A)至片層(B)之一表面上。該2 層積層體之塗膜層(A)側至基質表面上之層合,可以進行 於例如用熱積層之方法。另外,塗膜層(C)之形成,可以 進行於用塗覆或積層一種樹脂組成物,使形成該塗膜層; -20- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 483294 經濟部智慧財產局員工消費合作社印製 A7 ___B7五、發明說明(19 ) 或用該樹脂組成物所製成之塗膜,經由光敏感性或熱敏感 性黏著劑(接著劑)層作爲中介而黏著。 利用如上述本發明積層體以使圖樣形成,可以進行於例 如包含下列各步驟之方法: (i )經過阻罩之中介或直接依圖案照射光化能量射線至 積層體之能量射線-敏感性塗膜層(C)上, (ii) 經過塗膜層(C)之顯影,除去能量射線-敏感性塗膜 層(C)之已照射或未照射之部位,使形成光阻圖案之塗膜, (iii) 然後,用可見光照射於整個表面之後, (iv) 從積層體之可見光-敏感性樹脂塗膜層(A),除去可 見光·透射片層(B)和能量射線-敏感性塗膜層(C),使曝露 出可見光-敏感性樹脂塗膜層(A), (v) 然後,用顯影溶液顯現塗膜層(A)。 作爲照射光化能量射線所用之光源,其可列示者,例如 ,超高張力、高壓、中度張力和低張力之水銀燈,化學燈 、碳弧燈、氙燈、金屬鹵化物燈、鎢燈等,或雷射(括符 內數字表示振-曲線之波長),其如氫雷射( 488奈米), YAG-SHG雷射( 532奈米),UV雷射(35 1 - 364奈米)。作爲 熱射線源而可列示者,例如,半導體雷射( 830奈米), YAG雷射(1.06微米),紅外光等。 作爲可見光照射源而迄今所曾使用之光源,例如,超高 張力、高壓、中度張力或低張力之水銀燈、化學燈、碳弧 燈、氙燈、金屬鹵化燈、螢光燈、鎢燈、太陽光等,該等 光線首先通過一種紫外光截濾器;和具有在可見光區內之 -21- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) " (請先閱讀背面之注咅?事項再本頁)Printed by the Employees 'Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 483294 A7 B7 Printed by the Employees' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (13) The grease coating layer (A) is on the bottom layer. • Energy ray-sensitive coating film layer (C) is a layer that shields (absorbs and / or reflects) the visible light rays irradiated from the upper surface of the coating film layer (C), and plays a role to prevent the coating from being irradiated by visible light. The lower layer of the film layer (A) prevents the substantial change (curing or decomposing); at the same time, because the coating film layer (C) itself is affected by the photochemical energy in processing solutions such as water, organic solvents, alkalis, and acids It becomes fallable or diffusible when irradiated by radiation, and can form a pattern on the coating film layer, or because the coating film layer (C) itself is in a processing solution such as water, organic solvents, alkalis, acids, etc. In addition, it becomes non-soluble or non-diffusible when irradiated with actinic energy rays, and can form the same pattern required for the coating film layer (A). As the energy-ray-sensitive coating film layer (C), a product containing a substance that absorbs visible light can be used, for example, a visible light absorber, a colorant (coloring pigment, coloring dye, etc.), and a material equal to the coating film layer. Specific examples of the visible light absorbers mentioned above can be listed, for example, benzophenone types such as 2,4-dihydroxybenzophenone and 2-hydroxy-4-methoxybenzophenone; such as 2- (2 · -Hydroxy-5-methylphenyl) benzotriazole and other benzotriazole types; grass anilide type; cyanoacrylate type and other visible light absorbers; and contained in Bedneret et al., Far be + Lacke, 89, 840 (1983); HJ Hbller et al., Pure and Applied Chem., 30, 1 45 (1972); Ibid, 36, 141 (1973); A. Valet, Farbet + Lacke, 96, 1 89 (1 990 ) And other products. Can be listed as the above colorants, for example, such as titanium oxide, zinc white, lead white, basic lead sulfate, lead sulfate, zinc barium white, zinc sulfide, antimony white, etc.- (Please read the note on the back first Matters written on this page) Miscellaneous paper size applicable to China National Standard (CNS) A4 (210 X 297 mm) 483294 A7 B7 V. Description of the invention (M) White pigments; such as carbon black, acetylene black, lamp black, bone Carbon, graphite, iron black, female black and other black pigments; such as naphthalene yellow S, Hansa yellow 10G, permanent yellow, permanent orange and other orange pigments; such as iron oxide red, lead red, permanent red, quinac Red pigments such as pyridine-type red pigments; purple pigments such as cobalt violet purple pigments, manganese violet, fast violet B, methyl lake violet, etc .; such as ultramarine blue, Prussian blue, cobalt blue, sky blue, phthalocyanine blue, fast Blue pigments such as sky blue; green pigments such as chrome green and phthalocyanine green. As the above-mentioned materials, for example, barium oxide powder, barium sulfate powder, barium carbonate, gypsum, clay, silica, white carbon, diatomite, talc, magnesium carbonate, alumina white, mica powder, etc. . The proportion of the visible light absorber, colorant, and material used can be appropriately selected according to the intensity of the visible light to be irradiated, the thickness of the energy ray-sensitive coating layer (C), but usually the visible light absorber can be the coating layer (C) 0.01% to 50% by weight, preferably in the range of 0.02% to 30% by weight; for colorants and binders, 0.5% to 90% by weight of the coating layer (C), preferably It is 1% to 50% by weight. As the energy ray-sensitive coating film layer (C) that shields visible light, a reflective agent (a sheet-like metallic pigment, etc.) that reflects visible light can also be used. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs as the above-mentioned reflectors, for example, such as (flake) aluminum powder, bronze powder, copper powder, tin powder, lead powder, zinc powder, iron phosphide, pearl The metallic powder is coated with metallic powder pigments such as mica powder, mica-like iron oxide, and metallic gloss pigments. · The proportion of the reflecting agent used can be appropriately selected according to the intensity of the visible light to be irradiated, the thickness of the energy ray-sensitive coating layer (C), etc., but can generally be determined according to • -16- This paper size applies to Chinese national standards (CNS ) A4 specification (210 X 297 public love) 483294 Real A7 — _ B7______ 5. Description of the invention (15) It should be 0.5% to 90% by weight of the coating layer (C), preferably 1% to 50% by weight Within range. • The above visible light absorbers and reflectors can be used in combination. The resin forming the energy ray-sensitive coating film layer (C) may be a negative type or a positive type, and the visible light irradiated may be any visible light, various visible light, electron beams, or heat rays. As a negative-type or positive-type visible light-sensitive product, a product similar to the resin composition can be used to form the aforementioned coating film layer (A). In addition, as a negative-type and a positive-type visible-sensitive product, the aforementioned resin composition can be used to form the coating film layer (A). Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A heat ray-sensitive resin-coated composition is a composition containing a resin crosslinked or decomposed by heat rays such as infrared rays. As the resin composition, known products that can be used can be listed, for example, a combination of a hydroxyl-containing resin / amine-based resin, a combination of a hydroxyl-containing resin / block isocyanate, and a melamine resin , Silicone resin or acrylic resin) which contains hydrolyzable groups (such as alkoxysilyl, hydroxysilyl); epoxy resin / phenol resin combination, epoxy resin / carboxylic acid (anhydride) combination , Epoxy resin / polyamine compound, unsaturated resin / radical polymerization catalyst (such as peroxide) combination, olefin unsaturated compounds containing carboxyl group and / or hydroxyl group and ether bond. Furthermore, a thermal acid generator (for example, the same as the photoacid generator described above) can be blended and used as a positive type. The resin composition forming the energy-ray-sensitive coating film layer (C) can be dissolved or diffused in, for example, an organic solvent, water, or a mixture thereof, and applied to the surface of the sheet layer (B). -17- This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) ^ " 483294 A7 ____ B7 " " '— — 一 · ________ 5. Description of the invention (16) as the above organic Solvents can be listed, for example, ketones, esters, ethers, cellulose, aromatic hydrocarbons, alcohols, halogenated hydrocarbons, etc., and the coating of the resin composition can be performed, for example, with a roller, Roll coater, spin coater, curtain roll coater, spraying, electrostatic coating, dip coating, silk screen, spin coating and other methods. After standing as required, and drying at a temperature of, for example, about 50 to about 130 ° C, an energy-ray-sensitive coating film layer (C) can be obtained. The thickness of the energy ray-sensitive coating film layer (C) is preferably generally in the range of about 1 micrometer to about 500 micrometers, particularly about 2 micrometers to about 100 micrometers. A surface coating may be provided on the surface of the energy ray-sensitive coating film layer (C) of the laminated body thus formed. The top coat prevents the passivation of free radicals caused by exposure to radiation by intercepting the oxygen in the air, and smoothly performs the curing of the photosensitive material due to the exposure to radiation. The surface coatings printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs can be formed on resin families such as polyester, acrylic resin, polyethylene, and polyvinyl chloride resins such as polyethylene glycol terephthalate. (Thickness about 1 to about 70 microns) cover the surface of the laminate; or use materials such as polyvinyl alcohol, partially saponified polyvinyl acetate, polyvinyl alcohol / vinyl acetate copolymer, partially saponified polyvinyl acetate / Vinyl acetate copolymer, polyethylene. Pyrrolidone, hydroacoustic polysaccharide polymer such as Pullulan, acrylic resin, polyester resin, vinyl resin, epoxy resin, etc. Aqueous resin or aqueous solution of water-based resin or water-diffusion liquid is applied (dry film thickness: about 0.5 to about 5 microns). The laminated body for forming a pattern according to the present invention can be produced by, for example, any one of the following methods 1 to 4. -18- This paper size is in accordance with China National Standard (CNS) A4 (210 X 297 mm) 483294 A7 B7_ V. Description of the invention (17) 1. A negative or positive visible light-sensitive resin formed on the surface of the substrate Coating film layer (A), and then forming a visible light-transmitting sheet layer (B), and another method of laminating an energy ray-sensitive coating film layer (C) that shields visible light: The coating film layer (A) can be formed The resin composition is coated or laminated on the surface of the substrate; or a coating film made from the resin composition is adhered to the substrate through a layer of a photosensitive or heat-sensitive adhesive (adhesive) to form a film. Coating film layer (A). The sheet layer (B) can be laminated on the surface of the coating film layer (A) by thermal lamination; or the layer can be pasted to the coating film through an intermediary of a 'pressure-sensitive or heat-sensitive adhesive (adhesive) layer. Layer (A). In addition, the energy ray-sensitive coating film layer (C) may be laminated on the surface of the sheet layer (B) by coating or laminating a resin composition to form an energy ray-sensitive coating film layer (C); or It is formed by laminating the film of the resin composition to the sheet layer (B) through a light-sensitive or heat-sensitive adhesive (adhesive) layer as an intermediary. 2 · A kind of negative or positive visible light-sensitive resin coating film layer (A) is formed on the surface of the substrate, and then a pre-formed 2-layer laminate is formed, including a visible light-transmitting sheet layer (B) and a Method for shielding the visible ray energy ray-sensitive coating film layer (C) on the surface of the coating film (A) and bringing the surface of the film layer (B) side into contact with the coating film layer: Staff of the Intellectual Property Bureau of the Ministry of Economic Affairs The consumer cooperative print coat layer (A) can be formed on the surface of the substrate in the same manner as in the above method 1. The two-layer laminate provided on the coating layer (A) can be obtained by coating or laminating a resin composition on the sheet layer (B) to form an energy-ray-sensitive coating layer (C); or via A light-sensitive or heat-sensitive adhesive (adhesive) layer is used as an intermediary to adhere the film made from the resin composition. In addition, the lamination of the layer (B) side surface of the laminate and the coating film layer (A) can be performed, for example, in the thermal lamination method-19- This paper size is applicable to China National Standard (CNS) A4 (210 X 297) (B) B7 5. Description of the invention (18) Or a method of using a pressure-sensitive or heat-sensitive adhesive (adhesive) layer. 3.-A pre-formed 3-layer laminate laminated on the surface of the substrate, which is a negative or positive visible light-sensitive resin coating layer (A), a visible light-transmitting sheet (B), and a masking visible light The energy-ray-sensitive coating film layer (C) is a method for bringing the side surface of the coating film layer (A) into contact with the substrate surface: The negative or positive visible light-sensitive resin coating film layer (A), visible light -Transmissive sheet layer (B) and energy rays that shield visible light-Sensitive coating film layer (C) The three-layer laminated body can be produced, for example, by applying a resin composition to form a coating film layer (A) to a sheet layer ( The surface of B) is then dried as required, and then the tree-moon composition is applied to form a coating film layer (C) on the other surface of the sheet layer (B) (coating the coating film layer (A) and the coating film layer ( C) The order can be interchanged). In addition, the lamination of the coating layer (A) side of the three-layer laminate on the surface of the substrate can be performed by, for example, a thermal lamination method. 4. A pre-formed 2-layer laminate is laminated on the surface of a substrate, comprising a negative or positive visible light-sensitive resin coating film layer (A) and a visible light-transmitting sheet layer (B), so that the coating film The surface of the layer (A) is in contact with the surface of the substrate; then, an energy ray-sensitive coating film layer (C) that shields visible light is formed on the surface of the sheet (B) side of the obtained 3-layer laminate as described above: Ministry of Economic Affairs The Intellectual Property Bureau employee consumer cooperative prints a two-layer laminate of both a negative or positive visible light-sensitive resin coating film layer (A) and a visible light-transmitting sheet layer (B), which can be obtained, for example, from coating The resin composition forms a coating film layer (A) onto one surface of the sheet layer (B). The lamination of the coating layer (A) side of the two-layer laminated body to the surface of the substrate can be carried out by, for example, a method of thermal lamination. In addition, the coating film layer (C) can be formed by coating or laminating a resin composition to form the coating film layer; -20- This paper size is applicable to China National Standard (CNS) A4 (210 X 297) (Mm) 483294 Printed by A7 _B7 printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (19) or a coating film made of the resin composition, through a light-sensitive or heat-sensitive adhesive (adhesive) The layers act as intermediaries. The use of the layered body of the present invention as described above to form a pattern can be performed, for example, in a method including the following steps: (i) irradiating photochemical energy rays to the layered body through a mask intermediary or directly according to a pattern, the energy-ray-sensitive coating of the layered body On the film layer (C), (ii) After the development of the coating film layer (C), remove the irradiated or unirradiated parts of the energy ray-sensitive coating film layer (C), so as to form a coating film of a photoresist pattern, (iii) Then, after irradiating the entire surface with visible light, (iv) remove the visible light-transmitting sheet (B) and the energy-ray-sensitive coating layer from the visible-sensitive resin coating layer (A) of the laminate (C) Exposing the visible light-sensitive resin coating film layer (A), (v) Then, the coating film layer (A) is developed with a developing solution. As a light source for irradiating actinic energy rays, it can be listed, for example, ultra-high tension, high pressure, medium tension and low tension mercury lamps, chemical lamps, carbon arc lamps, xenon lamps, metal halide lamps, tungsten lamps, etc. , Or laser (the number in brackets indicates the wavelength of the vibration-curve), such as hydrogen laser (488 nm), YAG-SHG laser (532 nm), UV laser (35 1-364 nm) . As the heat ray source, it can be listed, for example, a semiconductor laser (830 nm), a YAG laser (1.06 microns), infrared light, and the like. Light sources that have been used so far as visible light irradiation sources, such as ultra-high tension, high pressure, medium tension or low tension mercury lamps, chemical lamps, carbon arc lamps, xenon lamps, metal halide lamps, fluorescent lamps, tungsten lamps, the sun Light, etc., these rays first pass through a UV light cut filter; and have -21- in the visible light range This paper size applies Chinese National Standard (CNS) A4 specification (210 X 297 mm) " (Please read the back Notes? Matters are on this page)

訂·. -線· 483294 A7 B7 1、發明說明(Μ) 振盪範圍之各種雷射。 塗膜層(A)和塗膜層(C)之顯影,若塗膜爲陰離子性,貝[J 用鹼顯影溶液爲之;若爲陽離子性,則用酸顯影溶液爲之 。依據塗膜之性質,也可能利用有機溶劑或水顯影。 顯影可以用噴灑或浸入顯影溶液於約爲10-約8(TC,較 隹約15-約5(TC之溫度,經過約10秒-約60分鐘,較佳 約30秒-約30分鐘。 作爲鹼顯影溶液而可列示者,例如,單甲基胺、二甲基 胺、三甲基胺、單乙基胺、二乙基胺、三乙基胺、單異丙 基胺、二異丙基胺、三異丙基胺、單丁基胺、二丁基胺、 單乙醇胺、二乙醇胺、三乙醇胺、二甲基胺基乙醇、二乙 基胺基乙醇、氨、苛性鈉、苛性鉀、偏矽酸鈉、偏矽酸鉀 、碳酸鉀、四乙基氫氧化銨等之各種水溶液。 作爲酸性顯影溶液而可列示者,例如,甲酸、巴豆酸、 乙酸、丙酸、乳酸、鹽酸、硫酸、硝酸、磷酸等之水溶 液。 作爲有機溶劑而可列示者,例如,諸如己烷、庚烷、辛 烷、二甲苯、二氯甲烷、三氯甲烷、四氯化碳、三氯乙烯 等烴型溶劑;諸如甲醇、乙醇、丙醇、丁醇等醇類;諸如 二乙醚、二丙醚、二丁醚、乙基乙烯基醚、二噁烷、氧化 丙烯、四氫呋喃、溶纖劑、甲基溶纖劑、丁基溶纖劑、甲 基卡宓醇、二乙二醇甲乙基醚等之醚類;諸如丙酮、甲基 乙基酮、甲基異丁基酮、異佛爾酮、環己酮等之酮;諸如 乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸丁酯等酯類;諸如 -22- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再 I R___ 本頁: 線· 經濟部智慧財產局員工消費合作社印製 483294 A7 一__B7 _ 五、發明說明(21) 咕啶、甲醯胺、N,N '-二乙基甲醯胺等其他類型。 .本發明用於形成圖樣之積層體可以應用於形成例如形成 於基質表面之圖紋,其如黑色陣列圖紋,用於彩色濾色片 之圖紋,用於覆蓋電子零件之圖形(用於焊接之塗膜),陶 瓷或磷光體之圖案,顯示板之分格圖紋等;或絕緣基質, 其如用於佈線之塑膠基質,用於組裝之塑膠基質等,或設 於其上之導電圖紋。 本發明以各實施例作更詳細之說明。除另有指明之外, 份與%均以重量計。 能量射線-敏感件絹成物(a )之製備例 以100份(固含量)之可見光可固化之樹脂(樹脂固含量 55%,丙二醇單甲基醚有機溶劑,樹脂酸値50毫克KOH/ 經濟部智慧財產局員工消費合作社印製 克,數平均分子量約爲20,000 ),其爲製自以24份甲基 丙烯酸縮水甘油酯與60份丙烯酸樹脂(樹脂酸値1 55毫克 KOH/克,甲基丙烯酸甲酯/丙烯酸丁酯/丙烯酸=40/40/20 重量比)反應而作爲能量射線可固化之樹脂(高分子膠合劑) 者,28份光自由基聚合起始劑(Irgacure907,商品名, Ciba-Geigy製,乙醯苯型化合物),1〇分光自由基聚合起 始劑(DETX-S,商品名,Nippon Kayaku Co.,Ltd.製,噻 咕噸型化合物)和10份紫外光吸收劑(Tinuvin326,商品 名,Ciba Specialty Chemicals製造,苯並三卩坐型),配 製而得組成物(a)(固含量15%)。 可見光-敏感性樹脂組成物(b )之製備例 以1 00份(固含量)之可見光可固化之樹脂(樹脂固含量 -23- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 483294 A7 _B7_ 五、發明說明(22) 55%,丙二醇單甲基醚有機溶劑,樹脂酸値50毫克KOH/ 克,數平均分子量約爲20,000),其爲製自以24份甲基 丙烯酸縮水甘油酯與60份丙烯酸樹脂(樹脂酸値155毫克 KOH/克,甲基丙烯酸甲酯/丙烯酸丁酯/丙烯酸=40/40/20 重量比)反應而製成而作爲可見光可固化之樹脂者(高分子 膠合劑),56份光自由基聚合起始劑(CGI-784,商品名, Ciba-Geigy製,三茂鈦化合物)等配成,並以所配成之產 物,1份酞花青綠,50份石膏和20份環氧樹脂 (•Epikoto828,商品名,Yuka Shell Epoxy Co·,Ltd.製 造,雙酚A型液體環氧樹脂)溶於二乙二醇二甲基醚溶劑 而得組成物(b)(固含量30%)。 實施例1 經濟部智慧財產局員工消費合作社印製 (1 )在一銅箔上( 200x200x1 · 1毫米)用桿塗品塗覆可見 光-敏感性組成物(b),並初步乾燥於80°C歷10分鐘以形 成可見光-敏感性樹脂塗膜層(I ),約30微米厚。然後在 已形成之塗膜黏上一聚乙二醇對苯二酸酯片(38微米)以獲 得片層(Π)。然後用滾輪在片層(Π)之表面塗上能量射 線-敏感性組成物(a),使經乾燥之膜厚度爲6微米,並乾 燥1 0分鐘以形成能量射線-敏感性塗膜層(m )。 (2)然後使塗膜層(m )依圖形直接曝於紫外光雷射(5mj / cm2(毫焦耳/厘米平方))之照射。然後浸入於鹼顯影溶液 (碳酸鈉水溶液,0.25%))於25°C,歷60秒使除去在曝光 部位之膜層(ΠΙ )。 (3 )然後用氬離子雷射(300m j / cm2)照射塗膜之整個表 -24- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 483294 經濟部智慧財產局員工消費合作社印製 A7 __B7____ 23五、發明說明() 面。 (4) 然後將能量射線-敏感性塗膜層(m )和片層(π )從可 見光-敏感性樹脂塗膜層(I )剝離,使獲得銅箔和可見光 -敏感性樹脂塗膜層(I )之積層體。 (5) 然後將該積層體浸入於碳酸鈉之0.75%水溶液於 25°C歷60秒,除去未固化(未曝光部位)之可見光-敏感性 樹脂塗膜層(I )。 所得圖形紋路爲:線條形狀(圖紋寬度)/間隔圖紋= 100 微米/20微米而爲良好。 實施例2 進行與實施例1相同之處理,但以一預先層積有能量射 線-敏感性塗膜層(m )和片層(π )之積層產物至可見光-敏 感性樹脂塗膜層(I )上。所得圖形之紋路,線條形狀(圖 紋寬度)/間隔= 100微米/20微米而爲良好。 實施例3 進行與實施例1相同之處理,但以預先層積可見光-敏 感性樹脂塗膜層(I)和片層(Π)之產物,層積至基質上, 而後形成能量射線-敏感性塗膜層(ΙΠ )。所得圖形之紋路, 線條形狀(圖紋寬度)/間隔=100微米/ 20微米而爲良好。 實施例4 進行與實施例1相同之處理,但以預先層積可見光-敏 感性樹脂塗膜層(I )、片層(Π )和能量射線-敏感性塗膜 層(m )之積層產物至基質上。所得圖形之紋路,線條形狀 (圖紋寬度)/間隔=100微米/ 20微米而爲良好。 -25- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) " ^ (請先閱讀背面之注意事項再本頁)Order ·. -Line · 483294 A7 B7 1. Description of the invention (M) Various lasers with oscillation range. For the development of the coating film layer (A) and the coating film layer (C), if the coating film is anionic, shellfish [J use an alkali developing solution; if it is cationic, use an acid developing solution. Depending on the nature of the coating film, development with organic solvents or water is also possible. The development can be carried out by spraying or immersing the developing solution at a temperature of about 10 to about 8 (TC, more than about 15 to about 5 (TC), after about 10 seconds to about 60 minutes, preferably about 30 seconds to about 30 minutes. As Alkali developing solution can be listed, for example, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropyl Methylamine, triisopropylamine, monobutylamine, dibutylamine, monoethanolamine, diethanolamine, triethanolamine, dimethylaminoethanol, diethylaminoethanol, ammonia, caustic soda, caustic potassium, Various aqueous solutions of sodium metasilicate, potassium metasilicate, potassium carbonate, tetraethylammonium hydroxide, etc. As the acidic developing solution, for example, formic acid, crotonic acid, acetic acid, propionic acid, lactic acid, hydrochloric acid, Aqueous solutions of sulfuric acid, nitric acid, phosphoric acid, etc. Listed as organic solvents, such as hexane, heptane, octane, xylene, dichloromethane, chloroform, carbon tetrachloride, trichloroethylene, etc. Hydrocarbon solvents; alcohols such as methanol, ethanol, propanol, butanol; such as diethyl ether, dipropyl ether, Ethers such as ethers, ethyl vinyl ethers, dioxane, propylene oxide, tetrahydrofuran, cellosolve, methyl cellosolve, butyl cellosolve, methylcarbitol, diethylene glycol methyl ethyl ether, etc .; such as Ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, isophorone, cyclohexanone, etc .; such as methyl acetate, ethyl acetate, propyl acetate, butyl acetate, etc .; such as -22 -This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before I R___ This page: Line · Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs and Consumer Cooperatives 483294 A7 I_ _B7 _ 5. Description of the invention (21) other types such as chlordine, formamidine, N, N′-diethylformamide, etc. The laminated body for forming a pattern according to the present invention can be applied to form, for example, the surface of a substrate Patterns, such as black array patterns, patterns for color filters, patterns for covering electronic parts (coating films for soldering), patterns for ceramics or phosphors, and grid patterns for display panels Grains, etc .; or insulating substrates, such as plastic substrates for wiring, The assembled plastic substrate, etc., or the conductive pattern provided thereon. The present invention is described in more detail in each embodiment. Unless otherwise specified, parts and% are based on weight. Energy ray-sensitive piece silk Preparation of finished product (a): 100 parts (solid content) of visible light curable resin (resin solid content: 55%, propylene glycol monomethyl ether organic solvent, resin acid: 50 mg KOH), employee consumption of Intellectual Property Bureau, Ministry of Economic Affairs Cooperative printed gram, number average molecular weight is about 20,000), which is produced from 24 parts of glycidyl methacrylate and 60 parts of acrylic resin (resin acid 1.55 mg KOH / g, methyl methacrylate / butyl acrylate Ester / acrylic acid = 40/40/20 weight ratio) as a resin (polymer binder) curable with energy rays, 28 parts of photoradical polymerization initiator (Irgacure907, trade name, manufactured by Ciba-Geigy, B Benzene-type compound), 10-spectrum radical polymerization initiator (DETX-S, trade name, manufactured by Nippon Kayaku Co., Ltd., thioxanthan-type compound), and 10 parts of ultraviolet light absorber (Tinuvin326, trade name , Ciba Specialty Chemical Manufactured by s, benzotrifluorene sitting type), compounded to obtain composition (a) (solid content 15%). The visible light-sensitive resin composition (b) is prepared by using 100 parts (solid content) of visible light curable resin (resin solid content-23). This paper size is applicable to China National Standard (CNS) A4 (210 X 297). (Mm) 483294 A7 _B7_ 5. Description of the invention (22) 55%, propylene glycol monomethyl ether organic solvent, resin acid 50 mg KOH / g, number average molecular weight is about 20,000), which is produced from 24 parts of methyl Glycidyl acrylate reacts with 60 parts of acrylic resin (resin acid 155 mg KOH / g, methyl methacrylate / butyl acrylate / acrylic acid = 40/40/20 weight ratio) and is made into visible light curable resin (Polymer binder), 56 parts of photo-radical polymerization initiator (CGI-784, trade name, manufactured by Ciba-Geigy, tricene compound), etc., and 1 part of phthalate Blue green, 50 parts of gypsum and 20 parts of epoxy resin (• Epikoto828, trade name, manufactured by Yuka Shell Epoxy Co., Ltd., bisphenol A type liquid epoxy resin) are dissolved in diethylene glycol dimethyl ether solvent and The composition (b) was obtained (solid content: 30%). Example 1 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs (1) on a copper foil (200x200x1 · 1 mm) with a rod coating to coat the visible light-sensitive composition (b), and initially dried at 80 ° C It took 10 minutes to form a visible light-sensitive resin coating film layer (I), which was about 30 microns thick. Then, a polyethylene glycol terephthalate sheet (38 m) was adhered to the formed coating film to obtain a sheet layer (Π). Then apply the energy ray-sensitive composition (a) on the surface of the sheet layer (Π) with a roller, so that the thickness of the dried film is 6 microns, and dry for 10 minutes to form an energy ray-sensitive coating film layer ( m). (2) The coating film layer (m) is then directly exposed to ultraviolet light laser irradiation (5mj / cm2 (mJ / cm2)) according to the pattern. Then, it was immersed in an alkali developing solution (aqueous sodium carbonate solution, 0.25%) at 25 ° C for 60 seconds to remove the film layer (III) at the exposed portion. (3) Then irradiate the entire coating film with argon ion laser (300m j / cm2). Table 24-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 483294 Employees of Intellectual Property Bureau, Ministry of Economic Affairs Printed by the Consumer Cooperative A7 __B7____ 23 V. Description of the invention (). (4) The energy ray-sensitive coating film layer (m) and the sheet layer (π) are then peeled off from the visible-sensitive resin coating film layer (I) to obtain a copper foil and a visible-sensitive resin coating film layer ( I) laminated body. (5) Then immerse the laminated body in a 0.75% aqueous solution of sodium carbonate at 25 ° C for 60 seconds to remove the uncured (unexposed area) visible light-sensitive resin coating film layer (I). The obtained pattern texture is: line shape (pattern width) / space pattern = 100 microns / 20 microns and is good. Example 2 The same treatment as in Example 1 was performed, but a laminated product having an energy ray-sensitive coating film layer (m) and a sheet layer (π) laminated in advance to a visible-sensitive resin coating film layer (I )on. The pattern of the obtained pattern was good in line shape (pattern width) / space = 100 μm / 20 μm. Example 3 The same treatment as in Example 1 was performed, but the products of the visible light-sensitive resin coating film layer (I) and the sheet layer (Π) were laminated in advance, and then laminated onto the substrate, and then energy ray-sensitivity was formed. Coating film layer (III). The pattern of the obtained pattern was good in line shape (pattern width) / interval = 100 micrometers / 20 micrometers. Example 4 The same treatment as in Example 1 was performed, but the visible light-sensitive resin coating film layer (I), sheet layer (Π) and energy ray-sensitive coating film layer (m) were laminated in advance to On the substrate. The pattern of the obtained pattern was good in line shape (pattern width) / interval = 100 micrometers / 20 micrometers. -25- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) " ^ (Please read the precautions on the back before this page)

· 483294 A7 B7 五、發明說明(24) 比較例1 如實施例1 ,積層體之形成及顯影同實施例1之情形, 但塗膜層(m)不含可見光吸收劑。結果,全部所得之膜因 不良之殘線性質和間隔解析性質而爲不良。 比較例2 如實施例2,積層體之形成及顯影同實施例2之情形, 但塗膜層(m )不含可見光吸收劑。結果,所得全部之膜因 不良之殘線性質和間隔解析性質而爲不良。 比較例3 如實施例3,積層體之形成及顯影同實施例4之情形, 但塗膜層(BI)不含可見光吸收劑。結果,所得全部之膜因 不良之殘線性質和間隔解析性質而爲不良。 比較例4 如實施例4,積層體之形成及顯影同實施例4之情形, 但塗膜層(ΙΠ)不含可見光吸收劑。結果,所得全部之膜因 不良之殘線性質和間隔解析性質而爲不良。 (請先閱讀背面之注咅?事項再本頁) 經濟部智慧財產局員工消費合作社印製 -26- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐)· 483294 A7 B7 V. Explanation of the invention (24) Comparative Example 1 As in Example 1, the formation and development of the laminated body are the same as those in Example 1, but the coating film layer (m) does not contain a visible light absorbent. As a result, all the obtained films were defective due to poor residual line properties and space analysis properties. Comparative Example 2 As in Example 2, the laminated body was formed and developed in the same manner as in Example 2, but the coating film layer (m) did not contain a visible light absorbent. As a result, all the obtained films were defective due to poor residual line properties and space analysis properties. Comparative Example 3 As in Example 3, the laminated body was formed and developed in the same manner as in Example 4, but the coating film layer (BI) did not contain a visible light absorbent. As a result, all the obtained films were defective due to poor residual line properties and space analysis properties. Comparative Example 4 As in Example 4, the laminated body was formed and developed in the same manner as in Example 4, but the coating film layer (II) did not contain a visible light absorbent. As a result, all the obtained films were defective due to poor residual line properties and space analysis properties. (Please read the note on the back? Matters before this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs -26- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

Claims (1)

483294 經濟部智慧財產局員工消費合作社印製 A8 B8 C8 D8六、申請專利範圍 1 . 一種用於形成圖樣之積層體,其特徵爲經由在基質表面 上連續疊積一種負型或正型之可見光-敏感性樹脂塗膜 層(A),一種可見光·透射片層(B)和一種遮蔽可見光之 能量射線-敏感性塗膜層(C)以製造。 2.如申請專利範圍第1項之積層體,其中之可見光-敏感 性樹脂塗膜層(A )是一種負型可見光-敏感性樹脂塗膜 層(A-1),形成自一種塗覆成膜之樹脂組成物,含有一 種可見光可固化之樹脂,一種光自由基聚合起始劑和 一種光敏感劑。 3 .如申請專利範圍第2項之積層體,其中可見光可固化之 樹脂是一種具有光敏感性不飽和基而能藉由可見光照射 使交聯而固化之樹脂;以及足夠的可離子化基以溶 解或擴散樹脂於鹼或酸之顯影溶液中。 4 .如申請專利範圍第2項之積層體,其中光自由基聚合起 始劑是選自包括二過氧異苯二酸二-三級-丁酯、3,3\ 4,4’-四(三級-丁基過氧羰基)二苯甲酮、鐵-丙二烯錯 合物和二茂鈦化合物等一組之中。 5 .如申請專利範圍第2項之積層體,所含光自由基聚合起 始劑在每100重量份之可見光可固化之樹脂中爲0.1-25 重量份範圍內。 6 ·如申請專利範圍第2項之積層體,其中所含光敏感劑在 形成塗膜之樹脂組成物中爲0 . 1 - 20重量%之範圍內(固 含量)。 7 ·如申請專利範圍第1項之積層體,其中可見光-敏感性 _____-27 - ——___ _ 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) Φ. . 線· 483294 8888 ABCD 經濟部智慧財產局員工消費合作社印製 六、申請專利範圍 樹脂塗膜層(A)含有一種水性樹脂,製自引入一種可見 光可固化之不飽和基和一種離子-形成基於線性酣型環 氧樹脂中而成。 8.如申請專利範圍第1項之積層體,其中可見光-敏感性 ..樹脂塗膜層(A)是一種正型可見光-敏感性樹脂塗膜層 (A-2),形成自一種塗膜形成之樹脂組成物,含有一種 光酸產生劑成分,一種樹脂成分和一種光敏感劑。 9 .如申請專利範圍第8項之積層體,其中該樹脂成分是一 種製於經一種磺酸酯鍵而鍵結琨二疊氮磺酸至具有離子 形成基之基礎樹脂所成。 1 0 .如申請專利範圍第8項之積層體,所含光酸產生劑成 分在每100重量%樹脂成分中爲0.1-40重量份之範圍 內。 1 1 .如申請專利範圍第8項之積層體,所含光敏感性劑成 分以形成塗膜之樹脂組成物爲基礎,含有0.1-20重量 % (固含量)。 12.如申請專利範圍第1項之積層體,其中可見光-敏感性 樹脂塗膜層(A)是導電性或絕緣性。 1 3 .如申請專利範圍第1項之積層體,其中可見光-敏感性 樹脂塗膜層(A)具有約1微米-約5毫米之厚度。 14.如申請專利範圍第1項之積層體,其中可見光-透射片 層(B)含有一樹脂片,透射所照射之可見光至少約90%。 1 5 .如申請專利範圍第1項之積層體,其中可見光-透射之 片層(B)含有一聚乙二醇對苯二酸酯片。 ________ __no - 紙張尺度適用中國國家標準(CNS)A4規格(210 X 297 ϋ ) H ϋ I I I ϋ Is — — — — · I I I I I I I 一-口、 I I I I I I I I — — — — — — — — — — — —— — — — — — — — I- (請先閱讀背面之注意事項再填寫本頁) 483294 A8 B8 C8 D8 經濟部智慧財產局員工消費合作社印製 六、申請專利範圍 1 6 ·如申請專利範圍第1項之積層體,其中可見光-透射之 '片層(B)具有約10微米-約5毫米之厚度。 17 .如申請專利範圍第丨項之積層體,其中能量射線-敏感 性塗膜層(C)含有可見光吸收劑、著色劑、塡料、金屬 粉顏料或金屬光澤顏料。 18·如申請專利範圍第1項之積層體,其中能量射線-敏感 、·性塗膜層(C)含有負型樹脂組成物,其經能量射線照射 後,在諸如水、有機溶劑、鹼或酸等處理溶液中變成爲 可溶解或可擴散。 1 9 ·如申請專利範圍第1項之積層體,其中能量射線-敏感 性塗膜層(C)含有正型樹脂組成物,其經光化能量射線 .照射後,在水、有機溶劑、鹼或酸中變成爲不可溶解或 非可擴散。 20·如申請專利範圍第1項之積層體,其中能量射線-敏感 性塗膜層(C)具有約1微米·約500微米之厚度。 .如申請專利範圍第1項之積層體,在能量射線-敏感性 塗膜層(C)上另有一面塗層。 22 . —種製備如申請專利範圍第1項用於形成圖樣之積層 體之方法,其特徵在於形成一種負型或正型可見光-敏 感性樹脂塗膜層(A)於基質表面,然後形成一種可見光 -透射之片層(B)且繼續層積一種遮蔽可見光之能量射 線-敏感性塗膜層(C)。 23 · —種製備如申請專利範圍第1項用於形成圖樣之積層 體之方法,其特徵在於形成一種負型或正型可見光-敏 -29 - 卜紙張尺度適用中國國家標準(CNS)A4規格(21〇 x 297公釐) (請先閱讀背面之注意事項再填寫本頁) * --線· 483294 經濟部智慧財產局員工消費合作社印製 A8 B8 C8 D8六、申請專利範圍 感性樹脂塗膜層(A)於基質表面,然後層積一種預先形 成之2層積層體,包括一種可見光-透射之片層(B)和一 種遮蔽可見光之能量射線-敏感性塗膜層(C),於該塗 膜層(A)之表面上,使該片層(B)側之表面與上述塗膜 層(A)接觸。 24 . —種製備如申請專利範圍第1項用於形成圖樣之積層 體之方法,其特徵在於在基質表面上層積一種預先形 成之3層積層體,包括一種負型或正型可見光-敏感性 樹脂塗膜層(A),一種可見光-透射之片層(B)和一種遮 蔽可見光之能量射線-敏感性塗膜層(C),使該塗膜層 (A)側表面與基質表面接觸。 25 . —種製備如申請專利範圍第1項用於形成圖樣之積層 體之方法,其特徵在於在基質表面上層積一種預先形 成之2層積層體,包括一種負型或正型之可見光-敏感 性樹脂塗膜層(A)和一種可見光-透射之片層(B),使該 塗膜層(A)側之表面與基質表面接觸,然後形成一種遮 蔽可見光之能量射線-敏感性塗膜層(C)於所得3層積層 體之片層(B)側表面上。 26. —種形成圖樣之方法,包括如下各步驟: (i) 依圖形照射光化能量射線,通過阻罩之中介或直 接於如申請專利範圍第1項用於形成圖樣之積層體中的 能量射線-敏感性塗膜層(C )之表面上; (ii) 經由塗膜層(C)之顯影,在已照射或未被照射之 部位,除去能量射線-敏感性塗膜層(C)而形成一種光阻 -___-30 ·_______ 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) # 訂---------線丨 « 483294 A8 B8 C8 D8 六、申請專利範圍 圖紋塗膜; (i i i )然後,在照射可見光於整個表面之後, (iv)從積層體之可見光-敏感性樹脂塗膜層(A),除去 可見光-透射之片層(B)和能量射線-敏感性塗膜層(C), 使可見光-敏感性樹脂塗膜層(A)露出, (V)然後用顯影溶液顯現塗膜層(A)。 ----I-----------------訂----------線—▲ (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 _-31 - 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐)483294 Printed by A8, B8, C8, D8, Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 6. Application for patent scope 1. A laminated body for forming a pattern, which is characterized by continuously stacking a negative or positive visible light on the surface of a substrate -A sensitive resin coating film layer (A), a visible light transmission sheet (B), and an energy ray that shields visible light-a sensitive coating film layer (C) to manufacture. 2. The laminated body according to item 1 of the patent application scope, wherein the visible light-sensitive resin coating film layer (A) is a negative visible light-sensitive resin coating film layer (A-1), which is formed from a coating The resin composition of the film contains a visible light curable resin, a photo-radical polymerization initiator, and a photosensitizer. 3. The laminated body according to item 2 of the scope of patent application, wherein the visible light curable resin is a resin having a light-sensitive unsaturated group capable of being cured by crosslinking by irradiation with visible light; and sufficient ionizable groups to Dissolve or diffuse the resin in an alkali or acid developing solution. 4. The laminated body according to item 2 in the scope of patent application, wherein the photo-radical polymerization initiator is selected from the group consisting of di-tert-isophthalic acid di-tertiary-butyl ester, 3, 3 \ 4, 4'-tetra (Tertiary-butylperoxycarbonyl) benzophenone, iron-propadiene complex and titanocene compound. 5. The laminated body according to item 2 of the scope of patent application, which contains the photo-radical polymerization initiator in the range of 0.1-25 parts by weight per 100 parts by weight of the visible light curable resin. 6. The laminated body according to item 2 of the patent application range, wherein the photosensitizer contained in the resin composition forming the coating film is in the range of 0.1 to 20% by weight (solid content). 7 · If the laminated body in the first scope of the patent application, visible light-sensitivity _____- 27-——___ _ This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) (Please read first Note on the back, please fill out this page again) Φ .. · 483294 8888 ABCD Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 6. Patent application scope The resin coating layer (A) contains a water-based resin and is made by introducing a visible light. Cured unsaturated groups and an ion-formation are based on linear fluorene-based epoxy resins. 8. The laminated body according to item 1 of the scope of patent application, wherein the visible-sensitivity .. resin coating film layer (A) is a positive visible-sensitive resin coating film layer (A-2), formed from a coating film The formed resin composition contains a photoacid generator component, a resin component, and a photosensitizer. 9. The laminated body according to item 8 of the scope of patent application, wherein the resin component is a base resin made by bonding sulfonium diazidesulfonic acid to an ion-forming group through a sulfonate bond. 10. The laminated body according to item 8 of the scope of patent application, wherein the photoacid generator component is contained within a range of 0.1 to 40 parts by weight per 100% by weight of the resin component. 1 1. The laminated body according to item 8 of the scope of patent application, the photosensitizer component is based on the resin composition forming the coating film, and contains 0.1-20% by weight (solid content). 12. The laminated body according to item 1 of the patent application scope, wherein the visible light-sensitive resin coating film layer (A) is conductive or insulating. 13. The laminated body according to item 1 of the scope of patent application, wherein the visible light-sensitive resin coating film layer (A) has a thickness of about 1 micrometer to about 5 millimeters. 14. The laminated body according to item 1 of the patent application scope, wherein the visible light-transmitting sheet layer (B) contains a resin sheet that transmits at least about 90% of the visible light that is irradiated. 15. The laminated body according to item 1 of the scope of patent application, wherein the visible-transmissive sheet (B) contains a polyethylene glycol terephthalate sheet. ________ __no-Paper size applies to Chinese National Standard (CNS) A4 (210 X 297 297) H ϋ III ϋ Is — — — — · IIIIIII one-port, IIIIIIII — — — — — — — — — — — — — — — — — — — — — I- (Please read the notes on the back before filling out this page) 483294 A8 B8 C8 D8 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 6. Scope of patent application 1 6 · If the scope of patent application is the first The laminated body of the item, wherein the visible-transmissive 'sheet layer (B) has a thickness of about 10 micrometers to about 5 millimeters. 17. The laminated body according to item 丨 of the patent application scope, wherein the energy ray-sensitive coating film layer (C) contains a visible light absorber, a colorant, a material, a metal powder pigment or a metal gloss pigment. 18. The laminated body according to item 1 of the scope of patent application, wherein the energy ray-sensitive and sexual coating film layer (C) contains a negative resin composition, which is irradiated with energy rays, such as water, organic solvents, alkali or It becomes soluble or diffusible in a treatment solution such as an acid. 1 9 · The laminated body according to item 1 of the scope of patent application, wherein the energy ray-sensitive coating film layer (C) contains a positive resin composition, which is actinic energy ray. After irradiation, in water, organic solvents, alkali Or become insoluble or non-diffusible in acid. 20. The laminated body according to item 1 of the patent application range, wherein the energy ray-sensitive coating film layer (C) has a thickness of about 1 micrometer to about 500 micrometers. If the laminated body of the first patent application scope, there is another coating on the energy ray-sensitive coating film layer (C). 22. A method for preparing a laminated body for pattern formation as described in the first patent application scope, which is characterized by forming a negative or positive visible light-sensitive resin coating film layer (A) on the surface of a substrate, and then forming a Visible light-transmissive sheet (B) and continue to laminate an energy ray-sensitive coating film layer (C) that shields visible light. 23 · —A method for preparing a laminated body for pattern formation as described in item 1 of the scope of patent application, which is characterized by forming a negative or positive visible light-sensitive-29-Bu paper standard applicable to China National Standard (CNS) A4 (21〇x 297 mm) (Please read the notes on the back before filling in this page) *-line · 483294 Printed by A8 B8 C8 D8, Employee Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economy Layer (A) is on the surface of the substrate, and then a pre-formed 2-layer laminate is formed, which includes a visible light-transmitting sheet (B) and an energy ray-sensitive coating layer (C) that blocks visible light. On the surface of the coating film layer (A), the surface on the side of the sheet layer (B) is brought into contact with the coating film layer (A). 24. A method for preparing a laminated body for forming a pattern as described in the first patent application scope, characterized in that a pre-formed 3-layer laminated body is laminated on the surface of the substrate, including a negative or positive visible light-sensitivity A resin coating film layer (A), a visible light-transmitting sheet layer (B), and an energy ray-sensitive coating film layer (C) that shields visible light, so that the side surface of the coating film layer (A) is in contact with the surface of the substrate. 25. A method for preparing a laminated body for pattern formation as described in the first patent application scope, which is characterized in that a pre-formed 2-layer laminated body is laminated on the surface of the substrate, including a negative or positive visible light-sensitive A flexible resin coating film layer (A) and a visible light-transmitting sheet layer (B), contact the surface of the coating film layer (A) side with the surface of the substrate, and then form an energy ray-sensitive coating film layer that shields visible light (C) On the surface of the sheet (B) side of the obtained 3-layer laminate. 26. A method for forming a pattern, including the following steps: (i) irradiate actinic energy rays according to a figure, through a masking medium, or directly in the laminated body for forming a pattern as described in the first patent application scope On the surface of the radiation-sensitive coating film layer (C); (ii) through the development of the coating film layer (C), removing the energy-ray-sensitive coating film layer (C) in the irradiated or unirradiated area and Form a kind of photoresist -___- 30 · _______ This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page) # Order ------ --- line 丨 «483294 A8 B8 C8 D8 VI. Patent application pattern coating film; (iii) Then, after irradiating visible light on the entire surface, (iv) visible light-sensitive resin coating film layer from the laminated body ( A), remove the visible light-transmitting sheet (B) and the energy ray-sensitive coating film layer (C), expose the visible light-sensitive resin coating film layer (A), and then (V) develop the coating film with a developing solution Layer (A). ---- I ----------------- Order ---------- line-- ▲ (Please read the notes on the back before filling this page) Economy Printed by the Ministry of Intellectual Property Bureau's Consumer Cooperatives _-31-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)
TW089123576A 1999-11-09 2000-11-08 Laminate for pattern formation TW483294B (en)

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JP31792199A JP2001133971A (en) 1999-11-09 1999-11-09 Pattern forming laminated film, method for producing same and pattern forming method using same

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TW483294B true TW483294B (en) 2002-04-11

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JP2001133971A (en) 2001-05-18

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