JPH0348097B2 - - Google Patents
Info
- Publication number
- JPH0348097B2 JPH0348097B2 JP12218285A JP12218285A JPH0348097B2 JP H0348097 B2 JPH0348097 B2 JP H0348097B2 JP 12218285 A JP12218285 A JP 12218285A JP 12218285 A JP12218285 A JP 12218285A JP H0348097 B2 JPH0348097 B2 JP H0348097B2
- Authority
- JP
- Japan
- Prior art keywords
- lid
- cassette
- mask
- lower lid
- fork
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 12
- 239000000428 dust Substances 0.000 description 12
- 238000010586 diagram Methods 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 7
- 230000032258 transport Effects 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000004696 Poly ether ether ketone Substances 0.000 description 3
- 229920002530 polyetherether ketone Polymers 0.000 description 3
- 238000001514 detection method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 210000000078 claw Anatomy 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Library & Information Science (AREA)
- Warehouses Or Storage Devices (AREA)
- Sheets, Magazines, And Separation Thereof (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Packaging Frangible Articles (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60122182A JPS61282229A (ja) | 1985-06-05 | 1985-06-05 | 防塵カセツト |
US06/750,282 US4611967A (en) | 1984-07-06 | 1985-07-01 | Cassette-type container for a sheet-like member |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60122182A JPS61282229A (ja) | 1985-06-05 | 1985-06-05 | 防塵カセツト |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61282229A JPS61282229A (ja) | 1986-12-12 |
JPH0348097B2 true JPH0348097B2 (ko) | 1991-07-23 |
Family
ID=14829605
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60122182A Granted JPS61282229A (ja) | 1984-07-06 | 1985-06-05 | 防塵カセツト |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61282229A (ko) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2539447B2 (ja) * | 1987-08-12 | 1996-10-02 | 株式会社日立製作所 | 枚葉キャリアによる生産方法 |
JP2789198B2 (ja) * | 1988-09-06 | 1998-08-20 | キヤノン株式会社 | マスクローディング機構 |
JP2536623B2 (ja) * | 1989-07-12 | 1996-09-18 | 日本電気株式会社 | 自動用紙幅合わせ機構 |
ES2101070T3 (es) * | 1992-08-04 | 1997-07-01 | Ibm | Recipientes portatiles estancos a presion para almacenar una rebanada de semiconductor en un ambiente gaseoso protector. |
US6619903B2 (en) * | 2001-08-10 | 2003-09-16 | Glenn M. Friedman | System and method for reticle protection and transport |
-
1985
- 1985-06-05 JP JP60122182A patent/JPS61282229A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61282229A (ja) | 1986-12-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |